Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP16027876ApriorityCriticalpatent/JPS5384567A/en
Publication of JPS5384567ApublicationCriticalpatent/JPS5384567A/en
PURPOSE: To form the protective film having uniform thickness, by etching the N+ layer of the substrate surface so that it crosses with the mesa etching curved surface.
COPYRIGHT: (C)1978,JPO&Japio
JP16027876A1976-12-291976-12-29Manufacture for semiconductor device
PendingJPS5384567A
(en)