JPS49122756A - - Google Patents
Info
- Publication number
- JPS49122756A JPS49122756A JP48033605A JP3360573A JPS49122756A JP S49122756 A JPS49122756 A JP S49122756A JP 48033605 A JP48033605 A JP 48033605A JP 3360573 A JP3360573 A JP 3360573A JP S49122756 A JPS49122756 A JP S49122756A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48033605A JPS5243692B2 (enrdf_load_stackoverflow) | 1973-03-26 | 1973-03-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48033605A JPS5243692B2 (enrdf_load_stackoverflow) | 1973-03-26 | 1973-03-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49122756A true JPS49122756A (enrdf_load_stackoverflow) | 1974-11-25 |
| JPS5243692B2 JPS5243692B2 (enrdf_load_stackoverflow) | 1977-11-01 |
Family
ID=12391092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48033605A Expired JPS5243692B2 (enrdf_load_stackoverflow) | 1973-03-26 | 1973-03-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5243692B2 (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5173194U (enrdf_load_stackoverflow) * | 1974-12-06 | 1976-06-09 | ||
| JPS5252579A (en) * | 1975-10-27 | 1977-04-27 | Canon Inc | Clearance adjusng method |
| JPS5381569U (enrdf_load_stackoverflow) * | 1976-12-09 | 1978-07-06 | ||
| JPS5933828A (ja) * | 1982-08-04 | 1984-02-23 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | Ｘ線リトグラフイ−に使用するためのマスク又はウエフア−素子を心合せしかつ空間制御する装置 |
| JPS62185318A (ja) * | 1986-02-10 | 1987-08-13 | Nippon Kogaku Kk <Nikon> | 露光装置 |
| JPS62279629A (ja) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | プロキシミテイ方式の露光装置 |
-
1973
- 1973-03-26 JP JP48033605A patent/JPS5243692B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5173194U (enrdf_load_stackoverflow) * | 1974-12-06 | 1976-06-09 | ||
| JPS5252579A (en) * | 1975-10-27 | 1977-04-27 | Canon Inc | Clearance adjusng method |
| JPS5381569U (enrdf_load_stackoverflow) * | 1976-12-09 | 1978-07-06 | ||
| JPS5933828A (ja) * | 1982-08-04 | 1984-02-23 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | Ｘ線リトグラフイ−に使用するためのマスク又はウエフア−素子を心合せしかつ空間制御する装置 |
| JPS62185318A (ja) * | 1986-02-10 | 1987-08-13 | Nippon Kogaku Kk <Nikon> | 露光装置 |
| JPS62279629A (ja) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | プロキシミテイ方式の露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5243692B2 (enrdf_load_stackoverflow) | 1977-11-01 |