JPH1121693A5 - - Google Patents

Info

Publication number
JPH1121693A5
JPH1121693A5 JP1997188953A JP18895397A JPH1121693A5 JP H1121693 A5 JPH1121693 A5 JP H1121693A5 JP 1997188953 A JP1997188953 A JP 1997188953A JP 18895397 A JP18895397 A JP 18895397A JP H1121693 A5 JPH1121693 A5 JP H1121693A5
Authority
JP
Japan
Prior art keywords
group
hydrogen atom
atom
alkyl
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997188953A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1121693A (ja
JP3782869B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP18895397A priority Critical patent/JP3782869B2/ja
Priority claimed from JP18895397A external-priority patent/JP3782869B2/ja
Publication of JPH1121693A publication Critical patent/JPH1121693A/ja
Publication of JPH1121693A5 publication Critical patent/JPH1121693A5/ja
Application granted granted Critical
Publication of JP3782869B2 publication Critical patent/JP3782869B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP18895397A 1997-07-01 1997-07-01 錫−銀合金めっき浴 Expired - Lifetime JP3782869B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18895397A JP3782869B2 (ja) 1997-07-01 1997-07-01 錫−銀合金めっき浴

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18895397A JP3782869B2 (ja) 1997-07-01 1997-07-01 錫−銀合金めっき浴

Publications (3)

Publication Number Publication Date
JPH1121693A JPH1121693A (ja) 1999-01-26
JPH1121693A5 true JPH1121693A5 (enExample) 2004-08-19
JP3782869B2 JP3782869B2 (ja) 2006-06-07

Family

ID=16232819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18895397A Expired - Lifetime JP3782869B2 (ja) 1997-07-01 1997-07-01 錫−銀合金めっき浴

Country Status (1)

Country Link
JP (1) JP3782869B2 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6210556B1 (en) * 1998-02-12 2001-04-03 Learonal, Inc. Electrolyte and tin-silver electroplating process
JP3352422B2 (ja) 1999-02-10 2002-12-03 セントラル硝子株式会社 銀被膜形成用薬液および銀被膜形成方法
JP3433291B2 (ja) * 1999-09-27 2003-08-04 石原薬品株式会社 スズ−銅含有合金メッキ浴、スズ−銅含有合金メッキ方法及びスズ−銅含有合金メッキ皮膜が形成された物品
JP3181571B2 (ja) * 2000-01-27 2001-07-03 日本エレクトロプレイテイング・エンジニヤース株式会社 金メッキ液及びそれを用いた金メッキ方法
DE10026680C1 (de) * 2000-05-30 2002-02-21 Schloetter Fa Dr Ing Max Elektrolyt und Verfahren zur Abscheidung von Zinn-Silber-Legierungsschichten und Verwendung des Elektrolyten
US6448281B1 (en) 2000-07-06 2002-09-10 Boehringer Ingelheim (Canada) Ltd. Viral polymerase inhibitors
FR2825764B1 (fr) * 2001-06-07 2003-09-19 Hispano Suiza Sa Palier lisse muni d'un revetement de frottement et procede de realisation
AU2003252677A1 (en) * 2002-07-25 2004-02-16 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
US7273540B2 (en) 2002-07-25 2007-09-25 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
JP4758614B2 (ja) * 2003-04-07 2011-08-31 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 電気めっき組成物および方法
EP1826295A4 (en) 2004-10-21 2011-06-29 Fcm Co Ltd METHOD FOR FORMING A THIN FILM OF SN-AG-CU-DREAMED ALLOY ALLOY ALLOY
JP3741709B1 (ja) * 2005-02-07 2006-02-01 Ｆｃｍ株式会社 Ｓｎ−Ａｇ−Ｃｕ三元合金薄膜を形成する方法
JP4756887B2 (ja) * 2005-03-22 2011-08-24 石原薬品株式会社 非シアン系のスズ−銀合金電気メッキ浴
JP4756886B2 (ja) * 2005-03-22 2011-08-24 石原薬品株式会社 非シアン系のスズ−銀合金メッキ浴
US7713859B2 (en) * 2005-08-15 2010-05-11 Enthone Inc. Tin-silver solder bumping in electronics manufacture
EP1918426A1 (de) * 2006-10-09 2008-05-07 Enthone, Inc. Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten
JP5622360B2 (ja) * 2009-01-16 2014-11-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 電気錫めっき液および電気錫めっき方法
DE102009029558A1 (de) * 2009-09-17 2011-03-31 Schott Solar Ag Elektrolytzusammensetzung
JP2017025382A (ja) * 2015-07-23 2017-02-02 奥野製薬工業株式会社 黒色光沢スズ−ニッケル合金めっき浴、スズ−ニッケル合金めっき方法、黒色光沢スズ−ニッケル合金めっき皮膜及び該皮膜を有する物品
JP7009679B2 (ja) * 2015-07-29 2022-01-26 石原ケミカル株式会社 電気スズ及び電気スズ合金メッキ浴、当該メッキ浴を用いた電着物の形成方法
JP6834070B2 (ja) * 2016-06-13 2021-02-24 石原ケミカル株式会社 電気スズ及びスズ合金メッキ浴、当該メッキ浴を用いて電着物を形成した電子部品の製造方法

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