JPS5381116A - Radiation sensitive polymer and its working method - Google Patents

Radiation sensitive polymer and its working method

Info

Publication number
JPS5381116A
JPS5381116A JP15703776A JP15703776A JPS5381116A JP S5381116 A JPS5381116 A JP S5381116A JP 15703776 A JP15703776 A JP 15703776A JP 15703776 A JP15703776 A JP 15703776A JP S5381116 A JPS5381116 A JP S5381116A
Authority
JP
Japan
Prior art keywords
working method
radiation sensitive
sensitive polymer
polymer
working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15703776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5528056B2 (show.php
Inventor
Norinaga Fujishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP15703776A priority Critical patent/JPS5381116A/ja
Publication of JPS5381116A publication Critical patent/JPS5381116A/ja
Publication of JPS5528056B2 publication Critical patent/JPS5528056B2/ja
Granted legal-status Critical Current

Links

JP15703776A 1976-12-25 1976-12-25 Radiation sensitive polymer and its working method Granted JPS5381116A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15703776A JPS5381116A (en) 1976-12-25 1976-12-25 Radiation sensitive polymer and its working method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15703776A JPS5381116A (en) 1976-12-25 1976-12-25 Radiation sensitive polymer and its working method

Publications (2)

Publication Number Publication Date
JPS5381116A true JPS5381116A (en) 1978-07-18
JPS5528056B2 JPS5528056B2 (show.php) 1980-07-25

Family

ID=15640803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15703776A Granted JPS5381116A (en) 1976-12-25 1976-12-25 Radiation sensitive polymer and its working method

Country Status (1)

Country Link
JP (1) JPS5381116A (show.php)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5639539A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Pattern forming method
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4745124A (en) * 1978-09-11 1988-05-17 University Of Miami Orally effective anti-hypertensive agents
EP0608983A1 (en) * 1993-01-25 1994-08-03 AT&T Corp. A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
US5384220A (en) * 1990-12-20 1995-01-24 Siemens Aktiengesellschaft Production of photolithographic structures
US6110637A (en) * 1990-12-20 2000-08-29 Siemens Aktinegesellschaft Photoresists which are suitable for producing sub-micron size structures

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050041A (show.php) * 1973-09-03 1975-05-06
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050041A (show.php) * 1973-09-03 1975-05-06
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
US4745124A (en) * 1978-09-11 1988-05-17 University Of Miami Orally effective anti-hypertensive agents
JPS5639539A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Pattern forming method
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
EP0102450A3 (en) * 1982-08-23 1986-10-15 International Business Machines Corporation Resist compositions
US5384220A (en) * 1990-12-20 1995-01-24 Siemens Aktiengesellschaft Production of photolithographic structures
US6110637A (en) * 1990-12-20 2000-08-29 Siemens Aktinegesellschaft Photoresists which are suitable for producing sub-micron size structures
EP0608983A1 (en) * 1993-01-25 1994-08-03 AT&T Corp. A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
US5385809A (en) * 1993-01-25 1995-01-31 At&T Corp. Process for fabricating a device utilizing partially deprotected resist polymers
US5691110A (en) * 1993-01-25 1997-11-25 Lucent Technologies Inc. Process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers

Also Published As

Publication number Publication date
JPS5528056B2 (show.php) 1980-07-25

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