JPS5511306A - Structure of semiconductor device - Google Patents
Structure of semiconductor deviceInfo
- Publication number
- JPS5511306A JPS5511306A JP8291378A JP8291378A JPS5511306A JP S5511306 A JPS5511306 A JP S5511306A JP 8291378 A JP8291378 A JP 8291378A JP 8291378 A JP8291378 A JP 8291378A JP S5511306 A JPS5511306 A JP S5511306A
- Authority
- JP
- Japan
- Prior art keywords
- attachment
- electrode
- projected part
- area
- neighborhood
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: To prevent any effect on a protective film and others in the neighborhood of an electrode, by making the area of attachment between a metal projected part and an electrode less than half the maximum area of the cross section produced when the projected part is cut by a plane parallel to this surface of attachment other than the surface of attachment.
CONSTITUTION: Metal projected part 11 is formed on electrode 3 of Al film, and the area of the surface of attachment 4 between projected part 11 and electrode 3 is made less than half the maximum area of the cross section produced when projected part 11 is cut by a plane parallel to surface of attachment 4 other than the surface of attachment. By this, it is possible to prevent any effect on protective film 5 and others in the neighborhood of electrode 3.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8291378A JPS5511306A (en) | 1978-07-10 | 1978-07-10 | Structure of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8291378A JPS5511306A (en) | 1978-07-10 | 1978-07-10 | Structure of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5511306A true JPS5511306A (en) | 1980-01-26 |
Family
ID=13787483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8291378A Pending JPS5511306A (en) | 1978-07-10 | 1978-07-10 | Structure of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5511306A (en) |
-
1978
- 1978-07-10 JP JP8291378A patent/JPS5511306A/en active Pending
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