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Fujitsu Ltd
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Fujitsu Ltd
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Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP3871277ApriorityCriticalpatent/JPS53123660A/en
Publication of JPS53123660ApublicationCriticalpatent/JPS53123660A/en
PURPOSE: To simplify the process of removing an unneeded grown layer on a susceptor by simultaneously etching both the surfaces of the susceptor and by using one surface for the next growth when a wafer to be epitaxy-grown is mounted on the other surface of the susceptor and a mirror-surface process is done.