JPS5214112B2 - - Google Patents

Info

Publication number
JPS5214112B2
JPS5214112B2 JP48021636A JP2163673A JPS5214112B2 JP S5214112 B2 JPS5214112 B2 JP S5214112B2 JP 48021636 A JP48021636 A JP 48021636A JP 2163673 A JP2163673 A JP 2163673A JP S5214112 B2 JPS5214112 B2 JP S5214112B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48021636A
Other versions
JPS49111665A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48021636A priority Critical patent/JPS5214112B2/ja
Priority to DE2404183A priority patent/DE2404183C3/de
Priority to FR7405937A priority patent/FR2219398B1/fr
Priority to NL7402481.A priority patent/NL165590C/xx
Priority to US444858A priority patent/US3898617A/en
Priority to GB824274A priority patent/GB1456549A/en
Publication of JPS49111665A publication Critical patent/JPS49111665A/ja
Publication of JPS5214112B2 publication Critical patent/JPS5214112B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G06V10/44—Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components
    • G06V10/443—Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components by matching or filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Image Input (AREA)
  • Image Processing (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Control Of Position Or Direction (AREA)
JP48021636A 1973-02-22 1973-02-22 Expired JPS5214112B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP48021636A JPS5214112B2 (ja) 1973-02-22 1973-02-22
DE2404183A DE2404183C3 (de) 1973-02-22 1974-01-29 Vorrichtung zur Erkennung der Lage eines Musters
FR7405937A FR2219398B1 (ja) 1973-02-22 1974-02-21
NL7402481.A NL165590C (nl) 1973-02-22 1974-02-22 Stelsel voor het detecteren van de positie van een specifiek gedeelte van een tweedimensionaal object.
US444858A US3898617A (en) 1973-02-22 1974-02-22 System for detecting position of pattern
GB824274A GB1456549A (en) 1973-02-22 1974-02-22 System for detecting the position of a pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48021636A JPS5214112B2 (ja) 1973-02-22 1973-02-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP58005904A Division JPS6017152B2 (ja) 1983-01-19 1983-01-19 位置検出方法及びその装置

Publications (2)

Publication Number Publication Date
JPS49111665A JPS49111665A (ja) 1974-10-24
JPS5214112B2 true JPS5214112B2 (ja) 1977-04-19

Family

ID=12060544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48021636A Expired JPS5214112B2 (ja) 1973-02-22 1973-02-22

Country Status (6)

Country Link
US (1) US3898617A (ja)
JP (1) JPS5214112B2 (ja)
DE (1) DE2404183C3 (ja)
FR (1) FR2219398B1 (ja)
GB (1) GB1456549A (ja)
NL (1) NL165590C (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5327505A (en) * 1976-08-27 1978-03-14 Iseki Agricult Mach Structure of driving wheel for levee forming
JPS5345219U (ja) * 1976-09-22 1978-04-18
JP2013140468A (ja) * 2012-01-04 2013-07-18 Hitachi High-Technologies Corp パターンマッチング装置、検査システム、及びコンピュータプログラム

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112236A (en) * 1975-03-28 1976-10-04 Hitachi Ltd Shape position recognizer unit
JPS51117833A (en) * 1975-04-09 1976-10-16 Hitachi Ltd Group control system
JPS51140755A (en) * 1975-05-30 1976-12-03 Ishizuka Glass Ltd Equipment for inspecting shape of articles
JPS5839357B2 (ja) * 1976-01-26 1983-08-29 株式会社日立製作所 パタ−ンの位置検出方法
US4136332A (en) * 1976-01-30 1979-01-23 Hitachi, Ltd. Device for detecting displacement between patterns
CH609795A5 (ja) * 1976-04-30 1979-03-15 Gretag Ag
JPS531552A (en) * 1976-06-25 1978-01-09 Honda Motor Co Ltd Coordinate selffestimating calculation system with multiipoint measurement
JPS5379571A (en) * 1976-12-24 1978-07-14 Hitachi Ltd Pattern inspecting apparatus
SE429163C (sv) * 1977-03-17 1985-11-18 Bethlehem Steel Corp Anordning och forfarande for kontinuerlig kompensering av felsignaler vid elektrooptisk metning av en i rorelse befintlig stangs tverdimensioner
GB1605262A (en) * 1977-05-25 1986-12-17 Emi Ltd Representing the position of a reference pattern in a pattern field
US4163212A (en) * 1977-09-08 1979-07-31 Excellon Industries Pattern recognition system
US4213117A (en) * 1977-11-28 1980-07-15 Hitachi, Ltd. Method and apparatus for detecting positions of chips on a semiconductor wafer
JPS5487249A (en) * 1977-12-22 1979-07-11 Fujitsu Ltd Positioning device
DE2803653C3 (de) * 1978-01-27 1986-05-28 Texas Instruments Deutschland Gmbh, 8050 Freising Ausrichtvorrichtung
CH643959A5 (de) * 1978-04-14 1984-06-29 Siemens Ag Verfahren und vorrichtung zur automatischen lageerkennung von halbleiterchips.
DE2816324C2 (de) * 1978-04-14 1983-06-23 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zur automatischen Lageerkennung von Halbleiterchips
DE2907774A1 (de) * 1979-02-28 1980-09-11 Siemens Ag Verfahren zur automatischen lageerkennung von halbleiterelementen
US4687980A (en) * 1980-10-20 1987-08-18 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
JPS5915381B2 (ja) * 1978-10-16 1984-04-09 日本電信電話株式会社 パタ−ン検査法
DE3013833C2 (de) * 1979-04-13 1986-07-03 Hitachi, Ltd., Tokio/Tokyo Vorrichtung zur Prüfung eines auf einem Gegenstand befindlichen Musters auf Fehler
JPS5923467B2 (ja) * 1979-04-16 1984-06-02 株式会社日立製作所 位置検出方法
EP0036026B1 (de) * 1980-03-10 1986-11-12 Eaton-Optimetrix Inc. Adressierbare Positioniervorrichtung
JPS56132505A (en) * 1980-03-24 1981-10-16 Hitachi Ltd Position detecting method
DE3174795D1 (en) * 1980-04-02 1986-07-17 Gen Signal Corp Method and apparatus for positioning a wafer on a flat bed
DE3018170A1 (de) * 1980-05-12 1981-12-17 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zum automatischen erkennen eines bildmusters, insbesondere eines linienmusters
DE3175773D1 (en) * 1980-06-10 1987-02-05 Fujitsu Ltd Pattern position recognition apparatus
JPS5773474A (en) * 1980-10-27 1982-05-08 Hitachi Ltd Position recognizing system
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4441205A (en) * 1981-05-18 1984-04-03 Kulicke & Soffa Industries, Inc. Pattern recognition system
JPS57198807A (en) * 1981-06-01 1982-12-06 Mitsubishi Electric Corp Inspecting device for shape and dimensions of article
JPS5864574A (ja) * 1981-10-15 1983-04-16 Usac Electronics Ind Co Ltd 画像情報読取り装置
US4442542A (en) * 1982-01-29 1984-04-10 Sperry Corporation Preprocessing circuitry apparatus for digital data
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
JPS5959397A (ja) * 1982-09-29 1984-04-05 オムロン株式会社 特徴点のラベリング装置
JPH0610609B2 (ja) * 1982-11-12 1994-02-09 株式会社日立製作所 部品位置検査装置
JPS59111577A (ja) * 1982-12-17 1984-06-27 Matsushita Electric Ind Co Ltd パタ−ン認識方法
JPS58217086A (ja) * 1983-02-28 1983-12-16 Hitachi Ltd 位置検出装置
JPS59171808A (ja) * 1983-03-18 1984-09-28 Takaharu Miyazaki 輝度信号比較判別方法
DE3486194T2 (de) * 1983-06-03 1993-11-18 Fondazione Pro Juventute Don C Modular ausbaufähiges System zur Echtzeit-Verarbeitung einer TV-Anzeige, besonders brauchbar zur Koordinatenerfassung von Objekten von bekannter Form und Verfahren zur Benutzung dieses Systems bei Röntgenaufnahmen.
JPS59226981A (ja) * 1983-06-08 1984-12-20 Fujitsu Ltd パタ−ンマツチング方法および装置
JPS6049212A (ja) * 1983-08-30 1985-03-18 Fujitsu Ltd 線状物体検査装置
JPS60167069A (ja) * 1984-02-09 1985-08-30 Omron Tateisi Electronics Co 図形認識装置
JPS60196610A (ja) * 1984-03-21 1985-10-05 New Japan Radio Co Ltd パタ−ン認識方法
US4860374A (en) * 1984-04-19 1989-08-22 Nikon Corporation Apparatus for detecting position of reference pattern
JPS60263807A (ja) * 1984-06-12 1985-12-27 Dainippon Screen Mfg Co Ltd プリント配線板のパタ−ン欠陥検査装置
