CA2028541A1 - Photosensitive mixture - Google Patents

Photosensitive mixture

Info

Publication number
CA2028541A1
CA2028541A1 CA2028541A CA2028541A CA2028541A1 CA 2028541 A1 CA2028541 A1 CA 2028541A1 CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A1 CA2028541 A1 CA 2028541A1
Authority
CA
Canada
Prior art keywords
weight
meth
acrylate
monomeric
bisphenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2028541A
Other languages
French (fr)
Other versions
CA2028541C (en
Inventor
Max Hunziker
Manfred Hofmann
Adrian Schulthess
Paul Bernhard
Bernd Klingert
Rolf Wiesendanger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of CA2028541A1 publication Critical patent/CA2028541A1/en
Application granted granted Critical
Publication of CA2028541C publication Critical patent/CA2028541C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Liquid mixtures containing a) 5-25 % by weight of a monomeric aliphatic or cycloaliphatic di(meth)acrylate having a molecular weight (MW) of not more than 800, b) 0-15 % by weight of a monomeric poly(meth)acrylate having a functionality of at least 3 and an MW of not more than 600, c) 0-20 % by weight of a mono(meth)acrylate or a mono-N-vinyl compound having an MW of not more than 500, d) 20-60 % by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and an MW of 500 to 10,000, e) 10-50 % by weight of a monomeric or oligomeric di(meth)acrylate based on bisphenol A or bisphenol F, f) 0.1-10 % by weight of a photoinitiator and g) 0-5 % by weight of customary additives, the proportion of the components a) to g) together being 100 % by weight, are photosensitive mixtures which can be polymerized by means of actinic radiation and are preferentially suitable for the production of three-dimensional articles by means of the stereolithographic process.
CA002028541A 1989-10-27 1990-10-25 Photosensitive mixture Expired - Fee Related CA2028541C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH390289 1989-10-27
CH3902/89-2 1989-10-27
CH96690 1990-03-23
CH966/90-7 1990-03-23

Publications (2)

Publication Number Publication Date
CA2028541A1 true CA2028541A1 (en) 1991-04-28
CA2028541C CA2028541C (en) 2000-05-16

Family

ID=25686242

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002028541A Expired - Fee Related CA2028541C (en) 1989-10-27 1990-10-25 Photosensitive mixture

Country Status (5)

Country Link
EP (1) EP0425441B1 (en)
JP (1) JP3243565B2 (en)
KR (1) KR0163588B1 (en)
CA (1) CA2028541C (en)
DE (1) DE59010008D1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783809B2 (en) 1992-01-27 2004-08-31 Huntsman Advanced Materials Americas Inc. Photosensitive diacrylate and dimethacrylate compositions

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59209143D1 (en) * 1991-03-27 1998-02-26 Ciba Geigy Ag Photosensitive mixture based on acrylates
EP0525578A1 (en) * 1991-08-02 1993-02-03 E.I. Du Pont De Nemours And Company Photopolymer composition for the production of three-dimensional objects
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
DE59407524D1 (en) * 1993-08-26 1999-02-04 Ciba Geigy Ag Liquid radiation-curable composition, especially for stereolithography
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9504996D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9522656D0 (en) * 1995-11-04 1996-01-03 Zeneca Ltd Mould
JP3786480B2 (en) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 Photocurable resin composition
JP3626302B2 (en) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 Photocurable resin composition
JP3765896B2 (en) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 Photocurable resin composition for optical three-dimensional modeling
JP4839525B2 (en) 2000-09-29 2011-12-21 大日本印刷株式会社 Photosensitive resin composition and color filter for liquid crystal display
DE10328302A1 (en) * 2003-06-23 2005-01-27 Dreve Otoplastik Gmbh Low-viscosity, radiation-curable formulation, in particular for stereolithography, for use in medical technology, in particular for the production of ear pieces
DE102004050868A1 (en) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Low-viscosity, radiation-curable formulation for the production of ear molds
KR100810998B1 (en) * 2005-03-30 2008-03-11 주식회사 코오롱 Prismatic film and manufacturing method thereof
WO2006135054A1 (en) 2005-06-16 2006-12-21 Dsm Ip Assets B.V. Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition
JP2008201913A (en) 2007-02-20 2008-09-04 Fujifilm Corp Photopolymerizable composition
US10745576B2 (en) * 2017-02-10 2020-08-18 Basf Se Acrylate-based monomers for use as reactive diluents in printing formulations
US11001723B2 (en) 2017-02-10 2021-05-11 Basf Se Acrylate-based monomers for use as reactive diluents in printing formulations
EP3885383B1 (en) * 2018-06-25 2024-07-17 KJ Chemicals Corporation Photocurable resin composition for three-dimensional molding, three-dimensional molding method using same, and three-dimensional molded product
WO2021089313A1 (en) 2019-11-07 2021-05-14 Basf Se Water-washable compositions for use in 3d printing

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783809B2 (en) 1992-01-27 2004-08-31 Huntsman Advanced Materials Americas Inc. Photosensitive diacrylate and dimethacrylate compositions

Also Published As

Publication number Publication date
EP0425441A2 (en) 1991-05-02
KR0163588B1 (en) 1998-12-15
EP0425441A3 (en) 1991-06-26
EP0425441B1 (en) 1995-12-27
JP3243565B2 (en) 2002-01-07
KR910008491A (en) 1991-05-31
CA2028541C (en) 2000-05-16
DE59010008D1 (en) 1996-02-08
JPH03160013A (en) 1991-07-10

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Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed