JPS5353976A - Diaphragm for electron beam exposure apparatus - Google Patents

Diaphragm for electron beam exposure apparatus

Info

Publication number
JPS5353976A
JPS5353976A JP12892676A JP12892676A JPS5353976A JP S5353976 A JPS5353976 A JP S5353976A JP 12892676 A JP12892676 A JP 12892676A JP 12892676 A JP12892676 A JP 12892676A JP S5353976 A JPS5353976 A JP S5353976A
Authority
JP
Japan
Prior art keywords
diaphragm
electron beam
exposure apparatus
substrate
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12892676A
Other languages
Japanese (ja)
Inventor
Junichi Kai
Toshiro Ichikawa
Yoshihiko Kitahara
Shuzo Oshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12892676A priority Critical patent/JPS5353976A/en
Publication of JPS5353976A publication Critical patent/JPS5353976A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To increase opening formation accuracy and obtain diaphragm free from deformation by providing a thin layer of a different contained impurity or a different concentration from the of a Si substrate on the surface of the Si substrate, opening through-holes for delineating the openings of the diaphragm and forming holes reaching said through-holes from the back of the substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP12892676A 1976-10-27 1976-10-27 Diaphragm for electron beam exposure apparatus Pending JPS5353976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12892676A JPS5353976A (en) 1976-10-27 1976-10-27 Diaphragm for electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12892676A JPS5353976A (en) 1976-10-27 1976-10-27 Diaphragm for electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS5353976A true JPS5353976A (en) 1978-05-16

Family

ID=14996794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12892676A Pending JPS5353976A (en) 1976-10-27 1976-10-27 Diaphragm for electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5353976A (en)

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