JPS5372572A - Manufacturing device for semiconductor device - Google Patents
Manufacturing device for semiconductor deviceInfo
- Publication number
- JPS5372572A JPS5372572A JP14886576A JP14886576A JPS5372572A JP S5372572 A JPS5372572 A JP S5372572A JP 14886576 A JP14886576 A JP 14886576A JP 14886576 A JP14886576 A JP 14886576A JP S5372572 A JPS5372572 A JP S5372572A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- manufacturing
- substrate
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To ensure a growth of a clean oxide thick film in a short time by storing a tube containing an Si substrate and vapor generator into a high anti-pressure container, supplying the saturation vapor into the tube and oxidizing the Si substrate within a high temperature tube.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51148865A JPS6028138B2 (en) | 1976-12-10 | 1976-12-10 | Semiconductor device manufacturing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51148865A JPS6028138B2 (en) | 1976-12-10 | 1976-12-10 | Semiconductor device manufacturing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5372572A true JPS5372572A (en) | 1978-06-28 |
JPS6028138B2 JPS6028138B2 (en) | 1985-07-03 |
Family
ID=15462456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51148865A Expired JPS6028138B2 (en) | 1976-12-10 | 1976-12-10 | Semiconductor device manufacturing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6028138B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
JPS60122799A (en) * | 1984-05-25 | 1985-07-01 | Hitachi Ltd | Heat treatment of semiconductor wafer |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0190929U (en) * | 1987-12-08 | 1989-06-15 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50114179A (en) * | 1974-02-15 | 1975-09-06 |
-
1976
- 1976-12-10 JP JP51148865A patent/JPS6028138B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50114179A (en) * | 1974-02-15 | 1975-09-06 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
JPS60122799A (en) * | 1984-05-25 | 1985-07-01 | Hitachi Ltd | Heat treatment of semiconductor wafer |
JPH0372599B2 (en) * | 1984-05-25 | 1991-11-19 | Hitachi Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS6028138B2 (en) | 1985-07-03 |
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