JPS523390A - Manufacturing method of semiconductor device - Google Patents

Manufacturing method of semiconductor device

Info

Publication number
JPS523390A
JPS523390A JP7934475A JP7934475A JPS523390A JP S523390 A JPS523390 A JP S523390A JP 7934475 A JP7934475 A JP 7934475A JP 7934475 A JP7934475 A JP 7934475A JP S523390 A JPS523390 A JP S523390A
Authority
JP
Japan
Prior art keywords
manufacturing
semiconductor device
contact hole
stepped portion
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7934475A
Other languages
Japanese (ja)
Inventor
Mamoru Kanazawa
Shigeharu Horiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7934475A priority Critical patent/JPS523390A/en
Publication of JPS523390A publication Critical patent/JPS523390A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: Preventing aluminium wiring from disconnection by providing phosphorus-contained low temperature oxided film for covering the stepped portion and smoothing the stepped portion of a contact hole through resolution, by effecting twice a photograph etching process for providing the contact hole.
COPYRIGHT: (C)1977,JPO&Japio
JP7934475A 1975-06-27 1975-06-27 Manufacturing method of semiconductor device Pending JPS523390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7934475A JPS523390A (en) 1975-06-27 1975-06-27 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7934475A JPS523390A (en) 1975-06-27 1975-06-27 Manufacturing method of semiconductor device

Publications (1)

Publication Number Publication Date
JPS523390A true JPS523390A (en) 1977-01-11

Family

ID=13687274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7934475A Pending JPS523390A (en) 1975-06-27 1975-06-27 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS523390A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5591872A (en) * 1978-12-29 1980-07-11 Nec Corp Manufacture of semiconductor device
JPS5591871A (en) * 1978-12-29 1980-07-11 Nec Corp Manufacture of semiconductor device
JPS57102052A (en) * 1980-12-17 1982-06-24 Seiko Epson Corp Manufacture of semiconductor device
JPS57167633A (en) * 1981-03-16 1982-10-15 Fairchild Camera Instr Co Method of flowing and densifying phosphosilicate glass for integrated circuit
JPS60132345A (en) * 1983-12-02 1985-07-15 Yokogawa Hewlett Packard Ltd Manufacture of semiconductor element
JPS63296245A (en) * 1988-01-07 1988-12-02 Sony Corp Manufacture of semiconductor device
JPH0786402A (en) * 1993-09-14 1995-03-31 Nec Corp Semiconductor device and its manufacture
JPH0799168A (en) * 1994-06-22 1995-04-11 Toshiba Corp Semiconductor device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5591872A (en) * 1978-12-29 1980-07-11 Nec Corp Manufacture of semiconductor device
JPS5591871A (en) * 1978-12-29 1980-07-11 Nec Corp Manufacture of semiconductor device
JPS6255312B2 (en) * 1978-12-29 1987-11-19 Nippon Denki Kk
JPS57102052A (en) * 1980-12-17 1982-06-24 Seiko Epson Corp Manufacture of semiconductor device
JPS57167633A (en) * 1981-03-16 1982-10-15 Fairchild Camera Instr Co Method of flowing and densifying phosphosilicate glass for integrated circuit
JPS60132345A (en) * 1983-12-02 1985-07-15 Yokogawa Hewlett Packard Ltd Manufacture of semiconductor element
JPH0535576B2 (en) * 1983-12-02 1993-05-26 Hewlett Packard Co
JPS63296245A (en) * 1988-01-07 1988-12-02 Sony Corp Manufacture of semiconductor device
JPH0786402A (en) * 1993-09-14 1995-03-31 Nec Corp Semiconductor device and its manufacture
JPH0799168A (en) * 1994-06-22 1995-04-11 Toshiba Corp Semiconductor device

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