JPS52137986A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS52137986A JPS52137986A JP5496876A JP5496876A JPS52137986A JP S52137986 A JPS52137986 A JP S52137986A JP 5496876 A JP5496876 A JP 5496876A JP 5496876 A JP5496876 A JP 5496876A JP S52137986 A JPS52137986 A JP S52137986A
- Authority
- JP
- Japan
- Prior art keywords
- breakdown
- junction
- accumulating
- positive
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 230000015556 catabolic process Effects 0.000 abstract 2
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To obtain a non-volatile memory of increased repeating times of electrical rewriting by accumulating negative charge in a floating gate by the breakdown of P<+>N<+> junction and accumulating positive charge by the breakdown of the PN junction of the locally thin portion formed on an insulation gate film, as well as by mutually isolating the injection paths for the positive and negative charges.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5496876A JPS52137986A (en) | 1976-05-13 | 1976-05-13 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5496876A JPS52137986A (en) | 1976-05-13 | 1976-05-13 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52137986A true JPS52137986A (en) | 1977-11-17 |
Family
ID=12985448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5496876A Pending JPS52137986A (en) | 1976-05-13 | 1976-05-13 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52137986A (en) |
-
1976
- 1976-05-13 JP JP5496876A patent/JPS52137986A/en active Pending
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