US4853967A (en) * 1984-06-29 1989-08-01 International Business Machines Corporation Method for automatic optical inspection analysis of integrated circuits
JPS6141903A (ja) * 1984-08-03 1986-02-28 Nippon Denso Co Ltd 車両運転者の目の位置認識装置
JPS6167188A (ja) * 1984-09-10 1986-04-07 Konishiroku Photo Ind Co Ltd 画像座標検出装置
JPS61165188A (ja) * 1984-12-24 1986-07-25 Fujitsu Ltd シンボル認識方式
JPS61165185A (ja) * 1984-12-28 1986-07-25 Fujitsu Ltd 基準点座標自動検出装置
GB2177834B (en) * 1985-07-02 1988-11-16 Ferranti Plc Pattern detection in two dimensional signals
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
JPS62209305A (ja) * 1986-03-10 1987-09-14 Fujitsu Ltd 寸法良否判定方法
JPS62262192A (ja) * 1986-05-07 1987-11-14 Datsuku Eng Kk マ−ク検査方法
US4852183A (en) * 1986-05-23 1989-07-25 Mitsubishi Denki Kabushiki Kaisha Pattern recognition system
US5067162A (en) * 1986-06-30 1991-11-19 Identix Incorporated Method and apparatus for verifying identity using image correlation
US4811002A (en) * 1986-10-03 1989-03-07 Honda Giken Kogyo Kabushiki Kaisha Relative positional relation detecting system
JPH0760459B2 (ja) * 1987-07-09 1995-06-28 三洋電機株式会社 コ−ナ検出装置
JPS6461879A (en) * 1987-08-31 1989-03-08 Juki Kk Position recognizer using pattern matching
JP2703546B2 (ja) * 1987-12-29 1998-01-26 川崎製鉄株式会社 荷物載置場所のターゲット認識方法
US4849679A (en) * 1987-12-31 1989-07-18 Westinghouse Electric Corp. Image processing system for an optical seam tracker
JPH02132563A (ja) * 1988-03-31 1990-05-22 Tokyo Electron Ltd 画像読取方法
US5226095A (en) * 1988-11-04 1993-07-06 Matsushita Electric Industrial Co., Ltd. Method of detecting the position of an object pattern in an image
US5065447A (en) * 1989-07-05 1991-11-12 Iterated Systems, Inc. Method and apparatus for processing digital data
US5495535A (en) * 1992-01-31 1996-02-27 Orbotech Ltd Method of inspecting articles
US5621825A (en) * 1992-03-06 1997-04-15 Omron Corporation Image processor, image processing method and apparatus applying same
CA2100324C (en) † 1992-08-06 2004-09-28 Christoph Eisenbarth Method and apparatus for determining mis-registration
US5848198A (en) * 1993-10-08 1998-12-08 Penn; Alan Irvin Method of and apparatus for analyzing images and deriving binary image representations
ITBO940153A1 (it) * 1994-04-12 1995-10-12 Gd Spa Metodo per il controllo ottico di prodotti.
EP0693739A3 (en) * 1994-07-13 1997-06-11 Yashima Denki Kk Method and apparatus capable of storing and reproducing handwriting
US5687259A (en) * 1995-03-17 1997-11-11 Virtual Eyes, Incorporated Aesthetic imaging system
JP4114959B2 (ja) * 1995-06-20 2008-07-09 キヤノン株式会社 画像処理方法及び装置
JPH09189519A (ja) * 1996-01-11 1997-07-22 Ushio Inc パターン検出方法およびマスクとワークの位置合わせ装置
US6272245B1 (en) 1998-01-23 2001-08-07 Seiko Epson Corporation Apparatus and method for pattern recognition
US7016539B1 (en) 1998-07-13 2006-03-21 Cognex Corporation Method for fast, robust, multi-dimensional pattern recognition
JP2000164658A (ja) * 1998-11-26 2000-06-16 Tokyo Seimitsu Co Ltd 半導体ウェハのレビューステーション及び外観検査装置
AU6320300A (en) * 1999-08-05 2001-03-05 Hamamatsu Photonics K.K. Solid-state imaging device and range finding device
US7392287B2 (en) 2001-03-27 2008-06-24 Hemisphere Ii Investment Lp Method and apparatus for sharing information using a handheld device
US6959112B1 (en) 2001-06-29 2005-10-25 Cognex Technology And Investment Corporation Method for finding a pattern which may fall partially outside an image
JP3997749B2 (ja) * 2001-10-22 2007-10-24 ソニー株式会社 信号処理方法及び装置、信号処理プログラム、並びに記録媒体
US7190834B2 (en) 2003-07-22 2007-03-13 Cognex Technology And Investment Corporation Methods for finding and characterizing a deformed pattern in an image
US8081820B2 (en) 2003-07-22 2011-12-20 Cognex Technology And Investment Corporation Method for partitioning a pattern into optimized sub-patterns
US7177009B2 (en) * 2004-10-01 2007-02-13 Asml Netherlands B.V. Position determination method and lithographic apparatus
US8437502B1 (en) 2004-09-25 2013-05-07 Cognex Technology And Investment Corporation General pose refinement and tracking tool
US9286643B2 (en) 2011-03-01 2016-03-15 Applaud, Llc Personalized memory compilation for members of a group and collaborative method to build a memory compilation
CN102328493A (zh) * 2011-08-31 2012-01-25 熊猫电子集团有限公司 一种新型丝网印ccd图像识别的定位方法
US9679224B2 (en) 2013-06-28 2017-06-13 Cognex Corporation Semi-supervised method for training multiple pattern recognition and registration tool models
CN112329264B (zh) * 2020-11-22 2023-04-07 吉林建筑大学 一种采用极限曲线法确定三维均质边坡稳定性的失稳判据方法

