JPS52147992A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS52147992A
JPS52147992A JP6489576A JP6489576A JPS52147992A JP S52147992 A JPS52147992 A JP S52147992A JP 6489576 A JP6489576 A JP 6489576A JP 6489576 A JP6489576 A JP 6489576A JP S52147992 A JPS52147992 A JP S52147992A
Authority
JP
Japan
Prior art keywords
film
prevent
manufacture
semiconductor device
insulation film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6489576A
Other languages
Japanese (ja)
Inventor
Yoshikazu Ono
Toshio Sogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6489576A priority Critical patent/JPS52147992A/en
Publication of JPS52147992A publication Critical patent/JPS52147992A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the irregular layer formation due to the reaction between substrate and insulation film at the thermal treatment time as well as to prevent the heat distortion caused by the difference of the heat expansion coefficient in order to eliminate the output drop of a luminous unit by the following procedure: an oxidation is given to the surface of a chemical compound semiconductor substate to form an oxide film, on which an insulation film such as Si3N4 film or Al2O3 film, etc. is coated.
COPYRIGHT: (C)1977,JPO&Japio
JP6489576A 1976-06-02 1976-06-02 Manufacture of semiconductor device Pending JPS52147992A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6489576A JPS52147992A (en) 1976-06-02 1976-06-02 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6489576A JPS52147992A (en) 1976-06-02 1976-06-02 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS52147992A true JPS52147992A (en) 1977-12-08

Family

ID=13271258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6489576A Pending JPS52147992A (en) 1976-06-02 1976-06-02 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS52147992A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156327A (en) * 1979-05-23 1980-12-05 Fujitsu Ltd Manufacture for semiconductor
JPS568828A (en) * 1979-07-04 1981-01-29 Nec Corp Manufacture of semiconductor device
JPS58141524A (en) * 1982-02-17 1983-08-22 Hitachi Ltd Formation of diffusion mask
JPS6188705U (en) * 1984-11-14 1986-06-10

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838692A (en) * 1971-09-10 1973-06-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838692A (en) * 1971-09-10 1973-06-07

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156327A (en) * 1979-05-23 1980-12-05 Fujitsu Ltd Manufacture for semiconductor
JPS5811729B2 (en) * 1979-05-23 1983-03-04 富士通株式会社 Manufacturing method of semiconductor device
JPS568828A (en) * 1979-07-04 1981-01-29 Nec Corp Manufacture of semiconductor device
JPS6232617B2 (en) * 1979-07-04 1987-07-15 Nippon Electric Co
JPS58141524A (en) * 1982-02-17 1983-08-22 Hitachi Ltd Formation of diffusion mask
JPS6188705U (en) * 1984-11-14 1986-06-10

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