JPS5620692B2 - - Google Patents
Info
- Publication number
- JPS5620692B2 JPS5620692B2 JP2424678A JP2424678A JPS5620692B2 JP S5620692 B2 JPS5620692 B2 JP S5620692B2 JP 2424678 A JP2424678 A JP 2424678A JP 2424678 A JP2424678 A JP 2424678A JP S5620692 B2 JPS5620692 B2 JP S5620692B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2424678A JPS54117685A (en) | 1978-03-03 | 1978-03-03 | Electron beam exposure unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2424678A JPS54117685A (en) | 1978-03-03 | 1978-03-03 | Electron beam exposure unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54117685A JPS54117685A (en) | 1979-09-12 |
| JPS5620692B2 true JPS5620692B2 (enExample) | 1981-05-15 |
Family
ID=12132886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2424678A Granted JPS54117685A (en) | 1978-03-03 | 1978-03-03 | Electron beam exposure unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54117685A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5657037A (en) * | 1979-10-15 | 1981-05-19 | Fujitsu Ltd | Projection exposing method |
| JPH0116934Y2 (enExample) * | 1980-09-09 | 1989-05-17 | ||
| JPS5753938A (en) * | 1980-09-17 | 1982-03-31 | Toshiba Corp | Electron beam exposure apparatus |
| US4445039A (en) * | 1981-07-06 | 1984-04-24 | The Perkin-Elmer Corp. | High throughput/high resolution particle beam system |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
| JPS52139381A (en) * | 1976-05-18 | 1977-11-21 | Toshiba Corp | Electron beam exposure apparatus |
-
1978
- 1978-03-03 JP JP2424678A patent/JPS54117685A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54117685A (en) | 1979-09-12 |