JPS5357753A - Diffusion layer formation method to semiconductor substrate - Google Patents

Diffusion layer formation method to semiconductor substrate

Info

Publication number
JPS5357753A
JPS5357753A JP13175476A JP13175476A JPS5357753A JP S5357753 A JPS5357753 A JP S5357753A JP 13175476 A JP13175476 A JP 13175476A JP 13175476 A JP13175476 A JP 13175476A JP S5357753 A JPS5357753 A JP S5357753A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
diffusion layer
formation method
layer formation
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13175476A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5538047B2 (enrdf_load_stackoverflow
Inventor
Keizo Inaba
Toshio Tanabe
Noboru Tatefuru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13175476A priority Critical patent/JPS5357753A/ja
Publication of JPS5357753A publication Critical patent/JPS5357753A/ja
Publication of JPS5538047B2 publication Critical patent/JPS5538047B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP13175476A 1976-11-04 1976-11-04 Diffusion layer formation method to semiconductor substrate Granted JPS5357753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13175476A JPS5357753A (en) 1976-11-04 1976-11-04 Diffusion layer formation method to semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13175476A JPS5357753A (en) 1976-11-04 1976-11-04 Diffusion layer formation method to semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS5357753A true JPS5357753A (en) 1978-05-25
JPS5538047B2 JPS5538047B2 (enrdf_load_stackoverflow) 1980-10-02

Family

ID=15065397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13175476A Granted JPS5357753A (en) 1976-11-04 1976-11-04 Diffusion layer formation method to semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5357753A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109755113A (zh) * 2017-11-01 2019-05-14 天津环鑫科技发展有限公司 一种调节扩散气氛的一次扩散工艺

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109755113A (zh) * 2017-11-01 2019-05-14 天津环鑫科技发展有限公司 一种调节扩散气氛的一次扩散工艺

Also Published As

Publication number Publication date
JPS5538047B2 (enrdf_load_stackoverflow) 1980-10-02

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