JPS5227372A - Photo mask processing system and its device - Google Patents
Photo mask processing system and its deviceInfo
- Publication number
- JPS5227372A JPS5227372A JP10303175A JP10303175A JPS5227372A JP S5227372 A JPS5227372 A JP S5227372A JP 10303175 A JP10303175 A JP 10303175A JP 10303175 A JP10303175 A JP 10303175A JP S5227372 A JPS5227372 A JP S5227372A
- Authority
- JP
- Japan
- Prior art keywords
- processing system
- photo mask
- mask processing
- roughness
- minimized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303175A JPS5227372A (en) | 1975-08-27 | 1975-08-27 | Photo mask processing system and its device |
GB35575/76A GB1554296A (en) | 1975-08-27 | 1976-08-26 | Removal of defects from photomasks |
NL7609502A NL7609502A (nl) | 1975-08-27 | 1976-08-26 | Verwerking van fotomaskers voor het vervaardi- gen van geintegreerde schakelingen. |
DE19762638474 DE2638474A1 (de) | 1975-08-27 | 1976-08-26 | Verfahren zur herstellung einer fotomaske |
US05/922,369 US4190759A (en) | 1975-08-27 | 1978-07-06 | Processing of photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303175A JPS5227372A (en) | 1975-08-27 | 1975-08-27 | Photo mask processing system and its device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5227372A true JPS5227372A (en) | 1977-03-01 |
JPS5324787B2 JPS5324787B2 (ja) | 1978-07-22 |
Family
ID=14343273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10303175A Granted JPS5227372A (en) | 1975-08-27 | 1975-08-27 | Photo mask processing system and its device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5227372A (ja) |
DE (1) | DE2638474A1 (ja) |
GB (1) | GB1554296A (ja) |
NL (1) | NL7609502A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53120377A (en) * | 1977-03-30 | 1978-10-20 | Nec Corp | Laser machining apparatus for correction of photo masks |
JPS5871617A (ja) * | 1981-10-23 | 1983-04-28 | Nec Corp | レ−ザアニ−リング装置 |
JPS5892026U (ja) * | 1981-12-16 | 1983-06-22 | 呉羽合繊株式会社 | 捲物用帯状体 |
JPS61168726A (ja) * | 1985-01-21 | 1986-07-30 | Norin Kogyosha:Goushi | ガス遮断装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4548883A (en) * | 1983-05-31 | 1985-10-22 | At&T Bell Laboratories | Correction of lithographic masks |
US5338645A (en) * | 1986-06-16 | 1994-08-16 | Motorola, Inc. | Three dimensional printed circuits |
US6341009B1 (en) * | 2000-02-24 | 2002-01-22 | Quantronix Corporation | Laser delivery system and method for photolithographic mask repair |
-
1975
- 1975-08-27 JP JP10303175A patent/JPS5227372A/ja active Granted
-
1976
- 1976-08-26 GB GB35575/76A patent/GB1554296A/en not_active Expired
- 1976-08-26 NL NL7609502A patent/NL7609502A/xx not_active Application Discontinuation
- 1976-08-26 DE DE19762638474 patent/DE2638474A1/de active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53120377A (en) * | 1977-03-30 | 1978-10-20 | Nec Corp | Laser machining apparatus for correction of photo masks |
JPS5541018B2 (ja) * | 1977-03-30 | 1980-10-21 | ||
JPS5871617A (ja) * | 1981-10-23 | 1983-04-28 | Nec Corp | レ−ザアニ−リング装置 |
JPS5892026U (ja) * | 1981-12-16 | 1983-06-22 | 呉羽合繊株式会社 | 捲物用帯状体 |
JPS61168726A (ja) * | 1985-01-21 | 1986-07-30 | Norin Kogyosha:Goushi | ガス遮断装置 |
Also Published As
Publication number | Publication date |
---|---|
NL7609502A (nl) | 1977-03-01 |
JPS5324787B2 (ja) | 1978-07-22 |
GB1554296A (en) | 1979-10-17 |
DE2638474B2 (ja) | 1978-05-03 |
DE2638474C3 (ja) | 1979-01-04 |
DE2638474A1 (de) | 1977-03-10 |
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