JPS5430780A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5430780A
JPS5430780A JP9664177A JP9664177A JPS5430780A JP S5430780 A JPS5430780 A JP S5430780A JP 9664177 A JP9664177 A JP 9664177A JP 9664177 A JP9664177 A JP 9664177A JP S5430780 A JPS5430780 A JP S5430780A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
substrate
layer
oxidized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9664177A
Other languages
English (en)
Other versions
JPS5931978B2 (ja
Inventor
Koichiro Kotani
Takashi Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9664177A priority Critical patent/JPS5931978B2/ja
Publication of JPS5430780A publication Critical patent/JPS5430780A/ja
Publication of JPS5931978B2 publication Critical patent/JPS5931978B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
JP9664177A 1977-08-12 1977-08-12 半導体装置の製造方法 Expired JPS5931978B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9664177A JPS5931978B2 (ja) 1977-08-12 1977-08-12 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9664177A JPS5931978B2 (ja) 1977-08-12 1977-08-12 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5430780A true JPS5430780A (en) 1979-03-07
JPS5931978B2 JPS5931978B2 (ja) 1984-08-06

Family

ID=14170442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9664177A Expired JPS5931978B2 (ja) 1977-08-12 1977-08-12 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5931978B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019129233A (ja) * 2018-01-24 2019-08-01 信越半導体株式会社 Ｓｏｉウェーハの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019129233A (ja) * 2018-01-24 2019-08-01 信越半導体株式会社 Ｓｏｉウェーハの製造方法

Also Published As

Publication number Publication date
JPS5931978B2 (ja) 1984-08-06

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