JPS53101279A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS53101279A JPS53101279A JP1576977A JP1576977A JPS53101279A JP S53101279 A JPS53101279 A JP S53101279A JP 1576977 A JP1576977 A JP 1576977A JP 1576977 A JP1576977 A JP 1576977A JP S53101279 A JPS53101279 A JP S53101279A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- keeping
- secure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Or Original Feeding In Electrophotography (AREA)
- Projection-Type Copiers In General (AREA)
- Electron Beam Exposure (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52015769A JPS5946091B2 (ja) | 1977-02-16 | 1977-02-16 | 電子線露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52015769A JPS5946091B2 (ja) | 1977-02-16 | 1977-02-16 | 電子線露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53101279A true JPS53101279A (en) | 1978-09-04 |
JPS5946091B2 JPS5946091B2 (ja) | 1984-11-10 |
Family
ID=11897996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52015769A Expired JPS5946091B2 (ja) | 1977-02-16 | 1977-02-16 | 電子線露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5946091B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5535010U (ja) * | 1978-08-26 | 1980-03-06 |
-
1977
- 1977-02-16 JP JP52015769A patent/JPS5946091B2/ja not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5535010U (ja) * | 1978-08-26 | 1980-03-06 | ||
JPS5652182Y2 (ja) * | 1978-08-26 | 1981-12-05 |
Also Published As
Publication number | Publication date |
---|---|
JPS5946091B2 (ja) | 1984-11-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52119178A (en) | Electron beam exposure device | |
JPS51111076A (en) | Exposure device | |
JPS53105477A (en) | 7-glycylprolylamono-4-methylcoumarine | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS527095A (en) | Laser work device | |
JPS52139381A (en) | Electron beam exposure apparatus | |
JPS53101279A (en) | Electron beam exposure device | |
JPS5390890A (en) | Semiconductor laser device | |
JPS5322375A (en) | Beam blanking device | |
JPS5427844A (en) | Stage apparatus | |
JPS5332677A (en) | Electron beam exposure apparatus | |
JPS5375768A (en) | Size check pattern | |
JPS5434091A (en) | Constructing device for long material with offset | |
JPS5437474A (en) | Electron beam exposure device | |
JPS52117578A (en) | Electron beam exposing method | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS5216171A (en) | Mask fitting device | |
JPS53140963A (en) | Scanning electronic microscope | |
JPS53120277A (en) | Electron beam exposure device | |
JPS5353975A (en) | Electronic beam exposure device | |
JPS5276879A (en) | Counting device for number of exposure times of electron beam exposure device | |
JPS5349957A (en) | Focusing method for electronic beam exposure device | |
JPS53145476A (en) | Electron beam exposure apparatus | |
JPS52120761A (en) | Exposure unit | |
JPS5360162A (en) | Electron beam irradiation device |