JPH11214302A - 走査型露光装置及び走査露光方法 - Google Patents

走査型露光装置及び走査露光方法

Info

Publication number
JPH11214302A
JPH11214302A JP10304785A JP30478598A JPH11214302A JP H11214302 A JPH11214302 A JP H11214302A JP 10304785 A JP10304785 A JP 10304785A JP 30478598 A JP30478598 A JP 30478598A JP H11214302 A JPH11214302 A JP H11214302A
Authority
JP
Japan
Prior art keywords
mask
stage
substrate
scanning exposure
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10304785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11214302A5 (enExample
Inventor
Takechika Nishi
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10304785A priority Critical patent/JPH11214302A/ja
Publication of JPH11214302A publication Critical patent/JPH11214302A/ja
Publication of JPH11214302A5 publication Critical patent/JPH11214302A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10304785A 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法 Pending JPH11214302A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10304785A JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP29324997 1997-10-10
JP9-293249 1997-10-10
JP10304785A JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Publications (2)

Publication Number Publication Date
JPH11214302A true JPH11214302A (ja) 1999-08-06
JPH11214302A5 JPH11214302A5 (enExample) 2005-11-24

Family

ID=26559325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10304785A Pending JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Country Status (1)

Country Link
JP (1) JPH11214302A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001047001A1 (en) * 1999-12-21 2001-06-28 Nikon Corporation Exposure method and apparatus
WO2002054462A1 (en) * 2000-12-28 2002-07-11 Nikon Corporation Stage device, exposure device, method of adjusting multipoint position detection system, exposure method, and device manufacturing method
JP2007116143A (ja) * 2005-09-28 2007-05-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2014195099A (ja) * 2010-12-14 2014-10-09 Nikon Corp 露光装置及びデバイス製造方法
WO2016005117A1 (en) * 2014-07-08 2016-01-14 Asml Netherlands B.V. Lithographic apparatus and method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001047001A1 (en) * 1999-12-21 2001-06-28 Nikon Corporation Exposure method and apparatus
US6836093B1 (en) 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
WO2002054462A1 (en) * 2000-12-28 2002-07-11 Nikon Corporation Stage device, exposure device, method of adjusting multipoint position detection system, exposure method, and device manufacturing method
JP2007116143A (ja) * 2005-09-28 2007-05-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2014195099A (ja) * 2010-12-14 2014-10-09 Nikon Corp 露光装置及びデバイス製造方法
US9575417B2 (en) 2010-12-14 2017-02-21 Nikon Corporation Exposure apparatus including a mask holding device which holds a periphery area of a pattern area of the mask from above
WO2016005117A1 (en) * 2014-07-08 2016-01-14 Asml Netherlands B.V. Lithographic apparatus and method
US10088756B2 (en) 2014-07-08 2018-10-02 Asml Netherlands B.V. Lithographic apparatus and method

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