JPS53147465A - Forming method of patterns for lift-off - Google Patents

Forming method of patterns for lift-off

Info

Publication number
JPS53147465A
JPS53147465A JP6178377A JP6178377A JPS53147465A JP S53147465 A JPS53147465 A JP S53147465A JP 6178377 A JP6178377 A JP 6178377A JP 6178377 A JP6178377 A JP 6178377A JP S53147465 A JPS53147465 A JP S53147465A
Authority
JP
Japan
Prior art keywords
lift
patterns
forming method
resist film
subjecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6178377A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142852B2 (US07494231-20090224-C00006.png
Inventor
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6178377A priority Critical patent/JPS53147465A/ja
Publication of JPS53147465A publication Critical patent/JPS53147465A/ja
Publication of JPS6142852B2 publication Critical patent/JPS6142852B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6178377A 1977-05-27 1977-05-27 Forming method of patterns for lift-off Granted JPS53147465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6178377A JPS53147465A (en) 1977-05-27 1977-05-27 Forming method of patterns for lift-off

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6178377A JPS53147465A (en) 1977-05-27 1977-05-27 Forming method of patterns for lift-off

Publications (2)

Publication Number Publication Date
JPS53147465A true JPS53147465A (en) 1978-12-22
JPS6142852B2 JPS6142852B2 (US07494231-20090224-C00006.png) 1986-09-24

Family

ID=13181022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6178377A Granted JPS53147465A (en) 1977-05-27 1977-05-27 Forming method of patterns for lift-off

Country Status (1)

Country Link
JP (1) JPS53147465A (US07494231-20090224-C00006.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5432975A (en) * 1977-08-19 1979-03-10 Agency Of Ind Science & Technol Formation method of pattern on resist film and resist film
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS5750465A (en) * 1980-09-11 1982-03-24 Fujitsu Ltd Semiconductor memory device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199384U (US07494231-20090224-C00006.png) * 1986-06-06 1987-12-18

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5432975A (en) * 1977-08-19 1979-03-10 Agency Of Ind Science & Technol Formation method of pattern on resist film and resist film
JPS5646258B2 (US07494231-20090224-C00006.png) * 1977-08-19 1981-10-31
JPS56164531A (en) * 1980-05-21 1981-12-17 Hitachi Ltd Manufacture of semiconductor
JPS5750465A (en) * 1980-09-11 1982-03-24 Fujitsu Ltd Semiconductor memory device

Also Published As

Publication number Publication date
JPS6142852B2 (US07494231-20090224-C00006.png) 1986-09-24

Similar Documents

Publication Publication Date Title
GB1276076A (en) Etching film materials
JPS53147465A (en) Forming method of patterns for lift-off
JPS5339075A (en) Step and repeat exposure method of masks
JPS5492061A (en) Micropattern forming method
JPS5258374A (en) Improvement in sensitivity of positive type photo resist
JPS54141573A (en) Mask for exposure
JPS5652751A (en) Photomask correcting method
JPS5421271A (en) Pattern forming method
JPS5443681A (en) Electron beam light-exposing method
JPS52117077A (en) Electron beam-exposing method
JPS5347825A (en) Photoresist exposure
JPS51120671A (en) Photomask fault processing method
JPS5654440A (en) Photosensitive lithographic material and plate making method
JPS53105982A (en) Micropattern formation method
JPS55163841A (en) Method for electron beam exposure
JPS5350978A (en) Electron beam exposure method
JPS5339078A (en) Electron beam exposure method
JPS53114676A (en) Electron beam exposure method
JPS5255867A (en) Exposure method
JPS5712522A (en) Forming method of pattern
JPS5255381A (en) Photo exposure method
JPS53130033A (en) Electron beam sensitive material
JPS56112729A (en) Exposure of electron beam
JPS5580318A (en) Electron-beam exposure
JPS53135844A (en) Photochemical etching procee