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US3120578A (en) * 1960-09-23 1964-02-04 Maxson Electronics Corp Orientation determining device
US3292149A (en) * 1964-06-18 1966-12-13 Ibm Identification and comparison apparatus for contour patterns such as fingerprints
GB1243969A (en) * 1967-11-15 1971-08-25 Emi Ltd Improvements relating to pattern recognition devices
US3576534A (en) * 1969-08-11 1971-04-27 Compuscan Inc Image cross correlator
US3636513A (en) * 1969-10-17 1972-01-18 Westinghouse Electric Corp Preprocessing method and apparatus for pattern recognition
US3748644A (en) * 1969-12-31 1973-07-24 Westinghouse Electric Corp Automatic registration of points in two separate images

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5327505A (en) * 1976-08-27 1978-03-14 Iseki Agricult Mach Structure of driving wheel for levee forming
JPS5345219U (ja) * 1976-09-22 1978-04-18
JP2013140468A (ja) * 2012-01-04 2013-07-18 Hitachi High-Technologies Corp パターンマッチング装置、検査システム、及びコンピュータプログラム

Also Published As

Publication number Publication date
GB1456549A (en) 1976-11-24
DE2404183C3 (de) 1978-12-21
FR2219398A1 (ja) 1974-09-20
DE2404183A1 (de) 1974-09-19
NL7402481A (ja) 1974-08-26
JPS49111665A (ja) 1974-10-24
DE2404183B2 (de) 1978-04-27
NL165590C (nl) 1981-04-15
FR2219398B1 (ja) 1977-06-10
US3898617A (en) 1975-08-05
NL165590B (nl) 1980-11-17

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