JP2000106340A5 - - Google Patents
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- JP2000106340A5 JP2000106340A5 JP1998290053A JP29005398A JP2000106340A5 JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5 JP 1998290053 A JP1998290053 A JP 1998290053A JP 29005398 A JP29005398 A JP 29005398A JP 2000106340 A5 JP2000106340 A5 JP 2000106340A5
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- 239000000758 substrate Substances 0.000 description 248
- 238000000034 method Methods 0.000 description 56
- 230000001133 acceleration Effects 0.000 description 27
- 230000005484 gravity Effects 0.000 description 9
- 238000005192 partition Methods 0.000 description 6
- 230000001360 synchronised effect Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- JUJBNYBVVQSIOU-UHFFFAOYSA-M sodium;4-[2-(4-iodophenyl)-3-(4-nitrophenyl)tetrazol-2-ium-5-yl]benzene-1,3-disulfonate Chemical compound [Na+].C1=CC([N+](=O)[O-])=CC=C1N1[N+](C=2C=CC(I)=CC=2)=NC(C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)=N1 JUJBNYBVVQSIOU-UHFFFAOYSA-M 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000000803 paradoxical effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 1
Description
【特許請求の範囲】
【請求項１】 マスクと感応基板とを同期移動させることにより、前記感応基板上の複数のショット領域に前記マスクのパターンを順次転写する露光装置であって、
前記感応基板を保持して２次元平面内を移動する基板ステージと；
前記マスクを保持して移動可能なマスクステージと；
前記基板ステージの露光終了後の次ショット露光のための助走動作と次ショット露光のための非走査方向へのステッピング動作とが同時並行的に行われ、かつ前記非走査方向へのステッピング動作が次ショット露光前の前記両ステージの同期整定期間の前に終了するように、前記両ステージを制御するステージ制御系とを備えることを特徴とする露光装置。
【請求項２】 基板上の複数の区画領域にマスクのパターンを順次転写する走査露光方法において、
前記マスクと前記基板とを同期移動して、前記複数の区画領域の１つを走査露光し、
前記基板が同期移動される第１方向と直交する第２方向に関して前記１つの区画領域と隣接する別の区画領域を走査露光するために、前記１つの区画領域の走査露光終了後の前記基板の前記第２方向へのステッピング動作が終了する前に前記基板の前記第１方向への加速を開始することを特徴とする走査露光方法。
【請求項３】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とをそれぞれ前記マスクのパターンで走査露光する方法において、
前記第１区画領域の走査露光終了後に、前記基板の第１方向の移動速度が零となるまで、前記基板を減速させつつ前記第２方向に移動し、かつ前記第２区画領域の走査露光前に、前記基板を前記第１方向に加速させつつ前記第２方向に移動することを特徴とする走査露光方法。
【請求項４】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１区画領域と第２区画領域とにそれぞれ前記マスクのパターンを転写する走査露光方法において、
前記第１区画領域の走査露光後に、前記基板をその移動軌跡がほぼ放物線になるように移動した後、前記マスクのパターンで前記第２区画領域を走査露光することを特徴とする走査露光方法。
【請求項５】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１区画領域と第２区画領域とにそれぞれ前記マスクのパターンを転写する走査露光方法において、
前記第１区画領域の走査露光終了後の前記基板の減速中、及び前記第２区画領域の走査露光前の前記基板の加速中に、前記基板を前記第１及び第２方向と交差する方向に移動することを特徴とする走査露光方法。
【請求項６】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の走査露光終了後、前記基板の前記第２方向の位置が前記第２区画領域の前記第２方向の位置と一致する前に、前記第２区画領域の走査露光のための前記基板の加速を開始することを特徴とする走査露光方法。
【請求項７】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の走査露光終了後の前記基板の前記第２方向の速度成分が零となる前に、前記第２区画領域の走査露光のための前記基板の加速を開始することを特徴とする走査露光方法。
【請求項８】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の走査露光終了後に前記基板の前記第１方向の速度成分が零となる前記基板の前記第２方向の位置を、前記第２区画領域の前記第２方向の位置よりも前記第１区画領域側とし、かつ前記第２区画領域を走査露光するために、前記第１及び第２方向に対して斜めに前記基板を移動することを特徴とする走査露光方法。
【請求項９】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光とで前記基板を逆向きに移動するために、前記第１走査露光終了後に前記基板の前記第１方向の速度成分を零とし、かつ前記第２走査露光に先立って前記第１及び第２方向の各速度成分が零とならないように前記基板を加速することを特徴とする走査露光方法。
【請求項１０】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間、前記第１走査露光終了後の前記第１方向の速度成分が零となる前記基板の前記第２方向の位置が、前記第１区画領域の前記第２方向の位置と前記第２区画領域の前記第２方向の位置との間になるように前記基板を移動することを特徴とする走査露光方法。
【請求項１１】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間の前記基板の移動軌跡がほぼ放物線状となるように、前記第１走査露光後の前記基板の減速中、及び前記第２走査露光前の前記基板の加速中、前記第２方向の速度成分を零とすることなく前記基板を移動することを特徴とする走査露光方法。
【請求項１２】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間、前記第１走査露光終了後の前記基板の前記第１方向の速度成分が零となる前に、前記基板の前記第２方向への加速を開始し、かつ前記基板の前記第２方向の速度成分が零となる前に、前記基板の前記第１方向への加速を開始することを特徴とする走査露光方法。
【請求項１３】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１及び第２区画領域にそれぞれ前記マスクのパターンを転写する走査露光方法において、
前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間で前記基板を前記第２方向に移動するときに、前記基板の加速時と減速時とでその加速度の絶対値を異ならせることを特徴とする走査露光方法。
【請求項１４】 基板上の区画領域毎にマスクと前記基板とを同期移動して、前記基板上の複数の区画領域に前記マスクのパターンを順次転写するステップ・アンド・スキャン方式の走査露光方法において、
前記マスクの往復移動によって前記マスクのパターンが転写される前記基板上の２つの区画領域の走査露光間で前記基板を停止することなく移動することを特徴とする走査露光方法。
【請求項１５】 マスクと基板とを同期移動して、前記基板が同期移動される第１方向に直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、
少なくとも前記第１区画領域に対する走査露光に際して、前記マスク及び前記基板の少なくとも一方を、前記マスクと前記基板との同期移動に先立ってその加速度が徐々に零に収束するような加速度変化曲線に基づいて前記第１方向に沿って加速するとともに、前記同期移動の終了後に一定減速度で前記第１方向に沿って減速することを特徴とする走査露光方法。
【請求項１６】 定盤と；
前記定盤に対して相対移動が可能であるとともに基板をそれぞれ保持する少なくとも２つの第１可動体と；
前記各第１可動体がその上部に配置されるとともに、前記定盤上に配置され、かつ前記定盤及び前記各第１可動体のそれぞれに対して相対移動する第２可動体と；
前記第２可動体に設けられ、前記各第１可動体を２次元平面内で駆動する駆動装置とを備え、
前記各第１可動体の駆動の際の反力に応じて前記第２可動体が移動するように構成されていることを特徴とするステージ装置。
【請求項１７】 前記各第１可動体の質量は前記第２可動体の質量のほぼ１／９以下であり、
前記定盤上で前記第２可動体を低応答周波数で駆動する第２の駆動装置を更に備えることを特徴とする請求項１６に記載のステージ装置。
【請求項１８】 マスクのパターンを基板上に転写する露光装置であって、
請求項１６又は１７に記載のステージ装置を備え、
前記マスクのパターンが転写される基板が前記ステージ装置を構成する前記各第１可動体に保持されることを特徴とする露光装置。
【請求項１９】 前記マスクのパターンを前記基板に投影する投影光学系を更に備え、
前記ステージ装置を構成する前記駆動装置が、前記各第１可動体にそれぞれ保持された基板に前記マスクのパターンを転写する際に、そのパターン転写の対象の基板を保持する前記第１可動体を前記マスクと同期して前記投影光学系に対して走査方向に駆動することを特徴とする請求項１８に記載の露光装置。
【請求項２０】 基板上で隣接して配置される第１及び第２区画領域のそれぞれにマスクのパターンを転写する露光装置であって、
前記基板を保持する基板ステージと；
前記第１区画領域に対する第１露光と前記第２区画領域に対する第２露光との間で前記基板ステージを移動するときに、前記基板ステージの加速時と減速時とでその加速度の絶対値を異ならせる第１駆動装置とを備える露光装置。
【請求項２１】 マスクのパターンを基板上に転写する露光装置であって、
第１定盤と；
前記第１定盤上にそれぞれ配置され前記基板をそれぞれ保持する複数の基板ステージと；
前記第１定盤が配置される第２定盤と；
前記複数の基板ステージの少なくとも１つの移動による重心位置変動を抑制するように、前記第２定盤に対して前記第１定盤を相対移動可能に支持する支持装置とを備える露光装置。
【請求項２２】 少なくとも１つが物体を保持するように構成された複数の第１可動体と；
前記各第１可動体の移動によって生じる反力に応じて移動する第２可動体とを備え、
前記各第１可動体の質量は、前記第２可動体の質量のほぼ１／９以下であることを特徴とするステージ装置。
【請求項２３】 前記各第１可動体と前記第２可動体は、それぞれ非接触で支持されていることを特徴とする請求項２２に記載のステージ装置。
【請求項２４】 前記各第１可動体は、前記第２可動体に対して２次元平面内で移動可能であることを特徴とする請求項２２又は２３に記載のステージ装置。
【請求項２５】 基板上にパターンを形成するための露光装置であって、
請求項２２〜２４のいずれか一項に記載のステージ装置を備えることを特徴とする露光装置。
【請求項２６】 請求項２５に記載の露光装置であって、
所定のパターンが形成されたマスクを保持するマスクステージと；
前記パターンを投影する投影光学系とを備え、
前記複数の第１可動体の少なくとも１つは前記基板を保持し、該基板を保持した第１可動体と前記マスクステージとによって前記マスクと前記基板とを同期移動させて前記パターンを前記基板上に転写することを特徴とする露光装置。
【請求項２７】 ２次元平面内を移動する少なくとも２つの可動体と；
前記各可動体に設けられ、前記２次元平面内で所定の第１軸及びこれに直交する第２軸の双方と交差する方向に沿って延びる第１反射面と；
前記第１反射面に垂直に測長ビームを照射してその反射光を受光することにより前記各可動体の第３軸方向の位置を計測する計測装置と；
前記計測装置の計測値に基づいて前記各可動体の前記第１軸及び前記第２軸で規定される直交座標系上の位置座標を求める演算装置と；を備えることを特徴とするステージ装置。
[Claims]
1. An exposure apparatus for sequentially transferring a pattern of the mask to a plurality of shot regions on the sensitive substrate by synchronously moving the mask and the sensitive substrate.
