DE69604909T2 - Flüssige photohärtbare zusammensetzungen - Google Patents
Flüssige photohärtbare zusammensetzungenInfo
- Publication number
- DE69604909T2 DE69604909T2 DE69604909T DE69604909T DE69604909T2 DE 69604909 T2 DE69604909 T2 DE 69604909T2 DE 69604909 T DE69604909 T DE 69604909T DE 69604909 T DE69604909 T DE 69604909T DE 69604909 T2 DE69604909 T2 DE 69604909T2
- Authority
- DE
- Germany
- Prior art keywords
- parts
- pct
- meth
- acrylate
- date sep
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9504995.3A GB9504995D0 (en) | 1995-03-11 | 1995-03-11 | Compositions |
PCT/GB1996/000518 WO1996028763A1 (en) | 1995-03-11 | 1996-03-06 | Liquid photocurable compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69604909D1 DE69604909D1 (de) | 1999-12-02 |
DE69604909T2 true DE69604909T2 (de) | 2000-02-17 |
Family
ID=10771094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69604909T Expired - Lifetime DE69604909T2 (de) | 1995-03-11 | 1996-03-06 | Flüssige photohärtbare zusammensetzungen |
Country Status (8)
Country | Link |
---|---|
US (1) | US6025114A (de) |
EP (1) | EP0820609B1 (de) |
JP (1) | JP3787788B2 (de) |
AT (1) | ATE186127T1 (de) |
AU (1) | AU703806B2 (de) |
DE (1) | DE69604909T2 (de) |
GB (1) | GB9504995D0 (de) |
WO (1) | WO1996028763A1 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5922821A (en) * | 1996-08-09 | 1999-07-13 | Alcon Laboratories, Inc. | Ophthalmic lens polymers |
EP0831372A1 (de) * | 1996-09-23 | 1998-03-25 | Siemens Aktiengesellschaft | Photopolymere |
WO1999005572A2 (en) * | 1997-07-21 | 1999-02-04 | Ciba Specialty Chemicals Holding Inc. | Viscosity stabilization of radiation-curable compositions |
US5891931A (en) * | 1997-08-07 | 1999-04-06 | Alcon Laboratories, Inc. | Method of preparing foldable high refractive index acrylic ophthalmic device materials |
US5994409A (en) * | 1997-12-09 | 1999-11-30 | U.S. Bioscience, Inc. | Methods for treatment of neuro--and nephro--disorders and therapeutic toxicities using aminothiol compounds |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US20030225182A1 (en) * | 2001-01-04 | 2003-12-04 | Dentsply Detrey Gmbh | Dental composition with improved light stability |
US20040225029A1 (en) * | 2000-02-17 | 2004-11-11 | Uwe Walz | Dental composition with improved light stability |
US8026295B2 (en) * | 2000-02-17 | 2011-09-27 | Dentsply International, Inc. | Dental composition with improved light stability |
US6375887B1 (en) | 2000-04-18 | 2002-04-23 | Victor Joyner | Method and apparatus for creating cast parts and investment models |
US6875640B1 (en) * | 2000-06-08 | 2005-04-05 | Micron Technology, Inc. | Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed |
US20040171716A1 (en) * | 2002-12-03 | 2004-09-02 | Uwe Walz | Dental compositions comprising bisacrylamides and use thereof |
US20030069327A1 (en) * | 2001-08-09 | 2003-04-10 | Uwe Walz | Dental compostions comprising bisacrylamides and use thereof |
US6734223B2 (en) * | 2000-08-11 | 2004-05-11 | Dentsply Detrey Gmbh | Polyaminoester and their application in dental compositions |
AU2001285160A1 (en) * | 2000-08-23 | 2002-03-04 | Dana Corporation | Epoxy nitrile insulator and seal for fuel cell assemblies |
