JPS51112236A
(en)
*
|
1975-03-28 |
1976-10-04 |
Hitachi Ltd |
Shape position recognizer unit
|
JPS51117833A
(en)
*
|
1975-04-09 |
1976-10-16 |
Hitachi Ltd |
Group control system
|
JPS51140755A
(en)
*
|
1975-05-30 |
1976-12-03 |
Ishizuka Glass Ltd |
Equipment for inspecting shape of articles
|
JPS5839357B2
(ja)
*
|
1976-01-26 |
1983-08-29 |
株式会社日立製作所 |
パタ−ンの位置検出方法
|
US4136332A
(en)
*
|
1976-01-30 |
1979-01-23 |
Hitachi, Ltd. |
Device for detecting displacement between patterns
|
CH609795A5
(nl)
*
|
1976-04-30 |
1979-03-15 |
Gretag Ag |
|
JPS531552A
(en)
*
|
1976-06-25 |
1978-01-09 |
Honda Motor Co Ltd |
Coordinate selffestimating calculation system with multiipoint measurement
|
JPS5327505A
(en)
*
|
1976-08-27 |
1978-03-14 |
Iseki Agricult Mach |
Structure of driving wheel for levee forming
|
JPS5345219U
(nl)
*
|
1976-09-22 |
1978-04-18 |
|
|
JPS5379571A
(en)
*
|
1976-12-24 |
1978-07-14 |
Hitachi Ltd |
Pattern inspecting apparatus
|
SE429163C
(sv)
*
|
1977-03-17 |
1985-11-18 |
Bethlehem Steel Corp |
Anordning och forfarande for kontinuerlig kompensering av felsignaler vid elektrooptisk metning av en i rorelse befintlig stangs tverdimensioner
|
GB1605262A
(en)
*
|
1977-05-25 |
1986-12-17 |
Emi Ltd |
Representing the position of a reference pattern in a pattern field
|
US4163212A
(en)
*
|
1977-09-08 |
1979-07-31 |
Excellon Industries |
Pattern recognition system
|
US4213117A
(en)
*
|
1977-11-28 |
1980-07-15 |
Hitachi, Ltd. |
Method and apparatus for detecting positions of chips on a semiconductor wafer
|
JPS5487249A
(en)
*
|
1977-12-22 |
1979-07-11 |
Fujitsu Ltd |
Positioning device
|
DE2803653C3
(de)
*
|
1978-01-27 |
1986-05-28 |
Texas Instruments Deutschland Gmbh, 8050 Freising |
Ausrichtvorrichtung
|
CH643959A5
(de)
*
|
1978-04-14 |
1984-06-29 |
Siemens Ag |
Verfahren und vorrichtung zur automatischen lageerkennung von halbleiterchips.
