CA2028541A1 - Photosensitive mixture - Google Patents
Photosensitive mixtureInfo
- Publication number
- CA2028541A1 CA2028541A1 CA2028541A CA2028541A CA2028541A1 CA 2028541 A1 CA2028541 A1 CA 2028541A1 CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A1 CA2028541 A1 CA 2028541A1
- Authority
- CA
- Canada
- Prior art keywords
- weight
- meth
- acrylate
- monomeric
- bisphenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Liquid mixtures containing a) 5-25 % by weight of a monomeric aliphatic or cycloaliphatic di(meth)acrylate having a molecular weight (MW) of not more than 800, b) 0-15 % by weight of a monomeric poly(meth)acrylate having a functionality of at least 3 and an MW of not more than 600, c) 0-20 % by weight of a mono(meth)acrylate or a mono-N-vinyl compound having an MW of not more than 500, d) 20-60 % by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and an MW of 500 to 10,000, e) 10-50 % by weight of a monomeric or oligomeric di(meth)acrylate based on bisphenol A or bisphenol F, f) 0.1-10 % by weight of a photoinitiator and g) 0-5 % by weight of customary additives, the proportion of the components a) to g) together being 100 % by weight, are photosensitive mixtures which can be polymerized by means of actinic radiation and are preferentially suitable for the production of three-dimensional articles by means of the stereolithographic process.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH390289 | 1989-10-27 | ||
CH3902/89-2 | 1989-10-27 | ||
CH96690 | 1990-03-23 | ||
CH966/90-7 | 1990-03-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2028541A1 true CA2028541A1 (en) | 1991-04-28 |
CA2028541C CA2028541C (en) | 2000-05-16 |
Family
ID=25686242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002028541A Expired - Fee Related CA2028541C (en) | 1989-10-27 | 1990-10-25 | Photosensitive mixture |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0425441B1 (en) |
JP (1) | JP3243565B2 (en) |
KR (1) | KR0163588B1 (en) |
CA (1) | CA2028541C (en) |
DE (1) | DE59010008D1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6783809B2 (en) | 1992-01-27 | 2004-08-31 | Huntsman Advanced Materials Americas Inc. | Photosensitive diacrylate and dimethacrylate compositions |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE59209143D1 (en) * | 1991-03-27 | 1998-02-26 | Ciba Geigy Ag | Photosensitive mixture based on acrylates |
EP0525578A1 (en) * | 1991-08-02 | 1993-02-03 | E.I. Du Pont De Nemours And Company | Photopolymer composition for the production of three-dimensional objects |
TW418346B (en) * | 1993-03-05 | 2001-01-11 | Ciba Sc Holding Ag | Photopolymerisable compositions containing tetraacrylates |
DE59407524D1 (en) * | 1993-08-26 | 1999-02-04 | Ciba Geigy Ag | Liquid radiation-curable composition, especially for stereolithography |
GB9504995D0 (en) * | 1995-03-11 | 1995-04-26 | Zeneca Ltd | Compositions |
GB9504996D0 (en) * | 1995-03-11 | 1995-04-26 | Zeneca Ltd | Compositions |
GB9522656D0 (en) * | 1995-11-04 | 1996-01-03 | Zeneca Ltd | Mould |
JP3786480B2 (en) * | 1996-10-14 | 2006-06-14 | Jsr株式会社 | Photocurable resin composition |
JP3626302B2 (en) * | 1996-12-10 | 2005-03-09 | Jsr株式会社 | Photocurable resin composition |
JP3765896B2 (en) | 1996-12-13 | 2006-04-12 | Jsr株式会社 | Photocurable resin composition for optical three-dimensional modeling |
JP4839525B2 (en) | 2000-09-29 | 2011-12-21 | 大日本印刷株式会社 | Photosensitive resin composition and color filter for liquid crystal display |
DE10328302A1 (en) * | 2003-06-23 | 2005-01-27 | Dreve Otoplastik Gmbh | Low-viscosity, radiation-curable formulation, in particular for stereolithography, for use in medical technology, in particular for the production of ear pieces |
DE102004050868A1 (en) * | 2004-10-18 | 2006-04-20 | Dreve Otoplastik Gmbh | Low-viscosity, radiation-curable formulation for the production of ear molds |
KR100810998B1 (en) * | 2005-03-30 | 2008-03-11 | 주식회사 코오롱 | Prismatic film and manufacturing method thereof |
WO2006135054A1 (en) | 2005-06-16 | 2006-12-21 | Dsm Ip Assets B.V. | Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition |
JP2008201913A (en) | 2007-02-20 | 2008-09-04 | Fujifilm Corp | Photopolymerizable composition |
US10745576B2 (en) * | 2017-02-10 | 2020-08-18 | Basf Se | Acrylate-based monomers for use as reactive diluents in printing formulations |
US11001723B2 (en) | 2017-02-10 | 2021-05-11 | Basf Se | Acrylate-based monomers for use as reactive diluents in printing formulations |
EP3885383B1 (en) * | 2018-06-25 | 2024-07-17 | KJ Chemicals Corporation | Photocurable resin composition for three-dimensional molding, three-dimensional molding method using same, and three-dimensional molded product |
WO2021089313A1 (en) | 2019-11-07 | 2021-05-14 | Basf Se | Water-washable compositions for use in 3d printing |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
-
1990
- 1990-10-19 DE DE59010008T patent/DE59010008D1/en not_active Expired - Fee Related
- 1990-10-19 EP EP90810803A patent/EP0425441B1/en not_active Expired - Lifetime
- 1990-10-25 CA CA002028541A patent/CA2028541C/en not_active Expired - Fee Related
- 1990-10-26 JP JP29058090A patent/JP3243565B2/en not_active Expired - Fee Related
- 1990-10-26 KR KR1019900017201A patent/KR0163588B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6783809B2 (en) | 1992-01-27 | 2004-08-31 | Huntsman Advanced Materials Americas Inc. | Photosensitive diacrylate and dimethacrylate compositions |
Also Published As
Publication number | Publication date |
---|---|
EP0425441A2 (en) | 1991-05-02 |
KR0163588B1 (en) | 1998-12-15 |
EP0425441A3 (en) | 1991-06-26 |
EP0425441B1 (en) | 1995-12-27 |
JP3243565B2 (en) | 2002-01-07 |
KR910008491A (en) | 1991-05-31 |
CA2028541C (en) | 2000-05-16 |
DE59010008D1 (en) | 1996-02-08 |
JPH03160013A (en) | 1991-07-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |