JPH11503770A - 組成物 - Google Patents
組成物Info
- Publication number
- JPH11503770A JPH11503770A JP8527357A JP52735796A JPH11503770A JP H11503770 A JPH11503770 A JP H11503770A JP 8527357 A JP8527357 A JP 8527357A JP 52735796 A JP52735796 A JP 52735796A JP H11503770 A JPH11503770 A JP H11503770A
- Authority
- JP
- Japan
- Prior art keywords
- parts
- liquid composition
- composition according
- component
- bisphenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. (a)少なくとも3の官能性と少なくとも650の分子量とを有するモノ マー性ポリ(メタ)アクリレート2〜20部; (b)2〜4の官能性と400〜10,000の分子量とを有するウレタン(メ タ)アクリレート20〜60部; (c)ビスフェノールAまたはビスフェノールFに基づくモノマー性またはオリ ゴマー性ジ(メタ)アクリレート20〜80部;および、 (d)光開始剤0.1〜10部: を含み、 全ての部が重量部であり、(a)+(b)+(c)+(d)の部の合計数が合 計で100となる液体組成物。 2. 成分(a)が880〜1200の範囲の分子量を有する、請求の範囲第1 項に記載の液体組成物。 3. 成分(a)が5〜18部の量で存在する、請求の範囲第1項または第2項 のいずれか1項に記載の液体組成物。 4. 成分(b)が20〜50部の量で存在する、請求の範囲第1項〜第3項の いずれか1項に記載の液体組成物。 5. 成分(c)が35〜55部の量で存在する、請求の範囲第1項〜第4項の いずれか1項に記載の液体組成物。 6. 成分(d)が2〜8部の量で存在する、請求の範囲第1項〜第5項のいず れか1項に記載の液体組成物。 7. 8〜16部の成分(a);25〜45部の成分(b);40〜50部の成 分(c);並びに3〜7部の成分(d)を含むかまたは本質的にそれらから成り 、全ての部が重量部であり、(a)+(b)+(c)+(d)の部の合計数が合 計で100となる、請求の範囲第1項に記載の液体組成物。 8. ビスフェノールAまたはビスフェノールFに基づくモノマー性またはオリ ゴマー性ジ(メタ)アクリレートが、エトキシ化されたビスフェノールAジアク リレートおよびエトキシ化されたビスフェノールAジメタクリレートから成る混 合物である、請求の範囲第1項〜第7項のいずれか1項に記載の液体組成物。 9. 30℃において300〜3000mPa.sの粘度を有する、請求の範囲第1 項〜第8項のいずれか1項に記載の液体組成物。 10. 三次元凝固した物品の製造のための、請求の範囲第1項〜第8項のいず れか1項に記載の液体組成物の使用。 11. ステレオリソグラフィーによって液体組成物から三次元凝固した物品を 製造するための方法であって、液体組成物が請求の範囲第1項〜第9項のいずれ か1項に定義されている通りであることを特徴とする上記の方法。 12. 三次元凝固した物品を製造するための方法であって、 (a)請求の範囲第1項〜第9項のいずれか1項に記載の液体組成物の層の表面 を紫外光または可視光光源によって、層が照射領域に所望される層厚さで凝固さ れるように、全表面としてまたは予め定めたパターンで照射し; (b)次いで、組成物の新しい層を前記凝固層上に形成し、これをまた、全表面 としてまたは予め定めたパターンで照射し; (c)工程(a)および(b)を繰り返すことによって、互いに接着した複数の 凝固した層から構成される三次元物品が得られる、 上記の方法。 13. 請求の範囲第1項〜第9項のいずれか1項による液体組成物から製造さ れるか、または、請求の範囲第11項または第12項による方法によって製造さ れる三次元凝固した物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9504995.3A GB9504995D0 (en) | 1995-03-11 | 1995-03-11 | Compositions |
GB9504995.3 | 1995-03-11 | ||
PCT/GB1996/000518 WO1996028763A1 (en) | 1995-03-11 | 1996-03-06 | Liquid photocurable compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11503770A true JPH11503770A (ja) | 1999-03-30 |
JP3787788B2 JP3787788B2 (ja) | 2006-06-21 |
Family
ID=10771094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52735796A Expired - Lifetime JP3787788B2 (ja) | 1995-03-11 | 1996-03-06 | 組成物 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6025114A (ja) |
EP (1) | EP0820609B1 (ja) |
JP (1) | JP3787788B2 (ja) |
AT (1) | ATE186127T1 (ja) |
AU (1) | AU703806B2 (ja) |
DE (1) | DE69604909T2 (ja) |
GB (1) | GB9504995D0 (ja) |
WO (1) | WO1996028763A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008189782A (ja) * | 2007-02-02 | 2008-08-21 | Cmet Inc | 面露光による光学的立体造形用樹脂組成物 |
JP2017222176A (ja) * | 2011-11-17 | 2017-12-21 | ストラタシス リミテッド | マルチマテリアル・アディティブ・マニュファクチャリングを使用して身体部位モデルを作製するシステムおよび方法 |
WO2018105463A1 (ja) * | 2016-12-05 | 2018-06-14 | Dic株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5922821A (en) * | 1996-08-09 | 1999-07-13 | Alcon Laboratories, Inc. | Ophthalmic lens polymers |
EP0831372A1 (de) * | 1996-09-23 | 1998-03-25 | Siemens Aktiengesellschaft | Photopolymere |
KR20010021846A (ko) | 1997-07-21 | 2001-03-15 | 베르너 훽스트, 지크프리트 포트호프 | 방사선 경화성 충전 조성물의 점도 안정화 |
US5891931A (en) * | 1997-08-07 | 1999-04-06 | Alcon Laboratories, Inc. | Method of preparing foldable high refractive index acrylic ophthalmic device materials |