|
DE2907774A1
(de)
*
|
1979-02-28 |
1980-09-11 |
Siemens Ag |
Verfahren zur automatischen lageerkennung von halbleiterelementen
|
DE2816324C2
(de)
*
|
1978-04-14 |
1983-06-23 |
Siemens AG, 1000 Berlin und 8000 München |
Verfahren und Vorrichtung zur automatischen Lageerkennung von Halbleiterchips
|
US4687980A
(en)
*
|
1980-10-20 |
1987-08-18 |
Eaton Corporation |
X-Y addressable workpiece positioner and mask aligner using same
|
JPS5915381B2
(ja)
*
|
1978-10-16 |
1984-04-09 |
日本電信電話株式会社 |
パタ−ン検査法
|
US4345312A
(en)
*
|
1979-04-13 |
1982-08-17 |
Hitachi, Ltd. |
Method and device for inspecting the defect of a pattern represented on an article
|
JPS5923467B2
(ja)
*
|
1979-04-16 |
1984-06-02 |
株式会社日立製作所 |
位置検出方法
|
EP0036026B1
(de)
*
|
1980-03-10 |
1986-11-12 |
Eaton-Optimetrix Inc. |
Adressierbare Positioniervorrichtung
|
JPS56132505A
(en)
*
|
1980-03-24 |
1981-10-16 |
Hitachi Ltd |
Position detecting method
|
DE3174795D1
(en)
*
|
1980-04-02 |
1986-07-17 |
Gen Signal Corp |
Method and apparatus for positioning a wafer on a flat bed
|
DE3018170A1
(de)
*
|
1980-05-12 |
1981-12-17 |
Siemens AG, 1000 Berlin und 8000 München |
Verfahren und vorrichtung zum automatischen erkennen eines bildmusters, insbesondere eines linienmusters
|
US4450579A
(en)
*
|
1980-06-10 |
1984-05-22 |
Fujitsu Limited |
Recognition method and apparatus
|
JPS5773474A
(en)
*
|
1980-10-27 |
1982-05-08 |
Hitachi Ltd |
Position recognizing system
|
US4391494A
(en)
*
|
1981-05-15 |
1983-07-05 |
General Signal Corporation |
Apparatus for projecting a series of images onto dies of a semiconductor wafer
|
US4425037A
(en)
|
1981-05-15 |
1984-01-10 |
General Signal Corporation |
Apparatus for projecting a series of images onto dies of a semiconductor wafer
|
US4441205A
(en)
*
|
1981-05-18 |
1984-04-03 |
Kulicke & Soffa Industries, Inc. |
Pattern recognition system
|
JPS57198807A
(en)
*
|
1981-06-01 |
1982-12-06 |
Mitsubishi Electric Corp |
Inspecting device for shape and dimensions of article
|
JPS5864574A
(ja)
*
|
1981-10-15 |
1983-04-16 |
Usac Electronics Ind Co Ltd |
画像情報読取り装置
|
US4442542A
(en)
*
|
1982-01-29 |
1984-04-10 |
Sperry Corporation |
Preprocessing circuitry apparatus for digital data
|
US4444492A
(en)
*
|
1982-05-15 |
1984-04-24 |
General Signal Corporation |
Apparatus for projecting a series of images onto dies of a semiconductor wafer
|
JPS5959397A
(ja)
*
|
1982-09-29 |
1984-04-05 |
オムロン株式会社 |
特徴点のラベリング装置
|
JPH0610609B2
(ja)
*
|
1982-11-12 |
1994-02-09 |
株式会社日立製作所 |
部品位置検査装置
|
JPS59111577A
(ja)
*
|
1982-12-17 |
1984-06-27 |
Matsushita Electric Ind Co Ltd |
パタ−ン認識方法
|
JPS58217086A
(ja)
*
|
1983-02-28 |
1983-12-16 |
Hitachi Ltd |
位置検出装置
|
JPS59171808A
(ja)
*
|
1983-03-18 |
1984-09-28 |
Takaharu Miyazaki |
輝度信号比較判別方法
|
DE3486194T2
(de)
*
|
1983-06-03 |
1993-11-18 |
Fondazione Pro Juventute Don C |
Modular ausbaufähiges System zur Echtzeit-Verarbeitung einer TV-Anzeige, besonders brauchbar zur Koordinatenerfassung von Objekten von bekannter Form und Verfahren zur Benutzung dieses Systems bei Röntgenaufnahmen.
