JPH11214302A5 - - Google Patents

Info

Publication number
JPH11214302A5
JPH11214302A5 JP1998304785A JP30478598A JPH11214302A5 JP H11214302 A5 JPH11214302 A5 JP H11214302A5 JP 1998304785 A JP1998304785 A JP 1998304785A JP 30478598 A JP30478598 A JP 30478598A JP H11214302 A5 JPH11214302 A5 JP H11214302A5
Authority
JP
Japan
Prior art keywords
mask
substrate
pattern
scanning exposure
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998304785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11214302A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10304785A priority Critical patent/JPH11214302A/ja
Priority claimed from JP10304785A external-priority patent/JPH11214302A/ja
Publication of JPH11214302A publication Critical patent/JPH11214302A/ja
Publication of JPH11214302A5 publication Critical patent/JPH11214302A5/ja
Pending legal-status Critical Current

Links

JP10304785A 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法 Pending JPH11214302A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10304785A JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-293249 1997-10-10
JP29324997 1997-10-10
JP10304785A JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Publications (2)

Publication Number Publication Date
JPH11214302A JPH11214302A (ja) 1999-08-06
JPH11214302A5 true JPH11214302A5 (enExample) 2005-11-24

Family

ID=26559325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10304785A Pending JPH11214302A (ja) 1997-10-10 1998-10-12 走査型露光装置及び走査露光方法

Country Status (1)

Country Link
JP (1) JPH11214302A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6836093B1 (en) 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
JP2004253401A (ja) * 2000-12-28 2004-09-09 Nikon Corp ステージ装置、露光装置、多点位置検出系の調整方法、及びデバイス製造方法
US7505113B2 (en) * 2005-09-28 2009-03-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101539153B1 (ko) 2010-12-14 2015-07-23 가부시키가이샤 니콘 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
WO2016005117A1 (en) * 2014-07-08 2016-01-14 Asml Netherlands B.V. Lithographic apparatus and method

Similar Documents

Publication Publication Date Title
US6504160B2 (en) Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
JP2593440B2 (ja) 投影型露光装置
JP2000106340A5 (enExample)
JP6774031B2 (ja) レイアウト方法、マーク検出方法、露光方法、計測装置、露光装置、並びにデバイス製造方法
US20150124233A1 (en) Illumination system for an euv projection lithographic projection exposure apparatus
EP0834772A2 (en) Exposure apparatus
JPH11214302A5 (enExample)
KR100752081B1 (ko) 노광방법과 노광장치, 및 디바이스 제조방법
US5883700A (en) Method for projection exposure to light
TWI277841B (en) Methods and systems for lithographic beam generation
JP2018519551A (ja) リソグラフィ装置及び方法
JPH0812843B2 (ja) 光学結像装置及び方法
JP5151949B2 (ja) 移動体装置及び移動体駆動方法、露光装置、並びにデバイス製造方法
US10747117B2 (en) Extreme ultraviolet lithography system that utilizes pattern stitching
JP4092753B2 (ja) 走査型露光装置及び走査露光方法
TWI278003B (en) Lithographic apparatus and device manufacturing method
JP5305146B2 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JPH11168063A5 (enExample)
TW202246910A (zh) 曝光裝置、元件製造方法、平板顯示器之製造方法及曝光方法
JP2010114265A (ja) 走査露光装置およびその制御方法、ならびにデバイス製造方法
JP6701597B2 (ja) 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2000031052A (ja) リトグラフ投影装置
JP2008140794A (ja) 露光装置
JP5187519B2 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JPS6254591B2 (enExample)