JPS5252579A - Clearance adjusng method - Google Patents

Clearance adjusng method

Info

Publication number
JPS5252579A
JPS5252579A JP50129104A JP12910475A JPS5252579A JP S5252579 A JPS5252579 A JP S5252579A JP 50129104 A JP50129104 A JP 50129104A JP 12910475 A JP12910475 A JP 12910475A JP S5252579 A JPS5252579 A JP S5252579A
Authority
JP
Japan
Prior art keywords
clearance
adjusng
transparent
light
reflectable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50129104A
Other languages
English (en)
Japanese (ja)
Other versions
JPS579004B2 (enrdf_load_stackoverflow
Inventor
Nobuyoshi Tanaka
Mitsuo Takeda
Kazuya Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP50129104A priority Critical patent/JPS5252579A/ja
Publication of JPS5252579A publication Critical patent/JPS5252579A/ja
Publication of JPS579004B2 publication Critical patent/JPS579004B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection-Type Copiers In General (AREA)
JP50129104A 1975-10-27 1975-10-27 Clearance adjusng method Granted JPS5252579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50129104A JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50129104A JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Publications (2)

Publication Number Publication Date
JPS5252579A true JPS5252579A (en) 1977-04-27
JPS579004B2 JPS579004B2 (enrdf_load_stackoverflow) 1982-02-19

Family

ID=15001156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50129104A Granted JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Country Status (1)

Country Link
JP (1) JPS5252579A (enrdf_load_stackoverflow)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS56164550U (enrdf_load_stackoverflow) * 1980-05-08 1981-12-07
JPS56164549U (enrdf_load_stackoverflow) * 1980-05-08 1981-12-07
JPS5712743U (enrdf_load_stackoverflow) * 1980-06-23 1982-01-22
JPS5737246U (enrdf_load_stackoverflow) * 1980-08-13 1982-02-27
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5875834A (ja) * 1981-10-30 1983-05-07 Hitachi Ltd プロキシミティ露光装置
JPS58103136A (ja) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> 基板の傾き設定装置
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS58175631U (ja) * 1982-05-18 1983-11-24 株式会社東芝 平行出し装置
JPS5917247A (ja) * 1982-07-21 1984-01-28 Hitachi Ltd 露光装置
JPS5933828A (ja) * 1982-08-04 1984-02-23 ザ・パ−キン−エルマ−・コ−ポレイシヨン Ｘ線リトグラフイ−に使用するためのマスク又はウエフア−素子を心合せしかつ空間制御する装置
JPS5975625A (ja) * 1982-10-22 1984-04-28 Fujitsu Ltd 基板支持方法
JPS6099671A (ja) * 1983-11-04 1985-06-03 Canon Inc 熱転写記録装置
JPS60100004A (ja) * 1983-11-04 1985-06-03 Canon Inc 間隔調整装置
JPS60100005A (ja) * 1983-11-04 1985-06-03 Canon Inc 間隔調整装置
JPS611021A (ja) * 1985-05-13 1986-01-07 Hitachi Ltd 露光装置における位置設定方法
JPS62279629A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd プロキシミテイ方式の露光装置
JPS6350708A (ja) * 1986-08-20 1988-03-03 Fujitsu Ltd ウエハ・マスク間ギャップ合わせ方法
US4932781A (en) * 1983-11-04 1990-06-12 Canon Kabushiki Kaisha Gap measuring apparatus using interference fringes of reflected light
WO2017018184A1 (ja) * 2015-07-29 2017-02-02 三菱重工業株式会社 隙間計測装置、及び、隙間管理システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4722213U (enrdf_load_stackoverflow) * 1971-04-09 1972-11-13
JPS49122756A (enrdf_load_stackoverflow) * 1973-03-26 1974-11-25

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4722213U (enrdf_load_stackoverflow) * 1971-04-09 1972-11-13
JPS49122756A (enrdf_load_stackoverflow) * 1973-03-26 1974-11-25

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS56164550U (enrdf_load_stackoverflow) * 1980-05-08 1981-12-07
JPS56164549U (enrdf_load_stackoverflow) * 1980-05-08 1981-12-07
JPS5712743U (enrdf_load_stackoverflow) * 1980-06-23 1982-01-22
JPS5737246U (enrdf_load_stackoverflow) * 1980-08-13 1982-02-27
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5875834A (ja) * 1981-10-30 1983-05-07 Hitachi Ltd プロキシミティ露光装置
JPS58103136A (ja) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> 基板の傾き設定装置
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS58175631U (ja) * 1982-05-18 1983-11-24 株式会社東芝 平行出し装置
JPS5917247A (ja) * 1982-07-21 1984-01-28 Hitachi Ltd 露光装置
JPS5933828A (ja) * 1982-08-04 1984-02-23 ザ・パ−キン−エルマ−・コ−ポレイシヨン Ｘ線リトグラフイ−に使用するためのマスク又はウエフア−素子を心合せしかつ空間制御する装置
JPS5975625A (ja) * 1982-10-22 1984-04-28 Fujitsu Ltd 基板支持方法
JPS6099671A (ja) * 1983-11-04 1985-06-03 Canon Inc 熱転写記録装置
JPS60100004A (ja) * 1983-11-04 1985-06-03 Canon Inc 間隔調整装置
JPS60100005A (ja) * 1983-11-04 1985-06-03 Canon Inc 間隔調整装置
US4932781A (en) * 1983-11-04 1990-06-12 Canon Kabushiki Kaisha Gap measuring apparatus using interference fringes of reflected light
JPS611021A (ja) * 1985-05-13 1986-01-07 Hitachi Ltd 露光装置における位置設定方法
JPS62279629A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd プロキシミテイ方式の露光装置
JPS6350708A (ja) * 1986-08-20 1988-03-03 Fujitsu Ltd ウエハ・マスク間ギャップ合わせ方法
WO2017018184A1 (ja) * 2015-07-29 2017-02-02 三菱重工業株式会社 隙間計測装置、及び、隙間管理システム
JP2017032308A (ja) * 2015-07-29 2017-02-09 三菱重工業株式会社 隙間計測装置、及び、隙間管理システム
CN107636417A (zh) * 2015-07-29 2018-01-26 三菱重工业株式会社 间隙测量装置及间隙管理系统

Also Published As

Publication number Publication date
JPS579004B2 (enrdf_load_stackoverflow) 1982-02-19

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