JPS52127166A - Manufacture of semiconductor - Google Patents

Manufacture of semiconductor

Info

Publication number
JPS52127166A
JPS52127166A JP4364476A JP4364476A JPS52127166A JP S52127166 A JPS52127166 A JP S52127166A JP 4364476 A JP4364476 A JP 4364476A JP 4364476 A JP4364476 A JP 4364476A JP S52127166 A JPS52127166 A JP S52127166A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor
manufacture
isl
sio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4364476A
Other languages
Japanese (ja)
Other versions
JPS616539B2 (en
Inventor
Takashi Yahano
Masao Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4364476A priority Critical patent/JPS52127166A/en
Publication of JPS52127166A publication Critical patent/JPS52127166A/en
Publication of JPS616539B2 publication Critical patent/JPS616539B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To obtain suitable manufacture method for high integrated ISL by forming nearly same amount of quantity of thin film as that of SiO2, Si3N4 and multi-crystal Si, formed on the front side of Si substrate, on the back side of the substrate and by cancelling stress being due to difference of thermal expansion coefficient.
COPYRIGHT: (C)1977,JPO&Japio
JP4364476A 1976-04-19 1976-04-19 Manufacture of semiconductor Granted JPS52127166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4364476A JPS52127166A (en) 1976-04-19 1976-04-19 Manufacture of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4364476A JPS52127166A (en) 1976-04-19 1976-04-19 Manufacture of semiconductor

Publications (2)

Publication Number Publication Date
JPS52127166A true JPS52127166A (en) 1977-10-25
JPS616539B2 JPS616539B2 (en) 1986-02-27

Family

ID=12669567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4364476A Granted JPS52127166A (en) 1976-04-19 1976-04-19 Manufacture of semiconductor

Country Status (1)

Country Link
JP (1) JPS52127166A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61191035A (en) * 1985-02-20 1986-08-25 Rohm Co Ltd Manufacture of semiconductor device
JPH01291430A (en) * 1988-05-18 1989-11-24 Fujitsu Ltd Manufacture of semiconductor device
JP2008177468A (en) * 2007-01-22 2008-07-31 Tokyo Electron Ltd Processing method of substrate, coater and substrate treatment system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979780A (en) * 1972-12-08 1974-08-01
JPS5010572A (en) * 1973-05-25 1975-02-03

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979780A (en) * 1972-12-08 1974-08-01
JPS5010572A (en) * 1973-05-25 1975-02-03

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61191035A (en) * 1985-02-20 1986-08-25 Rohm Co Ltd Manufacture of semiconductor device
JPH01291430A (en) * 1988-05-18 1989-11-24 Fujitsu Ltd Manufacture of semiconductor device
JP2008177468A (en) * 2007-01-22 2008-07-31 Tokyo Electron Ltd Processing method of substrate, coater and substrate treatment system
US8703400B2 (en) 2007-01-22 2014-04-22 Tokyo Electron Limited Substrate treatment method, coating treatment apparatus, and substrate treatment system

Also Published As

Publication number Publication date
JPS616539B2 (en) 1986-02-27

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