JPS54123877A - Baking unit - Google Patents

Baking unit

Info

Publication number
JPS54123877A
JPS54123877A JP3157978A JP3157978A JPS54123877A JP S54123877 A JPS54123877 A JP S54123877A JP 3157978 A JP3157978 A JP 3157978A JP 3157978 A JP3157978 A JP 3157978A JP S54123877 A JPS54123877 A JP S54123877A
Authority
JP
Japan
Prior art keywords
mirror
circular
mask
image
band
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3157978A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349367B2 (enrdf_load_stackoverflow
Inventor
Minokichi Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP3157978A priority Critical patent/JPS54123877A/ja
Priority to DE2910280A priority patent/DE2910280C2/de
Publication of JPS54123877A publication Critical patent/JPS54123877A/ja
Priority to US06/116,752 priority patent/US4294538A/en
Publication of JPS6349367B2 publication Critical patent/JPS6349367B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP3157978A 1978-03-18 1978-03-18 Baking unit Granted JPS54123877A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3157978A JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit
DE2910280A DE2910280C2 (de) 1978-03-18 1979-03-15 Optische Abbildungssysteme
US06/116,752 US4294538A (en) 1978-03-18 1980-01-30 Image forming optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157978A JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP63099840A Division JPS63288014A (ja) 1988-04-22 1988-04-22 焼付け装置

Publications (2)

Publication Number Publication Date
JPS54123877A true JPS54123877A (en) 1979-09-26
JPS6349367B2 JPS6349367B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=12335085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157978A Granted JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit

Country Status (1)

Country Link
JP (1) JPS54123877A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS58195840A (ja) * 1982-05-12 1983-11-15 Hitachi Ltd 線状光源装置
JPS5940532A (ja) * 1982-08-30 1984-03-06 Hitachi Ltd 投影露光方法および装置
US5390044A (en) * 1992-06-03 1995-02-14 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5416630A (en) * 1992-06-03 1995-05-16 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4925898A (enrdf_load_stackoverflow) * 1972-03-16 1974-03-07
JPS5026561A (enrdf_load_stackoverflow) * 1973-03-09 1975-03-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4925898A (enrdf_load_stackoverflow) * 1972-03-16 1974-03-07
JPS5026561A (enrdf_load_stackoverflow) * 1973-03-09 1975-03-19

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS58195840A (ja) * 1982-05-12 1983-11-15 Hitachi Ltd 線状光源装置
JPS5940532A (ja) * 1982-08-30 1984-03-06 Hitachi Ltd 投影露光方法および装置
US5390044A (en) * 1992-06-03 1995-02-14 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5416630A (en) * 1992-06-03 1995-05-16 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus

Also Published As

Publication number Publication date
JPS6349367B2 (enrdf_load_stackoverflow) 1988-10-04

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