JPS5323568A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5323568A
JPS5323568A JP9847776A JP9847776A JPS5323568A JP S5323568 A JPS5323568 A JP S5323568A JP 9847776 A JP9847776 A JP 9847776A JP 9847776 A JP9847776 A JP 9847776A JP S5323568 A JPS5323568 A JP S5323568A
Authority
JP
Japan
Prior art keywords
semiconductor device
layer
semiconductor
production
maki
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9847776A
Other languages
English (en)
Other versions
JPS5515862B2 (ja
Inventor
Tsukasa Hattori
Yoshio Yamamoto
Kuniyoshi Oe
Takayuki Minamiyama
Osamu Usuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9847776A priority Critical patent/JPS5323568A/ja
Publication of JPS5323568A publication Critical patent/JPS5323568A/ja
Publication of JPS5515862B2 publication Critical patent/JPS5515862B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04026Bonding areas specifically adapted for layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]

Landscapes

  • Die Bonding (AREA)
JP9847776A 1976-08-18 1976-08-18 Semiconductor device Granted JPS5323568A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9847776A JPS5323568A (en) 1976-08-18 1976-08-18 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9847776A JPS5323568A (en) 1976-08-18 1976-08-18 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5323568A true JPS5323568A (en) 1978-03-04
JPS5515862B2 JPS5515862B2 (ja) 1980-04-26

Family

ID=14220722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9847776A Granted JPS5323568A (en) 1976-08-18 1976-08-18 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5323568A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5519806A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519805A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519808A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519807A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS63161631A (ja) * 1986-12-24 1988-07-05 Nec Corp シリコン半導体素子
EP0833384A3 (de) * 1996-09-25 1999-10-13 Siemens Aktiengesellschaft Halbleiterkörper mit Lotmaterialschicht

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3566207A (en) * 1969-05-19 1971-02-23 Singer Co Silicon-to-gold bonded structure and method of making the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3566207A (en) * 1969-05-19 1971-02-23 Singer Co Silicon-to-gold bonded structure and method of making the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5519806A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519805A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519808A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS5519807A (en) * 1978-07-28 1980-02-12 Toshiba Corp Semiconductor device
JPS592174B2 (ja) * 1978-07-28 1984-01-17 株式会社東芝 半導体装置
JPS592175B2 (ja) * 1978-07-28 1984-01-17 株式会社東芝 半導体装置
JPS63161631A (ja) * 1986-12-24 1988-07-05 Nec Corp シリコン半導体素子
EP0833384A3 (de) * 1996-09-25 1999-10-13 Siemens Aktiengesellschaft Halbleiterkörper mit Lotmaterialschicht

Also Published As

Publication number Publication date
JPS5515862B2 (ja) 1980-04-26

Similar Documents

Publication Publication Date Title
JPS5323568A (en) Semiconductor device
JPS52147064A (en) Semiconductor device
JPS5249772A (en) Process for production of semiconductor device
JPS5323569A (en) Semiconductor device
JPS53108389A (en) Manufacture for semiconductor device
JPS51150986A (en) Fabrication method of semiconductor device
JPS542659A (en) Semiconductor device and its manufacture
JPS531471A (en) Manufacture for semiconductor device
JPS5423466A (en) Manufacture for semiconductor device
JPS5279772A (en) Production of semiconductor device
JPS5421283A (en) Manufacture for semiconductor device
JPS5311574A (en) Production of semiconductor device
JPS5390763A (en) Semiconductor element and mask for producing semiconductor element
JPS5383579A (en) Manufacture of semiconductor device
JPS5218167A (en) Production method of semiconductor device
JPS5434755A (en) Manufacture of semiconductor device
JPS52143767A (en) Production of semiconductor device
JPS5329668A (en) Production of semiconductor device
JPS5348459A (en) Production of semiconductor device
JPS5295164A (en) Dividing and cleansing for semi-conductor pellet
JPS5226162A (en) Manufacturing method of semi-conductor crystal
JPS52179A (en) Method of fabricating semiconductor
JPS5223265A (en) Method of processing semiconductor materials
JPS52144272A (en) Forming method of electrode in semiconductor device
JPS5275276A (en) Production of semiconductor device