JP2000106340A5 - - Google Patents
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- JP2000106340A5 JP2000106340A5 JP1998290053A JP29005398A JP2000106340A5 JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5 JP 1998290053 A JP1998290053 A JP 1998290053A JP 29005398 A JP29005398 A JP 29005398A JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- compartment region
- scanning exposure
- compartment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 description 248
- 238000000034 method Methods 0.000 description 56
- 230000001133 acceleration Effects 0.000 description 27
- 230000005484 gravity Effects 0.000 description 9
- 238000005192 partition Methods 0.000 description 6
- 230000001360 synchronised effect Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- JUJBNYBVVQSIOU-UHFFFAOYSA-M sodium;4-[2-(4-iodophenyl)-3-(4-nitrophenyl)tetrazol-2-ium-5-yl]benzene-1,3-disulfonate Chemical compound [Na+].C1=CC([N+](=O)[O-])=CC=C1N1[N+](C=2C=CC(I)=CC=2)=NC(C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)=N1 JUJBNYBVVQSIOU-UHFFFAOYSA-M 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000000803 paradoxical effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10290053A JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-279500 | 1997-09-26 | ||
| JP27950097 | 1997-09-26 | ||
| JP10-226500 | 1998-07-27 | ||
| JP22650098 | 1998-07-27 | ||
| JP10290053A JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000106340A JP2000106340A (ja) | 2000-04-11 |
| JP2000106340A5 true JP2000106340A5 (enExample) | 2005-11-10 |
Family
ID=27331177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10290053A Withdrawn JP2000106340A (ja) | 1997-09-26 | 1998-09-28 | 露光装置及び走査露光方法、並びにステージ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000106340A (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6927505B2 (en) | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
| JP3679776B2 (ja) * | 2002-04-22 | 2005-08-03 | キヤノン株式会社 | 駆動装置、露光装置及びデバイス製造方法 |
| KR20170018113A (ko) | 2003-04-09 | 2017-02-15 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| JP4315198B2 (ja) | 2003-04-11 | 2009-08-19 | 株式会社ニコン | 液浸液体を光学アセンブリ下に維持するリソグラフィ装置及び液浸液体維持方法並びにそれらを用いるデバイス製造方法 |
| DE602004024782D1 (de) * | 2003-06-19 | 2010-02-04 | Nippon Kogaku Kk | Belichtungseinrichtung und bauelementeherstellungsverfahren |
| TWI569308B (zh) | 2003-10-28 | 2017-02-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
| KR100585108B1 (ko) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법 |
| TWI512335B (zh) | 2003-11-20 | 2015-12-11 | 尼康股份有限公司 | 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法 |
| US7016019B2 (en) | 2003-12-16 | 2006-03-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| TWI505329B (zh) | 2004-02-06 | 2015-10-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
| KR101544336B1 (ko) | 2005-05-12 | 2015-08-12 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| SG174740A1 (en) * | 2006-09-01 | 2011-10-28 | Nikon Corp | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP6066610B2 (ja) * | 2012-07-31 | 2017-01-25 | キヤノン株式会社 | 露光方法、露光装置及びデバイス製造方法 |
| JP6501530B2 (ja) * | 2015-01-21 | 2019-04-17 | 株式会社ディスコ | レーザー加工装置 |
| WO2019044489A1 (ja) | 2017-08-28 | 2019-03-07 | キヤノン株式会社 | 駆動装置および撮像装置の制御方法 |
| JP7467821B2 (ja) * | 2020-02-06 | 2024-04-16 | 株式会社東京精密 | レーザ加工装置及び加工方法 |
| WO2023203614A1 (ja) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | レーザ加工装置、レーザ加工方法、レーザ加工プログラム、記録媒体、半導体チップ製造方法および半導体チップ |
| US20250285888A1 (en) * | 2022-04-18 | 2025-09-11 | Yamaha Hatsudoki Kabushiki Kaisha | Laser processing apparatus, laser processing method, laser processing program, recording medium, semiconductor chip manufacturing method and semiconductor chip |
| KR20240148877A (ko) * | 2022-04-18 | 2024-10-11 | 야마하하쓰도키 가부시키가이샤 | 레이저 가공 장치, 레이저 가공 방법, 레이저 가공 프로그램, 기록 매체, 반도체 칩 제조 방법, 및 반도체 칩 |
| KR102948780B1 (ko) * | 2022-04-18 | 2026-04-06 | 야마하하쓰도키 가부시키가이샤 | 레이저 가공 장치, 레이저 가공 방법, 레이저 가공 프로그램, 기록 매체, 반도체 칩 제조 방법, 및 반도체 칩 |
-
1998
- 1998-09-28 JP JP10290053A patent/JP2000106340A/ja not_active Withdrawn
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