JPS5271171A - Production of epitaxial wafer - Google Patents
Production of epitaxial waferInfo
- Publication number
- JPS5271171A JPS5271171A JP14759375A JP14759375A JPS5271171A JP S5271171 A JPS5271171 A JP S5271171A JP 14759375 A JP14759375 A JP 14759375A JP 14759375 A JP14759375 A JP 14759375A JP S5271171 A JPS5271171 A JP S5271171A
- Authority
- JP
- Japan
- Prior art keywords
- production
- epitaxial wafer
- recess
- susceptor
- placing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To correct substrate temperature distribution during growing and prevent autodoping by placing a spacer formed with a recess on the surface of a susceptor with its recess being contacted with the susceptor placing a semiconductor substrate on the flat face side of a spacer to be subjected to epitaxial growth.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14759375A JPS5271171A (en) | 1975-12-10 | 1975-12-10 | Production of epitaxial wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14759375A JPS5271171A (en) | 1975-12-10 | 1975-12-10 | Production of epitaxial wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5271171A true JPS5271171A (en) | 1977-06-14 |
JPS5526613B2 JPS5526613B2 (en) | 1980-07-15 |
Family
ID=15433849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14759375A Granted JPS5271171A (en) | 1975-12-10 | 1975-12-10 | Production of epitaxial wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5271171A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5446270U (en) * | 1977-09-05 | 1979-03-30 | ||
JPS55121649A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device |
JPS57203545U (en) * | 1981-06-19 | 1982-12-24 | ||
JPS5890725A (en) * | 1981-11-26 | 1983-05-30 | Fujitsu Ltd | Substrate holder for vapor growth apparatus |
JPS60116229U (en) * | 1984-01-10 | 1985-08-06 | 日本電気株式会社 | Heat generating carrier for semiconductor wafer |
JPH10223546A (en) * | 1997-02-10 | 1998-08-21 | Toshiba Ceramics Co Ltd | Susceptor for chemical vapor deposition |
JP2013168410A (en) * | 2012-02-14 | 2013-08-29 | Mitsubishi Electric Corp | Wafer holder, film formation device, and film formation method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4945681A (en) * | 1972-07-01 | 1974-05-01 | ||
JPS5096182A (en) * | 1973-12-24 | 1975-07-31 |
-
1975
- 1975-12-10 JP JP14759375A patent/JPS5271171A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4945681A (en) * | 1972-07-01 | 1974-05-01 | ||
JPS5096182A (en) * | 1973-12-24 | 1975-07-31 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5446270U (en) * | 1977-09-05 | 1979-03-30 | ||
JPS55121649A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device |
JPS57203545U (en) * | 1981-06-19 | 1982-12-24 | ||
JPS5890725A (en) * | 1981-11-26 | 1983-05-30 | Fujitsu Ltd | Substrate holder for vapor growth apparatus |
JPS60116229U (en) * | 1984-01-10 | 1985-08-06 | 日本電気株式会社 | Heat generating carrier for semiconductor wafer |
JPH10223546A (en) * | 1997-02-10 | 1998-08-21 | Toshiba Ceramics Co Ltd | Susceptor for chemical vapor deposition |
JP2013168410A (en) * | 2012-02-14 | 2013-08-29 | Mitsubishi Electric Corp | Wafer holder, film formation device, and film formation method |
Also Published As
Publication number | Publication date |
---|---|
JPS5526613B2 (en) | 1980-07-15 |
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