JPS54112658A - Liquid crystal display panel and production of the same - Google Patents

Liquid crystal display panel and production of the same

Info

Publication number
JPS54112658A
JPS54112658A JP1944178A JP1944178A JPS54112658A JP S54112658 A JPS54112658 A JP S54112658A JP 1944178 A JP1944178 A JP 1944178A JP 1944178 A JP1944178 A JP 1944178A JP S54112658 A JPS54112658 A JP S54112658A
Authority
JP
Japan
Prior art keywords
sio
liquid crystal
substrates
production
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1944178A
Other languages
Japanese (ja)
Other versions
JPS644162B2 (en
Inventor
Bunkichi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP1944178A priority Critical patent/JPS54112658A/en
Publication of JPS54112658A publication Critical patent/JPS54112658A/en
Publication of JPS644162B2 publication Critical patent/JPS644162B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

PURPOSE: To achieve the rationalization of panel production by overcoating SiO2 films on the surface of transparent electrodes by the use of orthoalkoxy silane.
CONSTITUTION: A solution of organic solution Si (OR)4 (R is alkyl) of Si is coated on glass substrates 1 provided with transparent electrodes 2. After prefiring, the coatings are fired at a high temperature, whereby SiO2 films 4 are formed to thicknesses 300 to 3000Å. Liquid crystal 3 having been twisted and oriented is sealed in the glass cell formed by opposing the electrodes 2 up and below. Polarizers 5 are then provided on both surfaces and further a reflecting plate 6 is provided on the outer side of one thereof. Al, P or other may be added in the form of Me(OR)x (Me is Al, P, etc.; x is 1 to 8) at a rate of maximum 30% of SiO2 to the abovementioned solution. Thereby, simultaneous coating processing on both surfaces of the substrates and stress relieving of the substrates owing to one side coating may be made possible.
COPYRIGHT: (C)1979,JPO&Japio
JP1944178A 1978-02-22 1978-02-22 Liquid crystal display panel and production of the same Granted JPS54112658A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1944178A JPS54112658A (en) 1978-02-22 1978-02-22 Liquid crystal display panel and production of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1944178A JPS54112658A (en) 1978-02-22 1978-02-22 Liquid crystal display panel and production of the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP28238089A Division JPH02181117A (en) 1989-10-30 1989-10-30 Production of liquid crystal panel

Publications (2)

Publication Number Publication Date
JPS54112658A true JPS54112658A (en) 1979-09-03
JPS644162B2 JPS644162B2 (en) 1989-01-24

Family

ID=11999379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1944178A Granted JPS54112658A (en) 1978-02-22 1978-02-22 Liquid crystal display panel and production of the same

Country Status (1)

Country Link
JP (1) JPS54112658A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5738413A (en) * 1980-08-20 1982-03-03 Seiko Epson Corp Substrate for liquid crystal panel
JPS57191219A (en) * 1981-05-20 1982-11-25 Tokyo Denshi Kagaku Kabushiki Formation of silica coating pattern
US4370028A (en) * 1980-01-14 1983-01-25 Siemens Aktiengesellschaft Method of producing liquid crystal display devices with alignment layer formed from organic tin compound of the type Rn SnX4-n
JPS58199381A (en) * 1982-05-17 1983-11-19 アルプス電気株式会社 Manufacture of liquid crystal display element
US4643531A (en) * 1984-02-15 1987-02-17 Canon Kabushiki Kaisha Liquid crystal panel having an organic indium and/or organic zirconium orientation film
EP0638461A1 (en) * 1993-07-27 1995-02-15 Bayerische Motoren Werke Aktiengesellschaft Mirror, in particular rearview mirror for a vehicle

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370028A (en) * 1980-01-14 1983-01-25 Siemens Aktiengesellschaft Method of producing liquid crystal display devices with alignment layer formed from organic tin compound of the type Rn SnX4-n
JPS5738413A (en) * 1980-08-20 1982-03-03 Seiko Epson Corp Substrate for liquid crystal panel
JPS57191219A (en) * 1981-05-20 1982-11-25 Tokyo Denshi Kagaku Kabushiki Formation of silica coating pattern
JPS58199381A (en) * 1982-05-17 1983-11-19 アルプス電気株式会社 Manufacture of liquid crystal display element
US4643531A (en) * 1984-02-15 1987-02-17 Canon Kabushiki Kaisha Liquid crystal panel having an organic indium and/or organic zirconium orientation film
EP0638461A1 (en) * 1993-07-27 1995-02-15 Bayerische Motoren Werke Aktiengesellschaft Mirror, in particular rearview mirror for a vehicle

Also Published As

Publication number Publication date
JPS644162B2 (en) 1989-01-24

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