JPS5421269A - Manufacture for semiconductor mask - Google Patents
Manufacture for semiconductor maskInfo
- Publication number
- JPS5421269A JPS5421269A JP8681577A JP8681577A JPS5421269A JP S5421269 A JPS5421269 A JP S5421269A JP 8681577 A JP8681577 A JP 8681577A JP 8681577 A JP8681577 A JP 8681577A JP S5421269 A JPS5421269 A JP S5421269A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- manufacture
- semiconductor mask
- junction
- caoted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To increase the junction reverse dielectirc strength and to avoid open wire for caoted wiring, by using oxided etching films different in etching speed in combination, obtaining the most suitable angle toward film thickness wise with CF gas plasma etching, and by taking greater curvature at the PN junction edge formed by using this.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8681577A JPS5421269A (en) | 1977-07-19 | 1977-07-19 | Manufacture for semiconductor mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8681577A JPS5421269A (en) | 1977-07-19 | 1977-07-19 | Manufacture for semiconductor mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5421269A true JPS5421269A (en) | 1979-02-17 |
Family
ID=13897293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8681577A Pending JPS5421269A (en) | 1977-07-19 | 1977-07-19 | Manufacture for semiconductor mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5421269A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172737A (en) * | 1981-04-17 | 1982-10-23 | Oki Electric Ind Co Ltd | Forming method of throughhole |
JPS59104131A (en) * | 1982-11-18 | 1984-06-15 | テキサス・インスツルメンツ・インコ−ポレイテツド | Method of producing semiconductor device |
JPS62156835A (en) * | 1985-12-28 | 1987-07-11 | Nec Corp | Manufacture of semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098786A (en) * | 1973-12-27 | 1975-08-06 | ||
JPS529353A (en) * | 1975-07-11 | 1977-01-24 | Matsushita Electric Ind Co Ltd | Solid-state oscillator |
-
1977
- 1977-07-19 JP JP8681577A patent/JPS5421269A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098786A (en) * | 1973-12-27 | 1975-08-06 | ||
JPS529353A (en) * | 1975-07-11 | 1977-01-24 | Matsushita Electric Ind Co Ltd | Solid-state oscillator |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172737A (en) * | 1981-04-17 | 1982-10-23 | Oki Electric Ind Co Ltd | Forming method of throughhole |
JPS59104131A (en) * | 1982-11-18 | 1984-06-15 | テキサス・インスツルメンツ・インコ−ポレイテツド | Method of producing semiconductor device |
JPS62156835A (en) * | 1985-12-28 | 1987-07-11 | Nec Corp | Manufacture of semiconductor device |
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