JPH1126775A5 - - Google Patents

Info

Publication number
JPH1126775A5
JPH1126775A5 JP1997194974A JP19497497A JPH1126775A5 JP H1126775 A5 JPH1126775 A5 JP H1126775A5 JP 1997194974 A JP1997194974 A JP 1997194974A JP 19497497 A JP19497497 A JP 19497497A JP H1126775 A5 JPH1126775 A5 JP H1126775A5
Authority
JP
Japan
Prior art keywords
region
semiconductor device
channel formation
impurity
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997194974A
Other languages
English (en)
Japanese (ja)
Other versions
JP3859821B2 (ja
JPH1126775A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19497497A priority Critical patent/JP3859821B2/ja
Priority claimed from JP19497497A external-priority patent/JP3859821B2/ja
Priority to US09/109,322 priority patent/US6184556B1/en
Publication of JPH1126775A publication Critical patent/JPH1126775A/ja
Priority to US09/752,976 priority patent/US6420759B2/en
Priority to US10/187,068 priority patent/US6583474B2/en
Publication of JPH1126775A5 publication Critical patent/JPH1126775A5/ja
Application granted granted Critical
Publication of JP3859821B2 publication Critical patent/JP3859821B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP19497497A 1997-07-04 1997-07-04 半導体装置 Expired - Fee Related JP3859821B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19497497A JP3859821B2 (ja) 1997-07-04 1997-07-04 半導体装置
US09/109,322 US6184556B1 (en) 1997-07-04 1998-07-02 Semiconductor device
US09/752,976 US6420759B2 (en) 1997-07-04 2000-12-28 Semiconductor device
US10/187,068 US6583474B2 (en) 1997-07-04 2002-06-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19497497A JP3859821B2 (ja) 1997-07-04 1997-07-04 半導体装置

Publications (3)

Publication Number Publication Date
JPH1126775A JPH1126775A (ja) 1999-01-29
JPH1126775A5 true JPH1126775A5 (enExample) 2005-05-19
JP3859821B2 JP3859821B2 (ja) 2006-12-20

Family

ID=16333449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19497497A Expired - Fee Related JP3859821B2 (ja) 1997-07-04 1997-07-04 半導体装置

Country Status (2)

