JPS5713864B2 - - Google Patents
Info
- Publication number
- JPS5713864B2 JPS5713864B2 JP13333877A JP13333877A JPS5713864B2 JP S5713864 B2 JPS5713864 B2 JP S5713864B2 JP 13333877 A JP13333877 A JP 13333877A JP 13333877 A JP13333877 A JP 13333877A JP S5713864 B2 JPS5713864 B2 JP S5713864B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333877A JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333877A JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5466776A JPS5466776A (en) | 1979-05-29 |
JPS5713864B2 true JPS5713864B2 (ja) | 1982-03-19 |
Family
ID=15102372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13333877A Granted JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5466776A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6335184Y2 (ja) * | 1983-04-28 | 1988-09-19 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2757932A1 (de) * | 1977-12-24 | 1979-07-05 | Licentia Gmbh | Strahlungsempfindliche positiv arbeitende materialien |
JPS54158173A (en) * | 1978-06-05 | 1979-12-13 | Fujitsu Ltd | Micropattern forming method |
JPS54161320A (en) * | 1978-06-12 | 1979-12-20 | Fujitsu Ltd | Production of cross linking type resist |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
JPS6055630A (ja) * | 1983-09-06 | 1985-03-30 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
JPH0721626B2 (ja) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | 半導体微細加工用レジスト組成物 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51105353A (ja) * | 1975-03-07 | 1976-09-17 | Hitachi Ltd | Denshisenkannoseikobunshisoseibutsu |
JPS5353314A (en) * | 1976-10-26 | 1978-05-15 | Agency Of Ind Science & Technol | Sensitive high polymer composition and picture imae forming method usingsaid composition |
JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
-
1977
- 1977-11-07 JP JP13333877A patent/JPS5466776A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51105353A (ja) * | 1975-03-07 | 1976-09-17 | Hitachi Ltd | Denshisenkannoseikobunshisoseibutsu |
JPS5353314A (en) * | 1976-10-26 | 1978-05-15 | Agency Of Ind Science & Technol | Sensitive high polymer composition and picture imae forming method usingsaid composition |
JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6335184Y2 (ja) * | 1983-04-28 | 1988-09-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS5466776A (en) | 1979-05-29 |