JPS5348677A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS5348677A
JPS5348677A JP12296376A JP12296376A JPS5348677A JP S5348677 A JPS5348677 A JP S5348677A JP 12296376 A JP12296376 A JP 12296376A JP 12296376 A JP12296376 A JP 12296376A JP S5348677 A JPS5348677 A JP S5348677A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12296376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5625016B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Noriaki Nakayama
Yasuo Furukawa
Masahiro Okabe
Seigo Igaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12296376A priority Critical patent/JPS5348677A/ja
Publication of JPS5348677A publication Critical patent/JPS5348677A/ja
Publication of JPS5625016B2 publication Critical patent/JPS5625016B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP12296376A 1976-10-15 1976-10-15 Electron beam exposure method Granted JPS5348677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12296376A JPS5348677A (en) 1976-10-15 1976-10-15 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12296376A JPS5348677A (en) 1976-10-15 1976-10-15 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS5348677A true JPS5348677A (en) 1978-05-02
JPS5625016B2 JPS5625016B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-06-10

Family

ID=14848943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12296376A Granted JPS5348677A (en) 1976-10-15 1976-10-15 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5348677A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
JPS5856419A (ja) * 1981-09-30 1983-04-04 Fujitsu Ltd 電子ビ−ム露光方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117569A (en) * 1976-03-30 1977-10-03 Toshiba Corp Electronic beam exposure unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117569A (en) * 1976-03-30 1977-10-03 Toshiba Corp Electronic beam exposure unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
JPS5856419A (ja) * 1981-09-30 1983-04-04 Fujitsu Ltd 電子ビ−ム露光方法

Also Published As

Publication number Publication date
JPS5625016B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-06-10

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