JPH1167655A5 - - Google Patents

Info

Publication number
JPH1167655A5
JPH1167655A5 JP1997228837A JP22883797A JPH1167655A5 JP H1167655 A5 JPH1167655 A5 JP H1167655A5 JP 1997228837 A JP1997228837 A JP 1997228837A JP 22883797 A JP22883797 A JP 22883797A JP H1167655 A5 JPH1167655 A5 JP H1167655A5
Authority
JP
Japan
Prior art keywords
synchronization error
mask
substrate
average value
calculation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997228837A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1167655A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9228837A priority Critical patent/JPH1167655A/ja
Priority claimed from JP9228837A external-priority patent/JPH1167655A/ja
Priority to AU85622/98A priority patent/AU8562298A/en
Priority to PCT/JP1998/003558 priority patent/WO1999008315A1/ja
Publication of JPH1167655A publication Critical patent/JPH1167655A/ja
Publication of JPH1167655A5 publication Critical patent/JPH1167655A5/ja
Withdrawn legal-status Critical Current

Links

JP9228837A 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法 Withdrawn JPH1167655A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9228837A JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法
AU85622/98A AU8562298A (en) 1997-08-11 1998-08-11 Scanning exposure method, scanning aligner, method of manufacturing the scanningaligner, and synchronization error analysing method
PCT/JP1998/003558 WO1999008315A1 (fr) 1997-08-11 1998-08-11 Procede d'exposition par balayage, graveur par projection a balayage, procede de production du graveur par projection a balayage et procede d'analyse des erreurs de synchronisation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9228837A JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法

Publications (2)

Publication Number Publication Date
JPH1167655A JPH1167655A (ja) 1999-03-09
JPH1167655A5 true JPH1167655A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2005-06-02

Family

ID=16882644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9228837A Withdrawn JPH1167655A (ja) 1997-08-11 1997-08-11 走査型露光装置及び同期誤差解析方法

Country Status (3)

Country Link
JP (1) JPH1167655A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU8562298A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO1999008315A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5002704B2 (ja) * 1999-11-30 2012-08-15 キヤノン株式会社 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP2001223157A (ja) * 1999-11-30 2001-08-17 Canon Inc 投影露光装置、投影露光方法、及び半導体装置の製造方法
JP2001166456A (ja) * 1999-12-07 2001-06-22 Mitsubishi Electric Corp ウェハパターン誤差の要因解析方法および写真製版用マスクの製造装置
WO2005008752A1 (ja) * 2003-07-23 2005-01-27 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2006025302A1 (ja) 2004-08-30 2006-03-09 Nikon Corporation 露光装置、動作決定方法、基板処理システム及びメンテナンス管理方法、並びにデバイス製造方法
US8638422B2 (en) 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
NL2005719A (en) 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.
JP7699458B2 (ja) * 2021-04-06 2025-06-27 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372725B2 (ja) * 1995-08-31 2003-02-04 キヤノン株式会社 同期スキャン制御装置
JP3320276B2 (ja) * 1995-09-04 2002-09-03 キヤノン株式会社 精密制御装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JP3408048B2 (ja) * 1996-01-05 2003-05-19 キヤノン株式会社 走査型露光装置
JPH09199399A (ja) * 1996-01-12 1997-07-31 Canon Inc 同期制御装置および方法

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