With a substrate stage that holds the sensitive substrate and moves in a two-dimensional plane;
With a mask stage that can hold and move the mask;
After the exposure of the substrate stage is completed, the approaching operation for the next shot exposure and the stepping operation in the non-scanning direction for the next shot exposure are performed in parallel, and the stepping operation in the non-scanning direction is next. An exposure apparatus comprising: a stage control system for controlling both stages so that the exposure is completed before the synchronous adjustment period of both stages before shot exposure.
2. In a scanning exposure method in which a mask pattern is sequentially transferred to a plurality of compartmental areas on a substrate.
The mask and the substrate are synchronously moved to scan and expose one of the plurality of compartmentalized areas.
In order to scan and expose another compartment region adjacent to the one compartment region in a second direction orthogonal to the first direction in which the substrate is synchronously moved, the substrate of the substrate after the scan exposure of the one compartment region is completed. A scanning exposure method characterized in that acceleration of the substrate in the first direction is started before the stepping operation in the second direction is completed.
3. A first compartment region and a second compartment on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the method of scanning and exposing each region with the pattern of the mask,
After the scanning exposure of the first compartment region is completed, the substrate is moved in the second direction while decelerating until the moving speed of the substrate in the first direction becomes zero, and before the scanning exposure of the second compartment region. In addition, a scanning exposure method characterized in that the substrate is moved in the second direction while accelerating in the first direction.
4. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged in a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is transferred to each of the masks.
A scanning exposure method, characterized in that, after scanning exposure of the first compartment region, the substrate is moved so that its movement locus is substantially parabolic, and then the second compartment region is scanned and exposed with the pattern of the mask.
5. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged in a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is transferred to each of the masks.
In the direction in which the substrate intersects the first and second directions during deceleration of the substrate after the completion of scanning exposure of the first compartment region and during acceleration of the substrate before scanning exposure of the second compartment region. A scanning exposure method characterized by moving.
6. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
For scanning exposure of the second compartment region after the scan exposure of the first compartment region is completed and before the position of the substrate in the second direction coincides with the position of the second compartment region in the second direction. A scanning exposure method comprising accelerating the substrate.
7. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
It is characterized in that acceleration of the substrate for scanning exposure of the second compartment region is started before the velocity component of the substrate in the second direction becomes zero after the scanning exposure of the first compartment region is completed. Scanning exposure method.
8. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
The position of the substrate in the second direction in which the velocity component of the substrate in the first direction becomes zero after the scanning exposure of the first compartment region is completed is set to be higher than the position of the second compartment region in the second direction. A scanning exposure method characterized in that the substrate is moved obliquely with respect to the first and second directions in order to scan and expose the second compartment region on the side of the first compartment region.
9. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
In order to move the substrate in opposite directions in the first scan exposure of the first compartment region and the second scan exposure of the second compartment region, the speed of the substrate in the first direction after the completion of the first scan exposure. A scanning exposure method characterized in that the components are set to zero and the substrate is accelerated so that the velocity components in the first and second directions do not become zero prior to the second scanning exposure.
10. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
Between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region, the second scan of the substrate in which the velocity component in the first direction after the completion of the first scan exposure becomes zero. A scanning exposure method characterized in that the substrate is moved so that the position in the direction is between the position in the second direction of the first compartment region and the position in the second direction of the second compartment region. ..
11. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
Deceleration of the substrate after the first scan exposure so that the movement locus of the substrate between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region is substantially paradoxical. A scanning exposure method characterized in that the substrate is moved in the middle and during acceleration of the substrate before the second scanning exposure without setting the velocity component in the second direction to zero.
12. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
Between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region, before the velocity component in the first direction of the substrate after the completion of the first scan exposure becomes zero. It is characterized in that the acceleration of the substrate in the second direction is started, and the acceleration of the substrate in the first direction is started before the velocity component of the substrate in the second direction becomes zero. Scanning exposure method.
13. The mask and the substrate are synchronously moved, and the first and second compartment regions on the substrate are arranged in a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method for transferring the mask pattern,
When the substrate is moved in the second direction between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region, the acceleration of the substrate during acceleration and deceleration. A scanning exposure method characterized in that the absolute values of are different.
14. A step-and-scan scanning exposure method in which a mask and the substrate are synchronously moved for each partition region on a substrate, and a pattern of the mask is sequentially transferred to a plurality of compartment regions on the substrate. In
A scanning exposure method characterized in that the substrate is moved without stopping between scanning exposures of two compartment regions on the substrate to which the pattern of the mask is transferred by the reciprocating movement of the mask.
15. A first compartment region and a second compartment region on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred.
Based on an acceleration change curve such that the acceleration of at least one of the mask and the substrate gradually converges to zero prior to the synchronous movement of the mask and the substrate during scanning exposure to at least the first compartment region. A scanning exposure method characterized by accelerating along the first direction and decelerating along the first direction at a constant deceleration after the end of the synchronous movement.
16. With a surface plate;
With at least two first movable bodies that can move relative to the surface plate and hold the substrate respectively;
Each of the first movable bodies is arranged on the surface plate thereof, and a second movable body that is arranged on the surface plate and moves relative to each of the surface plate and each of the first movable bodies;
A drive device provided on the second movable body and driving each of the first movable bodies in a two-dimensional plane is provided.
A stage device characterized in that the second movable body is configured to move according to a reaction force when each of the first movable bodies is driven.
17. The mass of each of the first movable bodies is approximately 1/9 or less of the mass of the second movable body.
A claim, further comprising a second driving device for driving the second movable body on the surface plate at a low response frequency.16The stage device described in.
18. An exposure apparatus that transfers a mask pattern onto a substrate.
Claim16 or 17Equipped with the stage equipment described in
An exposure apparatus characterized in that a substrate on which the mask pattern is transferred is held by each of the first movable bodies constituting the stage apparatus.
19. A projection optical system for projecting the mask pattern onto the substrate is further provided.
When the driving device constituting the stage device transfers the pattern of the mask to the substrate held by each of the first movable bodies, the first movable body holding the substrate to be transferred with the pattern is transferred. A claim characterized in that the mask is driven in the scanning direction with respect to the projection optical system in synchronization with the mask.18The exposure apparatus according to.
20. An exposure apparatus that transfers a mask pattern to each of the first and second compartment regions arranged adjacent to each other on a substrate.
With a substrate stage that holds the substrate;
When moving the substrate stage between the first exposure to the first compartment region and the second exposure to the second compartment region, if the absolute value of the acceleration differs between the acceleration and deceleration of the substrate stage. An exposure device including a first drive device to be used.
21. An exposure apparatus that transfers a mask pattern onto a substrate.
With the first surface plate;
With a plurality of substrate stages each arranged on the first surface plate and holding each of the substrates;
With the second surface plate on which the first surface plate is arranged;
An exposure apparatus including a support device that movably supports the first surface plate with respect to the second surface plate so as to suppress a change in the position of the center of gravity due to the movement of at least one of the plurality of substrate stages.
22. With a plurality of first movable bodies configured such that at least one holds an object;
A second movable body that moves according to a reaction force generated by the movement of each of the first movable bodies is provided.
A stage device characterized in that the mass of each of the first movable bodies is approximately 1/9 or less of the mass of the second movable body.
23. The stage device according to claim 22, wherein each of the first movable body and the second movable body are supported in a non-contact manner.
24. The stage device according to claim 22 or 23, wherein each of the first movable bodies is movable with respect to the second movable body in a two-dimensional plane.
25. An exposure device for forming a pattern on a substrate.
An exposure apparatus comprising the stage apparatus according to any one of claims 22 to 24.
26. The exposure apparatus according to claim 25.
With a mask stage that holds a mask with a given pattern formed;
It is equipped with a projection optical system that projects the pattern.
At least one of the plurality of first movable bodies holds the substrate, and the mask and the substrate are synchronously moved by the first movable body holding the substrate and the mask stage to move the pattern on the substrate. An exposure apparatus characterized by transferring to.