|
JPS59226981A
(ja)
*
|
1983-06-08 |
1984-12-20 |
Fujitsu Ltd |
パタ−ンマツチング方法および装置
|
JPS6049212A
(ja)
*
|
1983-08-30 |
1985-03-18 |
Fujitsu Ltd |
線状物体検査装置
|
JPS60167069A
(ja)
*
|
1984-02-09 |
1985-08-30 |
Omron Tateisi Electronics Co |
図形認識装置
|
JPS60196610A
(ja)
*
|
1984-03-21 |
1985-10-05 |
New Japan Radio Co Ltd |
パタ−ン認識方法
|
US4860374A
(en)
*
|
1984-04-19 |
1989-08-22 |
Nikon Corporation |
Apparatus for detecting position of reference pattern
|
JPS60263807A
(ja)
*
|
1984-06-12 |
1985-12-27 |
Dainippon Screen Mfg Co Ltd |
プリント配線板のパタ−ン欠陥検査装置
|
US4853967A
(en)
*
|
1984-06-29 |
1989-08-01 |
International Business Machines Corporation |
Method for automatic optical inspection analysis of integrated circuits
|
JPS6141903A
(ja)
*
|
1984-08-03 |
1986-02-28 |
Nippon Denso Co Ltd |
車両運転者の目の位置認識装置
|
JPS6167188A
(ja)
*
|
1984-09-10 |
1986-04-07 |
Konishiroku Photo Ind Co Ltd |
画像座標検出装置
|
JPS61165188A
(ja)
*
|
1984-12-24 |
1986-07-25 |
Fujitsu Ltd |
シンボル認識方式
|
JPS61165185A
(ja)
*
|
1984-12-28 |
1986-07-25 |
Fujitsu Ltd |
基準点座標自動検出装置
|
GB2177834B
(en)
*
|
1985-07-02 |
1988-11-16 |
Ferranti Plc |
Pattern detection in two dimensional signals
|
US4803644A
(en)
*
|
1985-09-20 |
1989-02-07 |
Hughes Aircraft Company |
Alignment mark detector for electron beam lithography
|
JPS62209305A
(ja)
*
|
1986-03-10 |
1987-09-14 |
Fujitsu Ltd |
寸法良否判定方法
|
JPS62262192A
(ja)
*
|
1986-05-07 |
1987-11-14 |
Datsuku Eng Kk |
マ−ク検査方法
|
US4852183A
(en)
*
|
1986-05-23 |
1989-07-25 |
Mitsubishi Denki Kabushiki Kaisha |
Pattern recognition system
|
US5067162A
(en)
*
|
1986-06-30 |
1991-11-19 |
Identix Incorporated |
Method and apparatus for verifying identity using image correlation
|
US4811002A
(en)
*
|
1986-10-03 |
1989-03-07 |
Honda Giken Kogyo Kabushiki Kaisha |
Relative positional relation detecting system
|
JPH0760459B2
(ja)
*
|
1987-07-09 |
1995-06-28 |
三洋電機株式会社 |
コ−ナ検出装置
|
JPS6461879A
(en)
*
|
1987-08-31 |
1989-03-08 |
Juki Kk |
Position recognizer using pattern matching
|
JP2703546B2
(ja)
*
|
1987-12-29 |
1998-01-26 |
川崎製鉄株式会社 |
荷物載置場所のターゲット認識方法
|
US4849679A
(en)
*
|
1987-12-31 |
1989-07-18 |
Westinghouse Electric Corp. |
Image processing system for an optical seam tracker
|
JPH02132563A
(ja)
*
|
1988-03-31 |
1990-05-22 |
Tokyo Electron Ltd |
画像読取方法
|
US5226095A
(en)
*
|
1988-11-04 |
1993-07-06 |
Matsushita Electric Industrial Co., Ltd. |
Method of detecting the position of an object pattern in an image
|
US5065447A
(en)
*
|
1989-07-05 |
1991-11-12 |
Iterated Systems, Inc. |
Method and apparatus for processing digital data
|
US5495535A
(en)
*
|
1992-01-31 |
1996-02-27 |
Orbotech Ltd |
Method of inspecting articles
|
US5621825A
(en)
*
|
1992-03-06 |
1997-04-15 |
Omron Corporation |
Image processor, image processing method and apparatus applying same
|
CA2100324C
(en)
†
|
1992-08-06 |
2004-09-28 |
Christoph Eisenbarth |
Method and apparatus for determining mis-registration
|
US5848198A
(en)
*
|
1993-10-08 |
1998-12-08 |
Penn; Alan Irvin |
Method of and apparatus for analyzing images and deriving binary image representations
|
ITBO940153A1
(it)
*
|
1994-04-12 |
1995-10-12 |
Gd Spa |
Metodo per il controllo ottico di prodotti.
