JPS52137986A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS52137986A
JPS52137986A JP5496876A JP5496876A JPS52137986A JP S52137986 A JPS52137986 A JP S52137986A JP 5496876 A JP5496876 A JP 5496876A JP 5496876 A JP5496876 A JP 5496876A JP S52137986 A JPS52137986 A JP S52137986A
Authority
JP
Japan
Prior art keywords
breakdown
junction
accumulating
positive
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5496876A
Other languages
Japanese (ja)
Inventor
Toshio Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5496876A priority Critical patent/JPS52137986A/en
Publication of JPS52137986A publication Critical patent/JPS52137986A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)

Abstract

PURPOSE:To obtain a non-volatile memory of increased repeating times of electrical rewriting by accumulating negative charge in a floating gate by the breakdown of P<+>N<+> junction and accumulating positive charge by the breakdown of the PN junction of the locally thin portion formed on an insulation gate film, as well as by mutually isolating the injection paths for the positive and negative charges.
JP5496876A 1976-05-13 1976-05-13 Semiconductor device Pending JPS52137986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5496876A JPS52137986A (en) 1976-05-13 1976-05-13 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5496876A JPS52137986A (en) 1976-05-13 1976-05-13 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS52137986A true JPS52137986A (en) 1977-11-17

Family

ID=12985448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5496876A Pending JPS52137986A (en) 1976-05-13 1976-05-13 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS52137986A (en)

Similar Documents

Publication Publication Date Title
JPS55156358A (en) Semiconductor memory device
JPS52137986A (en) Semiconductor device
JPS5228277A (en) Non-voltatile semiconductor memory device
JPS5429985A (en) Semiconductor nonvolatile memory device
JPS52115669A (en) Semiconductor memory device
JPS52115663A (en) Semiconductor device
JPS53149771A (en) Mis-type semiconductor device and its manufacture
JPS53112687A (en) Semiconductor device
JPS5263686A (en) Non-voltatile semiconductor memory device
JPS5278389A (en) Semiconductor memory device
JPS5353983A (en) Semiconductor non-volatile memory device
JPS57121271A (en) Field effect transistor
JPS5377476A (en) Semiconductor integrated circuit device
JPS53144688A (en) Field effect semiconductor memory device and production of the same
JPS5350985A (en) Semiconductor memory device
JPS57162371A (en) Mos semiconductor memory device
JPS5291659A (en) Semiconductor device
JPS52130580A (en) High densityintegrated circuit device
JPS53142192A (en) Dynamic memory device
JPS52128077A (en) Insulation gate type semiconductor device
JPS52107785A (en) Semiconductor unit
JPS52130290A (en) Semiconductor memory device
JPS52146568A (en) Production of silicon gate mos type semiconductor integrated circuit device
JPS5348426A (en) Non volatile semiconductor memory
JPS52129383A (en) Mis semicnductor integrated circuit device