US7220786B1 (en) | 2000-08-23 | 2007-05-22 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US7300690B2 (en) * | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
ATE307552T1 (de) * | 2001-08-13 | 2005-11-15 | Dentsply Int Inc | Kegel zur füllung von zahnwurzelkanälen |
US6716505B2 (en) * | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
US7196120B2 (en) * | 2002-08-29 | 2007-03-27 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US20040209990A1 (en) * | 2003-04-15 | 2004-10-21 | Uwe Walz | Low shrinking polymerizable dental material |
DE10328302A1 (de) * | 2003-06-23 | 2005-01-27 | Dreve Otoplastik Gmbh | Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
WO2006083875A2 (en) * | 2005-02-01 | 2006-08-10 | Friel Timothy P | Ocular prosthesis and fabrication method of same |
US7479247B2 (en) * | 2005-05-12 | 2009-01-20 | Victor Joyner | Method and apparatus for creating sacrificial patterns and cast parts |
JP5111880B2 (ja) * | 2007-02-02 | 2013-01-09 | シーメット株式会社 | 面露光による光学的立体造形用樹脂組成物 |
CN101896852B (zh) * | 2007-07-20 | 2013-11-06 | 新加坡科技研究局 | 减少焦平面变形的光束聚焦装置和方法 |
CN101932927B (zh) * | 2007-12-06 | 2012-07-04 | 新加坡科技研究局 | 用于进行和监测化学反应的集成装置及其操作方法 |
US8343443B2 (en) * | 2008-03-31 | 2013-01-01 | Agency For Science, Technology And Research | Fluid processing and transfer using inter-connected multi-chamber device |
EP3342581A1 (de) * | 2011-11-17 | 2018-07-04 | Stratasys Ltd. | Körperteilmodell aus mehreren materialien herstellt durch additive manufacturing |
US10357435B2 (en) * | 2012-12-18 | 2019-07-23 | Dentca, Inc. | Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base |
WO2014172716A1 (en) * | 2013-04-18 | 2014-10-23 | Dentca, Inc. | Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base |
JP2020075941A (ja) * | 2016-12-05 | 2020-05-21 | Dic株式会社 | サージカルガイド用の立体造形物を形成するために用いられる光学的立体造形用光硬化性樹脂組成物 |
CN110997744B (zh) | 2017-07-25 | 2022-06-24 | 3M创新有限公司 | 包含氨基甲酸酯组分和反应性稀释剂的光致聚合型组合物、制品和方法 |
RU2685211C2 (ru) * | 2017-10-10 | 2019-04-16 | Федеральное государственное учреждение "Федеральный научно-исследовательский центр "Кристаллография и фотоника" Российской академии наук" | Жидкая фотополимеризующаяся композиция для лазерной стереолитографии |
US11904031B2 (en) | 2017-11-22 | 2024-02-20 | 3M Innovative Properties Company | Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators |
EP3713536A1 (de) | 2017-11-22 | 2020-09-30 | 3M Innovative Properties Company | Photopolymerisierbare zusammensetzungen mit einer urethankomponente und einem monofunktionellen reaktiven verdünnungsmittel, artikel und verfahren |
WO2019204807A1 (en) | 2018-04-20 | 2019-10-24 | Dsm Ip Assets, B.V. | Radiation curable compositions for additive fabrication |
EP3813763A1 (de) | 2018-06-29 | 2021-05-05 | 3M Innovative Properties Company | Kieferorthopädische artikel mit einer gehärteten, freiradikalisch polymerisierbaren zusammensetzung mit verbesserter festigkeit in wässriger umgebung |
US20220251250A1 (en) * | 2021-02-08 | 2022-08-11 | James R. Glidewell Dental Ceramics, Inc. | Photocurable resin composition with low shrinkage and high accuracy for use in additive manufacturing processes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