27. With at least two moving objects moving in a two-dimensional plane;
A first reflective surface provided on each movable body and extending along a direction intersecting both a predetermined first axis and a second axis orthogonal to the predetermined first axis in the two-dimensional plane;
With a measuring device that measures the position of each movable body in the third axial direction by irradiating the length measuring beam perpendicularly to the first reflecting surface and receiving the reflected light;
A stage device including: an arithmetic device that obtains position coordinates on a Cartesian coordinate system defined by the first axis and the second axis of each movable body based on the measured values of the measuring device.
【００１３】
【課題を解決するための手段】
本発明は、第１の観点からすると、マスク（Ｒ）と感応基板（Ｗ）とを同期移動させることにより、前記感応基板（Ｗ）上の複数のショット領域（Ｓ１、Ｓ２等）に前記マスクのパターンを順次転写する露光装置であって、前記感応基板（Ｗ）を保持して２次元平面内を移動する基板ステージ（ＷＳＴ）と；前記マスクを保持して移動可能なマスクステージ（ＲＳＴ）と；前記基板ステージの露光終了後の次ショット露光のための助走動作と次ショット露光のための非走査方向へのステッピング動作とが同時並行的に行われ、かつ前記非走査方向へのステッピング動作が次ショット露光前の前記両ステージの同期整定期間の前に終了するように、前記両ステージを制御するステージ制御系（３３、７８、８０）とを備えることを特徴とする第１の露光装置である。
0013
[Means for solving problems]
From the first viewpoint, the present invention moves the mask (R) and the sensitive substrate (W) synchronously to cover a plurality of shot regions (S1, S2, etc.) on the sensitive substrate (W). A substrate stage (WST) that holds the sensitive substrate (W) and moves in a two-dimensional plane; and a mask stage (RST) that holds the mask and can move. And; the approaching operation for the next shot exposure after the exposure of the substrate stage and the stepping operation in the non-scanning direction for the next shot exposure are performed in parallel, and the stepping operation in the non-scanning direction is performed. so it ends before the synchronous settling periodically of the both stages before the next shot exposure, the first exposure, wherein Rukoto a said stage control system for controlling both stages (33,78,80) It is a device .
本発明は、第２の観点からすると、基板（Ｗ）上の複数の区画領域（Ｓ１、Ｓ２）にマスク（Ｒ）のパターンを順次転写する走査露光方法において、前記マスクと前記基板とを同期移動して、前記複数の区画領域の１つ（Ｓ１）を走査露光し、前記基板が同期移動される第１方向と直交する第２方向に関して前記１つの区画領域と隣接する別の区画領域（Ｓ２）を走査露光するために、前記１つの区画領域（Ｓ１）の走査露光終了後の前記基板の前記第２方向へのステッピング動作が終了する前に前記基板の前記第１方向への加速を開始することを特徴とする第１の走査露光方法である。 From the second viewpoint, the present invention synchronizes the mask with the substrate in a scanning exposure method in which the pattern of the mask (R) is sequentially transferred to a plurality of compartment regions (S1, S2) on the substrate (W). It moves to scan and expose one of the plurality of compartments (S1), and another compartment (S1) adjacent to the one compartment in a second direction orthogonal to the first direction in which the substrate is synchronously moved. In order to scan-expose S2), the substrate is accelerated in the first direction after the scanning exposure of the one compartment area (S1) is completed and before the stepping operation of the substrate in the second direction is completed. It is a first scanning exposure method characterized by starting.
本発明は、第３の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とをそれぞれ前記マスクのパターンで走査露光する方法において、前記第１区画領域の走査露光終了後に、前記基板の第１方向の移動速度が零となるまで、前記基板を減速させつつ前記第２方向に移動し、かつ前記第２区画領域の走査露光前に、前記基板を前記第１方向に加速させつつ前記第２方向に移動することを特徴とする第２の走査露光方法である。これによれば、前記第１区画領域の走査露光終了後に、基板は放物線状の経路に沿って移動されるので、最短距離に近い経路で基板が移動され、その分スループットの向上が可能となる。 From the third viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and is arranged along a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the method of scanning and exposing the first compartment region (S1) and the second compartment region (S2) on the substrate with the pattern of the mask, respectively, after the scanning exposure of the first compartment region is completed, the first direction of the substrate. The substrate is decelerated and moved in the second direction until the moving speed of the substrate becomes zero, and the substrate is accelerated in the first direction before the scanning exposure of the second compartment region. It is a second scanning exposure method characterized by moving to. According to this, the following scanning exposure is completed in the first divided area, since the substrate is moved along a parabolic line-shaped path, the substrate is moved in a path close to the shortest distance, it can be improved by that amount throughput It becomes.
本発明は、第４の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板（Ｗ）が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とにそれぞれ前記マスクのパターンを転写する走査露光方法において、前記第１区画領域（Ｓ１）の走査露光後に、前記基板をその移動軌跡がほぼ放物線状になるように移動した後、前記マスクのパターンで前記第２区画領域（Ｓ２）を走査露光することを特徴とする第３の走査露光方法である。これによれば、第１区画領域の走査露光後、第２区画領域の走査露光の開始前に、基板をその移動軌跡がほぼ放物線状になるように移動するので、この移動の終了部分では基板はほぼ第１方向に沿って移動され、走査露光開始後に基板の非走査方向の速度成分が走査露光に影響を与えることがない。 From the fourth viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and is arranged in the second direction substantially orthogonal to the first direction in which the substrate (W) is synchronously moved. In the scanning exposure method in which the pattern of the mask is transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, respectively, after the scanning exposure of the first compartment region (S1), the substrate is used. This is a third scanning exposure method, characterized in that the second compartment region (S2) is scanned and exposed with the pattern of the mask after the movement locus is moved so as to have a substantially parabolic shape. According to this, after the scanning exposure of the first compartment region and before the start of the scanning exposure of the second compartment region, the substrate is moved so that its movement locus is substantially paradoxical. Therefore, at the end portion of this movement, the substrate is moved. Is moved substantially along the first direction, and the velocity component in the non-scanning direction of the substrate does not affect the scanning exposure after the start of scanning exposure.
本発明は、第５の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とにそれぞれ前記マスクのパターンを転写する走査露光方法において、前記第１区画領域（Ｓ１）の走査露光終了後の前記基板の減速中、及び前記第２区画領域の走査露光前の前記基板の加速中に、前記基板を前記第１及び第２方向と交差する方向に移動することを特徴とする第４の走査露光方法である。これによれば、第１区画領域の走査露光終了後の基板の減速中、及び第２区画領域の走査露光前の基板の加速中に、基板を第１及び第２方向と交差する方向に移動するので、結果的に基板の移動軌跡は従来のコ字経路に比べて短くなり、最短距離に近い経路で基板が移動され、その分スループットの向上が可能となる。 From the fifth viewpoint, the present invention is the substrate in which the mask (R) and the substrate (W) are synchronously moved and arranged in a second direction substantially orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is transferred to the first compartment region (S1) and the second compartment region (S2), respectively, the deceleration of the substrate after the scanning exposure of the first compartment region (S1) is completed. A fourth scanning exposure method, characterized in that the substrate is moved in a direction intersecting the first and second directions during acceleration of the substrate in the middle and before scanning exposure of the second compartment region. .. According to this, the substrate is moved in the direction intersecting the first and second directions during the deceleration of the substrate after the scanning exposure of the first compartment region and the acceleration of the substrate before the scanning exposure of the second compartment region. As a result, the movement locus of the substrate is shorter than that of the conventional U-shaped path, and the substrate is moved by the route close to the shortest distance, so that the throughput can be improved accordingly.
本発明は、第６の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板（Ｗ）が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の走査露光終了後、前記基板の前記第２方向の位置が前記第２区画領域（Ｓ２）の前記第２方向の位置と一致する前に、前記第２区画領域の走査露光のための前記基板の加速を開始することを特徴とする第５の走査露光方法である。これによれば、第１区画領域の走査露光の終了後、第２区画領域の走査露光のため第２方向についての基板の移動が開始されるが、この途中で第２区画領域の走査露光のための基板の第１方向についての基板の加速が開始されるので、第２区画領域の走査露光のための第２方向の基板の移動が終了してから第２区画領域の走査露光のための加速が開始される場合に比べてスループットを向上させることが可能である。 From the sixth viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and arranges the substrate (W) along a second direction orthogonal to the first direction in which the substrate (W) is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, after the scanning exposure of the first compartment region (S1) is completed, Starting the acceleration of the substrate for scanning exposure of the second compartment region before the position of the substrate in the second direction coincides with the position of the second compartment region (S2) in the second direction. This is a fifth scanning exposure method, characterized by the above. According to this, after the scanning exposure of the first compartment region is completed, the movement of the substrate in the second direction is started for the scanning exposure of the second compartment region, and the scanning exposure of the second compartment region is started in the middle of this. Since the acceleration of the substrate in the first direction of the substrate is started, the movement of the substrate in the second direction for the scan exposure of the second compartment region is completed and then the scan exposure of the second compartment region is completed. It is possible to improve the throughput as compared with the case where the acceleration is started.
本発明は、第７の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の走査露光終了後の前記基板（Ｗ）の前記第２方向の速度成分が零となる前に、前記第２区画領域の走査露光のための前記基板の加速を開始することを特徴とする第６の走査露光方法である。これによれば、第１区画領域の走査露光の終了後、第２区画領域へ向けて第２方向についての基板の移動が行われるが、この移動が終了して基板の第２方向の速度成分が零となる前に、第２区画領域の走査露光のための基板の加速が開始されるので、第２区画領域の走査露光のための第２方向の基板の移動が終了してから第２区画領域の走査露光のための加速が開始される場合に比べてスループットを向上させることが可能である。 From the seventh viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrates are arranged along a second direction orthogonal to the first direction in which the substrates are synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, the substrate (S1) after the scanning exposure of the first compartment region (S1) is completed. The sixth scanning exposure method is characterized in that acceleration of the substrate for scanning exposure of the second compartment region is started before the velocity component in the second direction of W) becomes zero. According to this, after the scanning exposure of the first compartment region is completed, the substrate is moved toward the second compartment region in the second direction, but this movement is completed and the velocity component of the substrate in the second direction is completed. Since the acceleration of the substrate for the scan exposure of the second compartment region is started before becomes zero, the second is after the movement of the substrate in the second direction for the scan exposure of the second compartment region is completed. It is possible to improve the throughput as compared to the case where acceleration for scanning exposure of the compartment area is initiated.
本発明は、第８の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の走査露光終了後に前記基板の前記第１方向の速度成分が零となる前記基板の前記第２方向の位置を、前記第２区画領域の前記第２方向の位置よりも前記第１区画領域側とし、かつ前記第２区画領域を走査露光するために、前記第１及び第２方向に対して斜めに前記基板を移動することを特徴とする第７の走査露光方法である。これによれば、前記第１区画領域の走査露光終了後の基板の移動軌跡は従来のコ字経路に比べて短くなり、最短距離に近い経路で基板が移動され、その分スループットの向上が可能となる。なお、この場合、基板の移動軌跡はＶ字状であっても良いが、第１区画領域の走査露光と第２区画領域の走査露光との間で基板を停止することなく移動して、その軌跡を放物線状（又はＵ字状）とすることが望ましい。 From the eighth point of view, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrates are arranged along a second direction orthogonal to the first direction in which the substrates are synchronously moved. In a scanning exposure method in which a pattern of the mask is sequentially transferred to a first compartment region (S1) and a second compartment region (S2) on a substrate, the substrate is said to have been subjected to scanning exposure of the first compartment region (S1). The position of the substrate in the second direction in which the velocity component in the first direction is zero is set to the side of the first compartment region with respect to the position of the second compartment region in the second direction, and the second compartment region is defined as the second compartment region. This is a seventh scanning exposure method, characterized in that the substrate is moved obliquely with respect to the first and second directions in order to perform scanning exposure. According to this, the movement locus of the substrate after the scanning exposure of the first section region is completed is shorter than that of the conventional U-shaped path, the substrate is moved by the path close to the shortest distance, and the throughput can be improved accordingly. It becomes. In this case, the movement locus of the substrate may be V-shaped, but the substrate is moved between the scanning exposure of the first compartment region and the scanning exposure of the second compartment region without stopping, and the substrate is moved. It is desirable that the locus be parabolic (or U-shaped).
本発明は、第９の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の第１走査露光と前記第２区画領域（Ｓ２）の第２走査露光とで前記基板を逆向きに移動するために、前記第１走査露光終了後に前記基板の前記第１方向の速度成分を零とし、かつ前記第２走査露光に先立って前記第１及び第２方向の各速度成分が零とならないように前記基板を加速することを特徴とする第８の走査露光方法である。これによれば、基板は第２走査露光に先立って曲線状（又は直線状）の経路に沿って第１及び第２方向に対し斜めに移動されることとなる。 From the ninth viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrate is arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, the first scanning exposure of the first compartment region (S1) and the second scanning exposure. In order to move the substrate in the opposite direction in the second scanning exposure of the partition region (S2), the velocity component of the substrate in the first direction is set to zero after the completion of the first scanning exposure, and the second scanning exposure is performed. This is an eighth scanning exposure method, characterized in that the substrate is accelerated so that the velocity components in the first and second directions do not become zero prior to the above. According to this, the substrate is moved obliquely with respect to the first and second directions along a curved (or linear) path prior to the second scanning exposure.
本発明は、第１０の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の第１走査露光と前記第２区画領域（Ｓ２）の第２走査露光との間、前記第１走査露光終了後の前記第１方向の速度成分が零となる前記基板の前記第２方向の位置が、前記第１区画領域の前記第２方向の位置と前記第２区画領域の前記第２方向の位置との間になるように前記基板を移動することを特徴とする第９の走査露光方法である。これによれば、第１走査露光が終了すると、基板の第１方向の速度を減速しつつ第２方向への移動が行われ、この際、基板の第１方向の速度成分が零となる基板の第２方向の位置が、第１区画領域の第２方向の位置と第２区画領域の第２方向の位置との間になるように基板が移動される。従って、第１走査露光が終了すると、基板は曲線状（又は直線状）の経路に沿って第１及び第２方向に対し斜めに移動されることとなる。 From the tenth point of view, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrates are arranged along a second direction orthogonal to the first direction in which the substrates are synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, the first scanning exposure of the first compartment region (S1) and the second scan exposure. The position of the substrate in the second direction in which the velocity component in the first direction becomes zero after the end of the first scan exposure during the second scan exposure of the compartment region (S2) is the position of the first compartment region. The ninth scanning exposure method is characterized in that the substrate is moved so as to be between the position in the second direction and the position in the second direction of the second compartment region. According to this, when the first scanning exposure is completed, the substrate is moved in the second direction while decelerating the speed in the first direction of the substrate, and at this time, the velocity component in the first direction of the substrate becomes zero. The substrate is moved so that the position in the second direction of is between the position in the second direction of the first compartment region and the position in the second direction of the second compartment region. Therefore, when the first scanning exposure is completed, the substrate is moved obliquely with respect to the first and second directions along the curved (or linear) path.
