JPS5268382A - Semiconductor circuit unit - Google Patents

Semiconductor circuit unit

Info

Publication number
JPS5268382A
JPS5268382A JP50143995A JP14399575A JPS5268382A JP S5268382 A JPS5268382 A JP S5268382A JP 50143995 A JP50143995 A JP 50143995A JP 14399575 A JP14399575 A JP 14399575A JP S5268382 A JPS5268382 A JP S5268382A
Authority
JP
Japan
Prior art keywords
circuit unit
semiconductor circuit
operating
power consumption
field effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50143995A
Other languages
English (en)
Other versions
JPS5751952B2 (ja
Inventor
Shojiro Asai
Toshiaki Masuhara
Kenji Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50143995A priority Critical patent/JPS5268382A/ja
Priority to US05/744,864 priority patent/US4089022A/en
Priority to DE19762654677 priority patent/DE2654677A1/de
Priority to NL7613529A priority patent/NL7613529A/xx
Publication of JPS5268382A publication Critical patent/JPS5268382A/ja
Publication of JPS5751952B2 publication Critical patent/JPS5751952B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/7302Bipolar junction transistors structurally associated with other devices
    • H01L29/7304Bipolar junction transistors structurally associated with other devices the device being a resistive element, e.g. ballasting resistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Logic Circuits (AREA)
JP50143995A 1975-12-05 1975-12-05 Semiconductor circuit unit Granted JPS5268382A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP50143995A JPS5268382A (en) 1975-12-05 1975-12-05 Semiconductor circuit unit
US05/744,864 US4089022A (en) 1975-12-05 1976-11-24 Electron device
DE19762654677 DE2654677A1 (de) 1975-12-05 1976-12-02 Elektronische schaltungseinheit
NL7613529A NL7613529A (nl) 1975-12-05 1976-12-03 Actieve elektronische inrichting.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50143995A JPS5268382A (en) 1975-12-05 1975-12-05 Semiconductor circuit unit

Publications (2)

Publication Number Publication Date
JPS5268382A true JPS5268382A (en) 1977-06-07
JPS5751952B2 JPS5751952B2 (ja) 1982-11-05

Family

ID=15351851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50143995A Granted JPS5268382A (en) 1975-12-05 1975-12-05 Semiconductor circuit unit

Country Status (4)

Country Link
US (1) US4089022A (ja)
JP (1) JPS5268382A (ja)
DE (1) DE2654677A1 (ja)
NL (1) NL7613529A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53158725U (ja) * 1977-05-18 1978-12-12
JPS58207672A (ja) * 1982-04-23 1983-12-03 サ−トル・エレクトロニク・オルロジユ−ル・ソシエテ・アノニム 半導体装置
JP2008118497A (ja) * 2006-11-07 2008-05-22 Nippon Signal Co Ltd:The カレントミラー回路及びカレントミラー回路の利得制御装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2411512A1 (fr) * 1977-12-06 1979-07-06 Lardy Jean Louis Porte logique a transistor mos multidrain
DE2947311C2 (de) * 1978-11-24 1982-04-01 Hitachi, Ltd., Tokyo Integrierte Halbleiterschaltung
FR2457605A2 (fr) * 1979-05-21 1980-12-19 France Etat Perfectionnements aux portes logiques a transistors mos multidrains
FR2497404A1 (fr) * 1980-12-29 1982-07-02 Thomson Csf Transistor mos a fonctionnement bipolaire en saturation
US4441117A (en) * 1981-07-27 1984-04-03 Intersil, Inc. Monolithically merged field effect transistor and bipolar junction transistor
US4590664A (en) * 1983-07-29 1986-05-27 Harris Corporation Method of fabricating low noise reference diodes and transistors
WO1985003161A1 (en) * 1983-12-29 1985-07-18 Semi Processes, Inc. A programmable logic array circuit
US6232822B1 (en) * 1988-01-08 2001-05-15 Kabushiki Kaisha Toshiba Semiconductor device including a bipolar transistor biased to produce a negative base current by the impact ionization mechanism
US5079606A (en) * 1989-01-26 1992-01-07 Casio Computer Co., Ltd. Thin-film memory element
JPH03203095A (ja) * 1989-12-28 1991-09-04 Texas Instr Japan Ltd 半導体記憶装置
US5315143A (en) * 1992-04-28 1994-05-24 Matsushita Electric Industrial Co., Ltd. High density integrated semiconductor device
US5614424A (en) * 1996-01-16 1997-03-25 Taiwan Semiconductor Manufacturing Company Ltd. Method for fabricating an accumulated-base bipolar junction transistor
US6245607B1 (en) 1998-12-28 2001-06-12 Industrial Technology Research Institute Buried channel quasi-unipolar transistor
US7029981B2 (en) * 2004-06-25 2006-04-18 Intersil Americas, Inc. Radiation hardened bipolar junction transistor
WO2009019866A1 (ja) * 2007-08-07 2009-02-12 Kaori Takakubo 半導体装置及びその駆動方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2900531A (en) * 1957-02-28 1959-08-18 Rca Corp Field-effect transistor
GB1217880A (en) * 1967-10-13 1970-12-31 Rca Corp Lateral transistor with auxiliary control electrode
US3673428A (en) * 1970-09-18 1972-06-27 Rca Corp Input transient protection for complementary insulated gate field effect transistor integrated circuit device
US3974515A (en) * 1974-09-12 1976-08-10 Rca Corporation IGFET on an insulating substrate
US3967295A (en) * 1975-04-03 1976-06-29 Rca Corporation Input transient protection for integrated circuit element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53158725U (ja) * 1977-05-18 1978-12-12
JPS554097Y2 (ja) * 1977-05-18 1980-01-30
JPS58207672A (ja) * 1982-04-23 1983-12-03 サ−トル・エレクトロニク・オルロジユ−ル・ソシエテ・アノニム 半導体装置
JP2008118497A (ja) * 2006-11-07 2008-05-22 Nippon Signal Co Ltd:The カレントミラー回路及びカレントミラー回路の利得制御装置

