CA2028541A1 - Melange photosensible - Google Patents

Melange photosensible

Info

Publication number
CA2028541A1
CA2028541A1 CA2028541A CA2028541A CA2028541A1 CA 2028541 A1 CA2028541 A1 CA 2028541A1 CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A CA2028541 A CA 2028541A CA 2028541 A1 CA2028541 A1 CA 2028541A1
Authority
CA
Canada
Prior art keywords
weight
meth
acrylate
monomeric
bisphenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2028541A
Other languages
English (en)
Other versions
CA2028541C (fr
Inventor
Max Hunziker
Manfred Hofmann
Adrian Schulthess
Paul Bernhard
Bernd Klingert
Rolf Wiesendanger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of CA2028541A1 publication Critical patent/CA2028541A1/fr
Application granted granted Critical
Publication of CA2028541C publication Critical patent/CA2028541C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CA002028541A 1989-10-27 1990-10-25 Melange photosensible Expired - Fee Related CA2028541C (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH3902/89-2 1989-10-27
CH390289 1989-10-27
CH96690 1990-03-23
CH966/90-7 1990-03-23

Publications (2)

Publication Number Publication Date
CA2028541A1 true CA2028541A1 (fr) 1991-04-28
CA2028541C CA2028541C (fr) 2000-05-16

Family

ID=25686242

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002028541A Expired - Fee Related CA2028541C (fr) 1989-10-27 1990-10-25 Melange photosensible

Country Status (5)

Country Link
EP (1) EP0425441B1 (fr)
JP (1) JP3243565B2 (fr)
KR (1) KR0163588B1 (fr)
CA (1) CA2028541C (fr)
DE (1) DE59010008D1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783809B2 (en) 1992-01-27 2004-08-31 Huntsman Advanced Materials Americas Inc. Photosensitive diacrylate and dimethacrylate compositions

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0506616B1 (fr) * 1991-03-27 1998-01-21 Ciba SC Holding AG Mélange photosensible à base d'acrylates
EP0525578A1 (fr) * 1991-08-02 1993-02-03 E.I. Du Pont De Nemours And Company Composition à base de photopolymères pour la fabrication d'objets tridimensionnels
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
EP0643329B2 (fr) * 1993-08-26 2002-02-06 Vantico AG Composition liquide durcissable par rayonnement, en particulier pour la stéréolithographie
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9504996D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9522656D0 (en) * 1995-11-04 1996-01-03 Zeneca Ltd Mould
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
JP4839525B2 (ja) 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
DE10328302A1 (de) * 2003-06-23 2005-01-27 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken
KR100810998B1 (ko) * 2005-03-30 2008-03-11 주식회사 코오롱 프리즘 필름 및 그 제조방법
WO2006135054A1 (fr) 2005-06-16 2006-12-21 Dsm Ip Assets B.V. Composition de resine liquide durcissable par radiations radioactives pour une utilisation en stereolithographie optique, et article mis en forme optiquement obtenu en durcissant la composition
JP2008201913A (ja) 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
WO2018146259A1 (fr) * 2017-02-10 2018-08-16 Basf Se Monomères à base d'acrylate à utiliser en tant que diluants réactifs dans des formulations d'impression
MY193750A (en) 2017-02-10 2022-10-27 Basf Se Acrylate-based monomers for use as reactive diluents in printing formulations
JP6742654B2 (ja) * 2018-06-25 2020-08-19 Ｋｊケミカルズ株式会社 三次元造形用光硬化性樹脂組成物及びそれを用いた三次元造形方法、三次元造形物
WO2021089313A1 (fr) 2019-11-07 2021-05-14 Basf Se Compositions rinçables à l'eau destinées à être utilisées en impression 3d

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783809B2 (en) 1992-01-27 2004-08-31 Huntsman Advanced Materials Americas Inc. Photosensitive diacrylate and dimethacrylate compositions

Also Published As

Publication number Publication date
KR910008491A (ko) 1991-05-31
KR0163588B1 (ko) 1998-12-15
DE59010008D1 (de) 1996-02-08
EP0425441A3 (fr) 1991-06-26
JP3243565B2 (ja) 2002-01-07
EP0425441A2 (fr) 1991-05-02
JPH03160013A (ja) 1991-07-10
CA2028541C (fr) 2000-05-16
EP0425441B1 (fr) 1995-12-27

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