Country Link
US (3) US6184556B1 (enExample)
JP (1) JP3859821B2 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4103968B2 (ja) * 1996-09-18 2008-06-18 株式会社半導体エネルギー研究所 絶縁ゲイト型半導体装置
US6590230B1 (en) 1996-10-15 2003-07-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP4017706B2 (ja) 1997-07-14 2007-12-05 株式会社半導体エネルギー研究所 半導体装置
US6686623B2 (en) * 1997-11-18 2004-02-03 Semiconductor Energy Laboratory Co., Ltd. Nonvolatile memory and electronic apparatus
JP4236722B2 (ja) * 1998-02-05 2009-03-11 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2000012864A (ja) * 1998-06-22 2000-01-14 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
US6271101B1 (en) 1998-07-29 2001-08-07 Semiconductor Energy Laboratory Co., Ltd. Process for production of SOI substrate and process for production of semiconductor device
JP4476390B2 (ja) 1998-09-04 2010-06-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
FR2799048B1 (fr) * 1999-09-23 2003-02-21 St Microelectronics Sa Procede de fabrication d'un transistor bipolaire vertical auto-aligne
KR100436802B1 (ko) * 1999-10-08 2004-06-23 후지 샤신 필름 가부시기가이샤 고체촬상소자
JP2001244469A (ja) * 2000-03-02 2001-09-07 Oki Electric Ind Co Ltd 半導体装置およびその製造方法
US6420767B1 (en) * 2000-06-28 2002-07-16 Advanced Micro Devices, Inc. Capacitively coupled DTMOS on SOI
US6724037B2 (en) * 2000-07-21 2004-04-20 Semiconductor Energy Laboratory Co., Ltd. Nonvolatile memory and semiconductor device
US6580106B2 (en) * 2001-01-12 2003-06-17 Isetex. Inc CMOS image sensor with complete pixel reset without kTC noise generation
US6624476B1 (en) * 2001-04-27 2003-09-23 Advanced Micro Devices, Inc. Semiconductor-on-insulator (SOI) substrate having selective dopant implant in insulator layer and method of fabricating
US6611023B1 (en) 2001-05-01 2003-08-26 Advanced Micro Devices, Inc. Field effect transistor with self alligned double gate and method of forming same
GB0111423D0 (en) * 2001-05-10 2001-07-04 Koninkl Philips Electronics Nv An electronic device including a thin film transistor
US7084459B2 (en) * 2001-05-29 2006-08-01 Nippon Steel Corporation SOI substrate
US7061049B2 (en) * 2001-06-12 2006-06-13 Kabushiki Kaisha Toshiba Semiconductor device using SOI device and semiconductor integrated circuit using the semiconductor device
US6900085B2 (en) * 2001-06-26 2005-05-31 Advanced Micro Devices, Inc. ESD implant following spacer deposition
JP3667676B2 (ja) * 2001-10-11 2005-07-06 株式会社東芝 半導体装置、半導体装置の製造方法及び半導体装置の電気特性評価システム
JP4275336B2 (ja) 2001-11-16 2009-06-10 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2003298059A (ja) * 2002-03-29 2003-10-17 Advanced Lcd Technologies Development Center Co Ltd 薄膜トランジスタ
JP4457209B2 (ja) * 2002-04-10 2010-04-28 セイコーインスツル株式会社 絶縁ゲート薄膜トランジスタとその制御方法
JP2004152962A (ja) * 2002-10-30 2004-05-27 Oki Electric Ind Co Ltd 半導体装置の製造方法
JP4179866B2 (ja) 2002-12-24 2008-11-12 株式会社沖データ 半導体複合装置及びｌｅｄヘッド
US6847065B1 (en) * 2003-04-16 2005-01-25 Raytheon Company Radiation-hardened transistor fabricated by modified CMOS process
JP4319078B2 (ja) 2004-03-26 2009-08-26 シャープ株式会社 半導体装置の製造方法
TW200601566A (en) * 2004-06-28 2006-01-01 Adv Lcd Tech Dev Ct Co Ltd Semiconductor apparatus and manufacturing method thereof
US7271457B2 (en) * 2005-03-04 2007-09-18 Bae Systems Information And Electronic Systems Integration Inc. Abrupt channel doping profile for fermi threshold field effect transistors
WO2006124520A2 (en) * 2005-05-13 2006-11-23 The Charles Machine Works, Inc. Dipole locator using multiple measurement points
US7598526B2 (en) 2006-03-08 2009-10-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5137424B2 (ja) * 2006-03-08 2013-02-06 株式会社半導体エネルギー研究所 半導体装置及びその作製方法
US7692223B2 (en) * 2006-04-28 2010-04-06 Semiconductor Energy Laboratory Co., Ltd Semiconductor device and method for manufacturing the same
US7605413B2 (en) * 2006-06-16 2009-10-20 Taiwan Seminconductor Manufacturing Co., Ltd. High voltage devices
EP2009679A1 (en) * 2007-06-25 2008-12-31 Interuniversitair Microelektronica Centrum (IMEC) Semiconductor device
US9184275B2 (en) 2012-06-27 2015-11-10 Transphorm Inc. Semiconductor devices with integrated hole collectors
US9806198B2 (en) * 2013-06-05 2017-10-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
CN109075201B (zh) * 2016-04-27 2021-05-07 三菱电机株式会社 半导体装置及电力变换装置
CN109545798B (zh) * 2018-10-18 2020-08-11 武汉华星光电半导体显示技术有限公司 一种阵列基板及其制作方法
WO2023184345A1 (zh) * 2022-03-31 2023-10-05 京东方科技集团股份有限公司 薄膜晶体管和显示面板

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4454524A (en) * 1978-03-06 1984-06-12 Ncr Corporation Device having implantation for controlling gate parasitic action
EP0287658A1 (en) 1986-10-27 1988-10-26 Hughes Aircraft Company Striped-channel transistor and method of forming the same
JP2507567B2 (ja) * 1988-11-25 1996-06-12 三菱電機株式会社 絶縁体基板上の半導体層に形成されたｍｏｓ型電界効果トランジスタ
US5210437A (en) * 1990-04-20 1993-05-11 Kabushiki Kaisha Toshiba MOS device having a well layer for controlling threshold voltage
USH1435H (en) * 1991-10-21 1995-05-02 Cherne Richard D SOI CMOS device having body extension for providing sidewall channel stop and bodytie
US5786620A (en) * 1992-01-28 1998-07-28 Thunderbird Technologies, Inc. Fermi-threshold field effect transistors including source/drain pocket implants and methods of fabricating same
TW222345B (en) * 1992-02-25 1994-04-11 Semicondustor Energy Res Co Ltd Semiconductor and its manufacturing method
US5641696A (en) * 1994-08-31 1997-06-24 Nkk Corporation Method of forming diffusion layer and method of manufacturing nonvolatile semiconductor memory device
US5619053A (en) * 1995-05-31 1997-04-08 Mitsubishi Denki Kabushiki Kaisha Semiconductor device having an SOI structure
US5753958A (en) * 1995-10-16 1998-05-19 Sun Microsystems, Inc. Back-biasing in asymmetric MOS devices

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