Also Published As

Publication number Publication date
NL7613529A (nl) 1977-06-07
JPS5751952B2 (ja) 1982-11-05
US4089022A (en) 1978-05-09
DE2654677A1 (de) 1977-06-08

Similar Documents

Publication Publication Date Title
JPS5268382A (en) Semiconductor circuit unit
JPS51150261A (en) Pnpn switch driving system
JPS5286049A (en) Semiconductor switch
JPS52155984A (en) Charge transfer device
JPS5214345A (en) Transistor sparking circuit
JPS5221754A (en) Oscillation circuit
JPS5264830A (en) Power source supply system of integrated injection logical circuit
JPS53121561A (en) Mos integrated circuit device
JPS53105357A (en) Complementary circuit for field effct transistor
JPS5229144A (en) Oscillation circuit
JPS5271970A (en) Insulated gate type electric field effect transistor circuit
JPS5380156A (en) Semiconductor logical circuit device
JPS51113577A (en) Bipolar semi-conductor integrated circuit
JPS5277680A (en) Semiconductor integrated circuit
JPS533764A (en) Low power consumption oscillating circuit
JPS5266366A (en) Semiconductor logic circuit
JPS5252557A (en) Inverter circuit
JPS5210088A (en) Structure of semiconductor integrated circuit
JPS5383480A (en) Semiconductor device
JPS5295135A (en) Semi-conductor logic circuit
JPS533153A (en) Oscillation circuit of electronic watch
JPS5354981A (en) Semiconductor logic circuit device
JPS5250181A (en) Semiconductor integrated circuit device
JPS5267581A (en) Semiconductor integrated circuit
JPS5216954A (en) Sepp output circuit

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20090214

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20090214

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20090214

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20090214

S631 Written request for registration of reclamation of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313631

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090214

Year of fee payment: 6

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S631 Written request for registration of reclamation of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313631

S634 Written request for registration of reclamation of nationality

Free format text: JAPANESE INTERMEDIATE CODE: R313634

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090214

Year of fee payment: 6

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 6

Free format text: PAYMENT UNTIL: 20090214

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 7

Free format text: PAYMENT UNTIL: 20100214

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 7

Free format text: PAYMENT UNTIL: 20100214

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110214

Year of fee payment: 8

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 9

Free format text: PAYMENT UNTIL: 20120214

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 10

Free format text: PAYMENT UNTIL: 20130214

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140214

Year of fee payment: 11

EXPY Cancellation because of completion of term