JPS53100776A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS53100776A JPS53100776A JP1570177A JP1570177A JPS53100776A JP S53100776 A JPS53100776 A JP S53100776A JP 1570177 A JP1570177 A JP 1570177A JP 1570177 A JP1570177 A JP 1570177A JP S53100776 A JPS53100776 A JP S53100776A
- Authority
- JP
- Japan
- Prior art keywords
- poly
- production
- semiconductor device
- layer
- beforehand
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
- Weting (AREA)
Abstract
PURPOSE: To etch poly-Si with good controllability by beforehand implanting ions by changing energies in the positions to be removed in performing selective chemical etching of a low concentration poly-Si layer of 1019 cm-3 or under in impurity concentration or undoped poly-Si layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1570177A JPS53100776A (en) | 1977-02-15 | 1977-02-15 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1570177A JPS53100776A (en) | 1977-02-15 | 1977-02-15 | Production of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53100776A true JPS53100776A (en) | 1978-09-02 |
JPS5750051B2 JPS5750051B2 (en) | 1982-10-25 |
Family
ID=11896063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1570177A Granted JPS53100776A (en) | 1977-02-15 | 1977-02-15 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53100776A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56110266A (en) * | 1980-02-04 | 1981-09-01 | Fujitsu Ltd | Manufacture of semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5159275A (en) * | 1974-11-20 | 1976-05-24 | Fujitsu Ltd | Handotaisochino seizohoho |
JPS5211773A (en) * | 1975-07-17 | 1977-01-28 | Toshiba Corp | Method of manufacturing semiconductor device |
-
1977
- 1977-02-15 JP JP1570177A patent/JPS53100776A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5159275A (en) * | 1974-11-20 | 1976-05-24 | Fujitsu Ltd | Handotaisochino seizohoho |
JPS5211773A (en) * | 1975-07-17 | 1977-01-28 | Toshiba Corp | Method of manufacturing semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56110266A (en) * | 1980-02-04 | 1981-09-01 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5750051B2 (en) | 1982-10-25 |
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