WO1989008021A1 (en) * | 1988-03-02 | 1989-09-08 | Desoto, Inc. | Stereolithography using composition providing reduced distortion |
US4945032A (en) * | 1988-03-31 | 1990-07-31 | Desoto, Inc. | Stereolithography using repeated exposures to increase strength and reduce distortion |
KR0147812B1 (ko) * | 1989-01-10 | 1998-08-17 | 베르너 발대크 | 감광성 액체 수지 조성물 및 그로부터 3차원 물체를 제조하는 방법 |
EP0425441B1 (de) * | 1989-10-27 | 1995-12-27 | Ciba-Geigy Ag | Photoempfindliches Gemisch |
DE59007720D1 (de) * | 1989-10-27 | 1994-12-22 | Ciba Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen. |
EP0506616B1 (de) * | 1991-03-27 | 1998-01-21 | Ciba SC Holding AG | Photoempfindliches Gemisch auf Basis von Acrylaten |
EP0525578A1 (de) * | 1991-08-02 | 1993-02-03 | E.I. Du Pont De Nemours And Company | Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten |
EP0536086A1 (de) * | 1991-10-03 | 1993-04-07 | Ciba-Geigy Ag | Photoempfindliche Gemische |
TW311923B (de) * | 1992-01-27 | 1997-08-01 | Ciba Sc Holding Ag | |
CA2092131A1 (en) * | 1992-03-27 | 1993-09-28 | Victor Kadziela (Nmi) | Low viscosity self-toughening acrylate composition |
FR2689876B1 (fr) * | 1992-04-08 | 1994-09-02 | Hoechst France | Dispersions silico-acryliques, leur procédé d'obtention, leur application en stéréophotolithographie et procédé de préparation d'objets en résine. |
-
1995
- 1995-03-11 GB GBGB9504995.3A patent/GB9504995D0/en active Pending
-
1996
- 1996-03-06 DE DE69604909T patent/DE69604909T2/de not_active Expired - Lifetime
- 1996-03-06 EP EP96904961A patent/EP0820609B1/de not_active Expired - Lifetime
- 1996-03-06 AT AT96904961T patent/ATE186127T1/de not_active IP Right Cessation
- 1996-03-06 AU AU48871/96A patent/AU703806B2/en not_active Ceased
- 1996-03-06 WO PCT/GB1996/000518 patent/WO1996028763A1/en active IP Right Grant
- 1996-03-06 US US08/913,466 patent/US6025114A/en not_active Expired - Lifetime
- 1996-03-06 JP JP52735796A patent/JP3787788B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB9504995D0 (en) | 1995-04-26 |
US6025114A (en) | 2000-02-15 |
JP3787788B2 (ja) | 2006-06-21 |
JPH11503770A (ja) | 1999-03-30 |
ATE186127T1 (de) | 1999-11-15 |
AU4887196A (en) | 1996-10-02 |
AU703806B2 (en) | 1999-04-01 |
EP0820609A1 (de) | 1998-01-28 |
EP0820609B1 (de) | 1999-10-27 |
DE69604909D1 (de) | 1999-12-02 |
WO1996028763A1 (en) | 1996-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: AVECIA LTD., MANCHESTER, GB |
|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: VANTICO LTD., DUXFORD, CAMBRIDGE, GB |
|
8328 | Change in the person/name/address of the agent |
Free format text: ZUMSTEIN & KLINGSEISEN, 80331 MUENCHEN |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC |
|
R082 | Change of representative |
Ref document number: 820609 Country of ref document: EP Representative=s name: VON KREISLER SELTING WERNER, DE |
|
R081 | Change of applicant/patentee |
Ref document number: 820609 Country of ref document: EP Owner name: 3D SYSTEMS, INC., US Free format text: FORMER OWNER: VANTICO LTD., DUXFORD, GB Effective date: 20120827 |
|
R082 | Change of representative |
Ref document number: 820609 Country of ref document: EP Representative=s name: VON KREISLER SELTING WERNER, DE Effective date: 20120827 |