US5994409A (en) * | 1997-12-09 | 1999-11-30 | U.S. Bioscience, Inc. | Methods for treatment of neuro--and nephro--disorders and therapeutic toxicities using aminothiol compounds |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US8026295B2 (en) * | 2000-02-17 | 2011-09-27 | Dentsply International, Inc. | Dental composition with improved light stability |
US20030225182A1 (en) * | 2001-01-04 | 2003-12-04 | Dentsply Detrey Gmbh | Dental composition with improved light stability |
US20040225029A1 (en) * | 2000-02-17 | 2004-11-11 | Uwe Walz | Dental composition with improved light stability |
US6375887B1 (en) | 2000-04-18 | 2002-04-23 | Victor Joyner | Method and apparatus for creating cast parts and investment models |
US6875640B1 (en) * | 2000-06-08 | 2005-04-05 | Micron Technology, Inc. | Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed |
US20040171716A1 (en) * | 2002-12-03 | 2004-09-02 | Uwe Walz | Dental compositions comprising bisacrylamides and use thereof |
WO2002013767A2 (en) | 2000-08-11 | 2002-02-21 | Dentsply International Inc. | Polyaminoester and their application in dental compositions |
US20030069327A1 (en) * | 2001-08-09 | 2003-04-10 | Uwe Walz | Dental compostions comprising bisacrylamides and use thereof |
JP2004507063A (ja) * | 2000-08-23 | 2004-03-04 | ダナ・コーポレーション | 燃料電池アセンブリ用エポキシニトリル絶縁体および密封体 |
US7220786B1 (en) | 2000-08-23 | 2007-05-22 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US7300690B2 (en) * | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
US20030045604A1 (en) * | 2001-08-13 | 2003-03-06 | Klee Joachim E. | Dental root canal filling cones |
US6716505B2 (en) * | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
US7196120B2 (en) * | 2002-08-29 | 2007-03-27 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US20040209990A1 (en) * | 2003-04-15 | 2004-10-21 | Uwe Walz | Low shrinking polymerizable dental material |
DE10328302A1 (de) * | 2003-06-23 | 2005-01-27 | Dreve Otoplastik Gmbh | Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
CA2593860C (en) * | 2005-02-01 | 2013-09-10 | Timothy P. Friel | Ocular prosthesis and fabrication method of same |
US7479247B2 (en) * | 2005-05-12 | 2009-01-20 | Victor Joyner | Method and apparatus for creating sacrificial patterns and cast parts |
CN101896868A (zh) * | 2007-07-20 | 2010-11-24 | 新加坡科技研究局 | 使用光固化组合物的双光子立体光刻成型 |
WO2009072987A1 (en) * | 2007-12-06 | 2009-06-11 | Agency For Science, Technology And Research | Integrated apparatus for conducting and monitoring chemical reactions |
US8343443B2 (en) * | 2008-03-31 | 2013-01-01 | Agency For Science, Technology And Research | Fluid processing and transfer using inter-connected multi-chamber device |
US10357435B2 (en) * | 2012-12-18 | 2019-07-23 | Dentca, Inc. | Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base |
DK2986654T3 (da) * | 2013-04-18 | 2020-05-25 | Dentca Inc | Lyshærdende harpikssammensætninger og fremgangsmåde til anvendelse af disse til tredimensionel printning til fremstilling af kunstige tænder og tandprotesebase |
US11584827B2 (en) | 2017-07-25 | 2023-02-21 | 3M Innovative Properties Company | Photopolymerizable compositions including a urethane component and a reactive diluent, articles, and methods |
RU2685211C2 (ru) * | 2017-10-10 | 2019-04-16 | Федеральное государственное учреждение "Федеральный научно-исследовательский центр "Кристаллография и фотоника" Российской академии наук" | Жидкая фотополимеризующаяся композиция для лазерной стереолитографии |
US11904031B2 (en) | 2017-11-22 | 2024-02-20 | 3M Innovative Properties Company | Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators |
CN111372959B (zh) | 2017-11-22 | 2022-09-02 | 3M创新有限公司 | 包含氨基甲酸酯组分和单官能反应性稀释剂的光致聚合型组合物、制品和方法 |
