JPS6442812A - Production lot number exposure device - Google Patents
Production lot number exposure deviceInfo
- Publication number
- JPS6442812A JPS6442812A JP62200407A JP20040787A JPS6442812A JP S6442812 A JPS6442812 A JP S6442812A JP 62200407 A JP62200407 A JP 62200407A JP 20040787 A JP20040787 A JP 20040787A JP S6442812 A JPS6442812 A JP S6442812A
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- exposed
- exposure device
- lot number
- allows
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54406—Marks applied to semiconductor devices or parts comprising alphanumeric information
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To realize miniaturization and to enable incorporation into another exposure device by changing one part of optical system by providing a scanning mirror which allows the exposure position for a pair of objects to be exposed to be changed, and then by facilitating exposure of lot numbers in stage fixation. CONSTITUTION:A scanning mirror 17 for changing optical path is provided after a reduction lens 16 and then a rotary part 20 is provided to change incident angle of light into an object to be exposed in reference to the light axis L of optical system of lens in a specified angle each time. Then, the scanning width is made smaller and larger where the exposure position is closer to or away from the center of light axis, respectively. Thus, a lot number 21 is formed at an unexposed area (area of metal film 22) on mask exposure. It allows the unit to be compact, cost effective, and to be incorporated into another exposure device since the object to be exposed is fixed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62200407A JPS6442812A (en) | 1987-08-11 | 1987-08-11 | Production lot number exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62200407A JPS6442812A (en) | 1987-08-11 | 1987-08-11 | Production lot number exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6442812A true JPS6442812A (en) | 1989-02-15 |
Family
ID=16423804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62200407A Pending JPS6442812A (en) | 1987-08-11 | 1987-08-11 | Production lot number exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6442812A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01160013A (en) * | 1987-12-17 | 1989-06-22 | Nec Kyushu Ltd | Reduction stepper |
JPH03277521A (en) * | 1990-03-28 | 1991-12-09 | Mitsubishi Heavy Ind Ltd | Injection driving device of injection molding machine |
JPH04104659U (en) * | 1991-02-18 | 1992-09-09 | コニカ株式会社 | photographic material |
-
1987
- 1987-08-11 JP JP62200407A patent/JPS6442812A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01160013A (en) * | 1987-12-17 | 1989-06-22 | Nec Kyushu Ltd | Reduction stepper |
JPH03277521A (en) * | 1990-03-28 | 1991-12-09 | Mitsubishi Heavy Ind Ltd | Injection driving device of injection molding machine |
JPH04104659U (en) * | 1991-02-18 | 1992-09-09 | コニカ株式会社 | photographic material |
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