JPS53115173A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS53115173A
JPS53115173A JP2920877A JP2920877A JPS53115173A JP S53115173 A JPS53115173 A JP S53115173A JP 2920877 A JP2920877 A JP 2920877A JP 2920877 A JP2920877 A JP 2920877A JP S53115173 A JPS53115173 A JP S53115173A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
electrodes
depositing
integration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2920877A
Other languages
Japanese (ja)
Other versions
JPH0415619B2 (en
Inventor
Mitsumasa Koyanagi
Yoshio Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2920877A priority Critical patent/JPS53115173A/en
Publication of JPS53115173A publication Critical patent/JPS53115173A/en
Publication of JPH0415619B2 publication Critical patent/JPH0415619B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To prevent shorting accident of electrodes and produce a device of high reliability and high scale of integration by depositing Si3N4 and Al2O3 after forming gate electrodes or diffused layers.
COPYRIGHT: (C)1978,JPO&Japio
JP2920877A 1977-03-18 1977-03-18 Production of semiconductor device Granted JPS53115173A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2920877A JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2920877A JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS53115173A true JPS53115173A (en) 1978-10-07
JPH0415619B2 JPH0415619B2 (en) 1992-03-18

Family

ID=12269769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2920877A Granted JPS53115173A (en) 1977-03-18 1977-03-18 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS53115173A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167653A (en) * 1981-03-23 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device
JPS5955054A (en) * 1982-09-24 1984-03-29 Hitachi Ltd Manufacture of semiconductor device
JPS59184523A (en) * 1983-04-05 1984-10-19 Yokogawa Hokushin Electric Corp Manufacture of semiconductor integrated circuit
JPS6012754A (en) * 1983-07-01 1985-01-23 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS61182254A (en) * 1985-02-08 1986-08-14 Hitachi Ltd Manufacture of semiconductor integrated circuit device
JPS62104170A (en) * 1985-10-31 1987-05-14 Matsushita Electronics Corp Mos type semiconductor device
JPH03184368A (en) * 1989-12-13 1991-08-12 Toshiba Corp Manufacture of semiconductor device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50142174A (en) * 1974-05-03 1975-11-15
JPS5191676A (en) * 1975-02-10 1976-08-11
JPS51147272A (en) * 1975-06-13 1976-12-17 Hitachi Ltd Manufacturing process of mis-type field effect transistor
JPS5233490A (en) * 1975-09-09 1977-03-14 Nec Corp Manufacturing process of semiconductor device
JPH0849382A (en) * 1994-08-05 1996-02-20 Misawa Homes Co Ltd Handrail structure of stair

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50142174A (en) * 1974-05-03 1975-11-15
JPS5191676A (en) * 1975-02-10 1976-08-11
JPS51147272A (en) * 1975-06-13 1976-12-17 Hitachi Ltd Manufacturing process of mis-type field effect transistor
JPS5233490A (en) * 1975-09-09 1977-03-14 Nec Corp Manufacturing process of semiconductor device
JPH0849382A (en) * 1994-08-05 1996-02-20 Misawa Homes Co Ltd Handrail structure of stair

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167653A (en) * 1981-03-23 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device
JPS5955054A (en) * 1982-09-24 1984-03-29 Hitachi Ltd Manufacture of semiconductor device
JPS59184523A (en) * 1983-04-05 1984-10-19 Yokogawa Hokushin Electric Corp Manufacture of semiconductor integrated circuit
JPH0257703B2 (en) * 1983-04-05 1990-12-05 Yokogawa Electric Corp
JPS6012754A (en) * 1983-07-01 1985-01-23 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS61182254A (en) * 1985-02-08 1986-08-14 Hitachi Ltd Manufacture of semiconductor integrated circuit device
JPS62104170A (en) * 1985-10-31 1987-05-14 Matsushita Electronics Corp Mos type semiconductor device
JPH03184368A (en) * 1989-12-13 1991-08-12 Toshiba Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPH0415619B2 (en) 1992-03-18

Similar Documents

Publication Publication Date Title
JPS53115173A (en) Production of semiconductor device
JPS5389374A (en) Production of semiconductor device
JPS53128285A (en) Semiconductor device and production of the same
JPS5271978A (en) Production of semiconductor device
JPS5282083A (en) Production of semiconductor device
JPS5357773A (en) Semiconductor device
JPS52154367A (en) Production of semiconductor device
JPS5279654A (en) Production of semiconductor device
JPS5272571A (en) Production of semiconductor device
JPS538076A (en) Production of mis semiconductor device
JPS51112266A (en) Semiconductor device production method
JPS5422171A (en) Manufacture of semiconductor device
JPS53147487A (en) Semiconductor device
JPS5279656A (en) Production of semiconductor device
JPS5223281A (en) Method of manufacturing semiconductor device
JPS547867A (en) Manufacture for semiconductor device
JPS539483A (en) Semiconductor device
JPS5269266A (en) Production of semiconductor device
JPS5389375A (en) Production of semiconductor device
JPS5357780A (en) Production of semiconductor device
JPS5323579A (en) Production of semiconductor device
JPS5258372A (en) Semiconductor device and its production
JPS5311588A (en) Production of semiconductor device
JPS52123872A (en) Semiconductor device and its production
JPS5259570A (en) Semiconductor device