KR20210005628A (ko) | 2018-04-20 | 2021-01-14 | 디에스엠 아이피 어셋츠 비.브이. | 적층 제조용 복사선 경화성 조성물 |
EP3813763A1 (en) | 2018-06-29 | 2021-05-05 | 3M Innovative Properties Company | Orthodontic articles comprising cured free-radically polymerizable composition with improved strength in aqueous environment |
US20220251250A1 (en) * | 2021-02-08 | 2022-08-11 | James R. Glidewell Dental Ceramics, Inc. | Photocurable resin composition with low shrinkage and high accuracy for use in additive manufacturing processes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
WO1989008021A1 (en) * | 1988-03-02 | 1989-09-08 | Desoto, Inc. | Stereolithography using composition providing reduced distortion |
US4945032A (en) * | 1988-03-31 | 1990-07-31 | Desoto, Inc. | Stereolithography using repeated exposures to increase strength and reduce distortion |
KR0147812B1 (ko) * | 1989-01-10 | 1998-08-17 | 베르너 발대크 | 감광성 액체 수지 조성물 및 그로부터 3차원 물체를 제조하는 방법 |
DE59010008D1 (de) * | 1989-10-27 | 1996-02-08 | Ciba Geigy Ag | Photoempfindliches Gemisch |
EP0425440B1 (de) * | 1989-10-27 | 1994-11-17 | Ciba-Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen |
EP0506616B1 (de) * | 1991-03-27 | 1998-01-21 | Ciba SC Holding AG | Photoempfindliches Gemisch auf Basis von Acrylaten |
EP0525578A1 (en) * | 1991-08-02 | 1993-02-03 | E.I. Du Pont De Nemours And Company | Photopolymer composition for the production of three-dimensional objects |
EP0536086A1 (de) * | 1991-10-03 | 1993-04-07 | Ciba-Geigy Ag | Photoempfindliche Gemische |
TW311923B (ja) * | 1992-01-27 | 1997-08-01 | Ciba Sc Holding Ag | |
CA2092131A1 (en) * | 1992-03-27 | 1993-09-28 | Victor Kadziela (Nmi) | Low viscosity self-toughening acrylate composition |
FR2689876B1 (fr) * | 1992-04-08 | 1994-09-02 | Hoechst France | Dispersions silico-acryliques, leur procédé d'obtention, leur application en stéréophotolithographie et procédé de préparation d'objets en résine. |
-
1995
- 1995-03-11 GB GBGB9504995.3A patent/GB9504995D0/en active Pending
-
1996
- 1996-03-06 US US08/913,466 patent/US6025114A/en not_active Expired - Lifetime
- 1996-03-06 WO PCT/GB1996/000518 patent/WO1996028763A1/en active IP Right Grant
- 1996-03-06 AU AU48871/96A patent/AU703806B2/en not_active Ceased
- 1996-03-06 DE DE69604909T patent/DE69604909T2/de not_active Expired - Lifetime
- 1996-03-06 JP JP52735796A patent/JP3787788B2/ja not_active Expired - Lifetime
- 1996-03-06 AT AT96904961T patent/ATE186127T1/de not_active IP Right Cessation
- 1996-03-06 EP EP96904961A patent/EP0820609B1/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008189782A (ja) * | 2007-02-02 | 2008-08-21 | Cmet Inc | 面露光による光学的立体造形用樹脂組成物 |
JP2017222176A (ja) * | 2011-11-17 | 2017-12-21 | ストラタシス リミテッド | マルチマテリアル・アディティブ・マニュファクチャリングを使用して身体部位モデルを作製するシステムおよび方法 |
JP2019194028A (ja) * | 2011-11-17 | 2019-11-07 | ストラタシス リミテッド | マルチマテリアル・アディティブ・マニュファクチャリングを使用して身体部位モデルを作製するシステムおよび方法 |
WO2018105463A1 (ja) * | 2016-12-05 | 2018-06-14 | Dic株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
JPWO2018105463A1 (ja) * | 2016-12-05 | 2020-05-28 | Dic株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
US6025114A (en) | 2000-02-15 |
WO1996028763A1 (en) | 1996-09-19 |
AU4887196A (en) | 1996-10-02 |
DE69604909T2 (de) | 2000-02-17 |
GB9504995D0 (en) | 1995-04-26 |
DE69604909D1 (de) | 1999-12-02 |
JP3787788B2 (ja) | 2006-06-21 |
EP0820609A1 (en) | 1998-01-28 |
AU703806B2 (en) | 1999-04-01 |
EP0820609B1 (en) | 1999-10-27 |
ATE186127T1 (de) | 1999-11-15 |
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