JPS54117685A - Electron beam exposure unit - Google Patents

Electron beam exposure unit

Info

Publication number
JPS54117685A
JPS54117685A JP2424678A JP2424678A JPS54117685A JP S54117685 A JPS54117685 A JP S54117685A JP 2424678 A JP2424678 A JP 2424678A JP 2424678 A JP2424678 A JP 2424678A JP S54117685 A JPS54117685 A JP S54117685A
Authority
JP
Japan
Prior art keywords
movement
change
electron beam
deltay
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2424678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5620692B2 (enExample
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2424678A priority Critical patent/JPS54117685A/ja
Publication of JPS54117685A publication Critical patent/JPS54117685A/ja
Publication of JPS5620692B2 publication Critical patent/JPS5620692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2424678A 1978-03-03 1978-03-03 Electron beam exposure unit Granted JPS54117685A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2424678A JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2424678A JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Publications (2)

Publication Number Publication Date
JPS54117685A true JPS54117685A (en) 1979-09-12
JPS5620692B2 JPS5620692B2 (enExample) 1981-05-15

Family

ID=12132886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2424678A Granted JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Country Status (1)

Country Link
JP (1) JPS54117685A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5752612U (enExample) * 1980-09-09 1982-03-26
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS5810829A (ja) * 1981-07-06 1983-01-21 エテック・システムズ・インコーポレイテッド ラスタスキヤン装置のスループットの改善方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (enExample) * 1974-04-18 1975-11-22
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (enExample) * 1974-04-18 1975-11-22
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5752612U (enExample) * 1980-09-09 1982-03-26
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS5810829A (ja) * 1981-07-06 1983-01-21 エテック・システムズ・インコーポレイテッド ラスタスキヤン装置のスループットの改善方法

Also Published As

Publication number Publication date
JPS5620692B2 (enExample) 1981-05-15

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