JPS5271171A - Production of epitaxial wafer - Google Patents

Production of epitaxial wafer

Info

Publication number
JPS5271171A
JPS5271171A JP14759375A JP14759375A JPS5271171A JP S5271171 A JPS5271171 A JP S5271171A JP 14759375 A JP14759375 A JP 14759375A JP 14759375 A JP14759375 A JP 14759375A JP S5271171 A JPS5271171 A JP S5271171A
Authority
JP
Japan
Prior art keywords
production
epitaxial wafer
recess
susceptor
placing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14759375A
Other languages
Japanese (ja)
Other versions
JPS5526613B2 (en
Inventor
Itaru Yamanaka
Katsunobu Nakagawa
Hideaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP14759375A priority Critical patent/JPS5271171A/en
Publication of JPS5271171A publication Critical patent/JPS5271171A/en
Publication of JPS5526613B2 publication Critical patent/JPS5526613B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To correct substrate temperature distribution during growing and prevent autodoping by placing a spacer formed with a recess on the surface of a susceptor with its recess being contacted with the susceptor placing a semiconductor substrate on the flat face side of a spacer to be subjected to epitaxial growth.
COPYRIGHT: (C)1977,JPO&Japio
JP14759375A 1975-12-10 1975-12-10 Production of epitaxial wafer Granted JPS5271171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14759375A JPS5271171A (en) 1975-12-10 1975-12-10 Production of epitaxial wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14759375A JPS5271171A (en) 1975-12-10 1975-12-10 Production of epitaxial wafer

Publications (2)

Publication Number Publication Date
JPS5271171A true JPS5271171A (en) 1977-06-14
JPS5526613B2 JPS5526613B2 (en) 1980-07-15

Family

ID=15433849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14759375A Granted JPS5271171A (en) 1975-12-10 1975-12-10 Production of epitaxial wafer

Country Status (1)

Country Link
JP (1) JPS5271171A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5446270U (en) * 1977-09-05 1979-03-30
JPS55121649A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS57203545U (en) * 1981-06-19 1982-12-24
JPS5890725A (en) * 1981-11-26 1983-05-30 Fujitsu Ltd Substrate holder for vapor growth apparatus
JPS60116229U (en) * 1984-01-10 1985-08-06 日本電気株式会社 Heat generating carrier for semiconductor wafer
JPH10223546A (en) * 1997-02-10 1998-08-21 Toshiba Ceramics Co Ltd Susceptor for chemical vapor deposition
JP2013168410A (en) * 2012-02-14 2013-08-29 Mitsubishi Electric Corp Wafer holder, film formation device, and film formation method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945681A (en) * 1972-07-01 1974-05-01
JPS5096182A (en) * 1973-12-24 1975-07-31

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945681A (en) * 1972-07-01 1974-05-01
JPS5096182A (en) * 1973-12-24 1975-07-31

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5446270U (en) * 1977-09-05 1979-03-30
JPS55121649A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS57203545U (en) * 1981-06-19 1982-12-24
JPS5890725A (en) * 1981-11-26 1983-05-30 Fujitsu Ltd Substrate holder for vapor growth apparatus
JPS60116229U (en) * 1984-01-10 1985-08-06 日本電気株式会社 Heat generating carrier for semiconductor wafer
JPH10223546A (en) * 1997-02-10 1998-08-21 Toshiba Ceramics Co Ltd Susceptor for chemical vapor deposition
JP2013168410A (en) * 2012-02-14 2013-08-29 Mitsubishi Electric Corp Wafer holder, film formation device, and film formation method

Also Published As

Publication number Publication date
JPS5526613B2 (en) 1980-07-15

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