JPS5211773A - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- JPS5211773A JPS5211773A JP8667675A JP8667675A JPS5211773A JP S5211773 A JPS5211773 A JP S5211773A JP 8667675 A JP8667675 A JP 8667675A JP 8667675 A JP8667675 A JP 8667675A JP S5211773 A JPS5211773 A JP S5211773A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing semiconductor
- poly
- wiring
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Element Separation (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8667675A JPS5211773A (en) | 1975-07-17 | 1975-07-17 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8667675A JPS5211773A (en) | 1975-07-17 | 1975-07-17 | Method of manufacturing semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5211773A true JPS5211773A (en) | 1977-01-28 |
JPS579491B2 JPS579491B2 (ja) | 1982-02-22 |
Family
ID=13893615
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8667675A Granted JPS5211773A (en) | 1975-07-17 | 1975-07-17 | Method of manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5211773A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53100776A (en) * | 1977-02-15 | 1978-09-02 | Nec Corp | Production of semiconductor device |
JPS57190332A (en) * | 1981-05-19 | 1982-11-22 | Seiko Epson Corp | Manufacture of semiconductor device |
JPH01149002U (ja) * | 1988-04-06 | 1989-10-16 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4915114A (ja) * | 1972-06-02 | 1974-02-09 | ||
JPS4976480A (ja) * | 1972-11-27 | 1974-07-23 |
-
1975
- 1975-07-17 JP JP8667675A patent/JPS5211773A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4915114A (ja) * | 1972-06-02 | 1974-02-09 | ||
JPS4976480A (ja) * | 1972-11-27 | 1974-07-23 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53100776A (en) * | 1977-02-15 | 1978-09-02 | Nec Corp | Production of semiconductor device |
JPS5750051B2 (ja) * | 1977-02-15 | 1982-10-25 | ||
JPS57190332A (en) * | 1981-05-19 | 1982-11-22 | Seiko Epson Corp | Manufacture of semiconductor device |
JPH01149002U (ja) * | 1988-04-06 | 1989-10-16 |
Also Published As
Publication number | Publication date |
---|---|
JPS579491B2 (ja) | 1982-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5351970A (en) | Manufacture for semiconductor substrate | |
JPS5226182A (en) | Manufacturing method of semi-conductor unit | |
JPS51147981A (en) | Method of manufacturing semiconductor device | |
JPS5211773A (en) | Method of manufacturing semiconductor device | |
JPS5235980A (en) | Manufacturing method of semiconductor device | |
JPS51130184A (en) | Semiconductor ic resistance element process | |
JPS534484A (en) | Production of semiconductor device | |
JPS5230185A (en) | Process for producing semiconductor device | |
JPS53137685A (en) | Manufacture for semiconductor device | |
JPS5329086A (en) | Production of semiconductor device | |
JPS51147286A (en) | Manufacturing process of semiconductor | |
JPS51121272A (en) | Manufacturing method for semiconductor devices | |
JPS5228879A (en) | Semiconductor device and method for its production | |
JPS524780A (en) | Manufacturing method of semiconductor equipment | |
JPS5282083A (en) | Production of semiconductor device | |
JPS52155982A (en) | Semiconductor device | |
JPS51144184A (en) | Production method of semiconductor unit | |
JPS5249781A (en) | Process for production of semiconductor device | |
JPS5218182A (en) | Manufacturing process for separation layers for formation of semicondu ctor devices | |
JPS5222483A (en) | Method of manufacturing semiconductor device | |
JPS51111092A (en) | Semiconductor manufacturing process | |
JPS52179A (en) | Method of fabricating semiconductor | |
JPS5265672A (en) | Formation of grrove in semiconductor wafer | |
JPS51147284A (en) | Manufacturing process of semiconductor device | |
JPS5367387A (en) | Production of semiconductor device |