|
EP0693739A3
(en)
*
|
1994-07-13 |
1997-06-11 |
Yashima Denki Kk |
Method and apparatus capable of storing and reproducing handwriting
|
US5687259A
(en)
*
|
1995-03-17 |
1997-11-11 |
Virtual Eyes, Incorporated |
Aesthetic imaging system
|
JP4114959B2
(ja)
*
|
1995-06-20 |
2008-07-09 |
キヤノン株式会社 |
画像処理方法及び装置
|
JPH09189519A
(ja)
*
|
1996-01-11 |
1997-07-22 |
Ushio Inc |
パターン検出方法およびマスクとワークの位置合わせ装置
|
US6272245B1
(en)
|
1998-01-23 |
2001-08-07 |
Seiko Epson Corporation |
Apparatus and method for pattern recognition
|
US7016539B1
(en)
|
1998-07-13 |
2006-03-21 |
Cognex Corporation |
Method for fast, robust, multi-dimensional pattern recognition
|
JP2000164658A
(ja)
*
|
1998-11-26 |
2000-06-16 |
Tokyo Seimitsu Co Ltd |
半導体ウェハのレビューステーション及び外観検査装置
|
AU6320300A
(en)
*
|
1999-08-05 |
2001-03-05 |
Hamamatsu Photonics K.K. |
Solid-state imaging device and range finding device
|
US7392287B2
(en)
|
2001-03-27 |
2008-06-24 |
Hemisphere Ii Investment Lp |
Method and apparatus for sharing information using a handheld device
|
US6959112B1
(en)
|
2001-06-29 |
2005-10-25 |
Cognex Technology And Investment Corporation |
Method for finding a pattern which may fall partially outside an image
|
JP3997749B2
(ja)
*
|
2001-10-22 |
2007-10-24 |
ソニー株式会社 |
信号処理方法及び装置、信号処理プログラム、並びに記録媒体
|
US8081820B2
(en)
|
2003-07-22 |
2011-12-20 |
Cognex Technology And Investment Corporation |
Method for partitioning a pattern into optimized sub-patterns
|
US7190834B2
(en)
|
2003-07-22 |
2007-03-13 |
Cognex Technology And Investment Corporation |
Methods for finding and characterizing a deformed pattern in an image
|
US7177009B2
(en)
*
|
2004-10-01 |
2007-02-13 |
Asml Netherlands B.V. |
Position determination method and lithographic apparatus
|
US8437502B1
(en)
|
2004-09-25 |
2013-05-07 |
Cognex Technology And Investment Corporation |
General pose refinement and tracking tool
|
US9286643B2
(en)
|
2011-03-01 |
2016-03-15 |
Applaud, Llc |
Personalized memory compilation for members of a group and collaborative method to build a memory compilation
|
CN102328493A
(zh)
*
|
2011-08-31 |
2012-01-25 |
熊猫电子集团有限公司 |
一种新型丝网印ccd图像识别的定位方法
|
JP5647999B2
(ja)
*
|
2012-01-04 |
2015-01-07 |
株式会社日立ハイテクノロジーズ |
パターンマッチング装置、検査システム、及びコンピュータプログラム
|
US9679224B2
(en)
|
2013-06-28 |
2017-06-13 |
Cognex Corporation |
Semi-supervised method for training multiple pattern recognition and registration tool models
|
CN112329264B
(zh)
*
|
2020-11-22 |
2023-04-07 |
吉林建筑大学 |
一种采用极限曲线法确定三维均质边坡稳定性的失稳判据方法
|