本発明は、第１１の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の第１走査露光と前記第２区画領域（Ｓ２）の第２走査露光との間の前記基板の移動軌跡がほぼ放物線状となるように、前記第１走査露光後の前記基板の減速中、及び前記第２走査露光前の前記基板の加速中、前記第２方向の速度成分を零とすることなく前記基板を移動することを特徴とする第１０の走査露光方法である。これによれば、第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間の基板の移動軌跡がほぼ放物線状となり、しかも第２方向の速度成分を零とすることなく基板が移動されるので、基板が停止することがなく、オーバースキャン、ステッピング、及びプリスキャンの総所要時間（ショット間での基板の移動時間）はほぼ最短となる。 From the eleventh viewpoint, the present invention synchronizes the mask (R) and the substrate (W) and arranges the substrates along a second direction orthogonal to the first direction in which the substrates are synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, the first scanning exposure of the first compartment region (S1) and the second scan exposure. The substrate is decelerating after the first scan exposure and before the second scan exposure so that the movement locus of the substrate between the partition region (S2) and the second scan exposure is substantially linear. The tenth scanning exposure method is characterized in that the substrate is moved without setting the velocity component in the second direction to zero while the substrate is accelerating. According to this, the movement locus of the substrate between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region is substantially parabolic, and the velocity component in the second direction is zero. Since the substrate is moved without stopping, the substrate does not stop, and the total time required for overscan, stepping, and prescan (the time to move the substrate between shots) is almost the shortest.
本発明は、第１２の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向と直交する第２方向に沿って配列される前記基板上の第１区画領域（Ｓ１）と第２区画領域（Ｓ２）とに前記マスクのパターンを順次転写する走査露光方法において、前記第１区画領域（Ｓ１）の第１走査露光と前記第２区画領域（Ｓ２）の第２走査露光との間、前記第１走査露光終了後の前記基板の前記第１方向の速度成分が零となる前に、前記基板の前記第２方向への加速を開始し、かつ前記基板の前記第２方向の速度成分が零となる前に、前記基板の前記第１方向への加速を開始することを特徴とする第１１の走査露光方法である。これによれば、第１区画領域の第１走査露光と第２区画領域の第２走査露光との間の基板の移動軌跡は、Ｕ字状あるいはそれに近い経路となる。 From the twelfth viewpoint, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrate is arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In the scanning exposure method in which the pattern of the mask is sequentially transferred to the first compartment region (S1) and the second compartment region (S2) on the substrate, the first scanning exposure of the first compartment region (S1) and the second scanning exposure. During the second scan exposure of the partition region (S2), the substrate is accelerated in the second direction after the first scan exposure is completed before the velocity component of the substrate in the first direction becomes zero. The eleventh scanning exposure method is characterized in that the acceleration of the substrate in the first direction is started before the velocity component of the substrate becomes zero in the second direction. According to this, the movement locus of the substrate between the first scan exposure of the first compartment region and the second scan exposure of the second compartment region is a U-shape or a path close thereto.
本発明は、第１３の観点からすると、マスク（Ｒ）と基板（Ｗ）とを同期移動して、前記基板が同期移動される第１方向とほぼ直交する第２方向に配列される前記基板上の第１及び第２区画領域（Ｓ１及びＳ２）にそれぞれ前記マスクのパターンを転写する走査露光方法において、前記第１区画領域の第１走査露光と前記第２区画領域の第２走査露光との間で前記基板を前記第２方向に移動するときに、前記基板の加速時と減速時とでその加速度の絶対値を異ならせることを特徴とする第１２の走査露光方法である。 From the thirteenth point of view, the present invention moves the mask (R) and the substrate (W) synchronously, and the substrates are arranged in a second direction substantially orthogonal to the first direction in which the substrates are synchronously moved. In the scanning exposure method of transferring the pattern of the mask to the first and second compartment regions (S1 and S2), respectively, the first scanning exposure of the first compartment region and the second scanning exposure of the second compartment region The twelfth scanning exposure method is characterized in that when the substrate is moved in the second direction between the two, the absolute value of the acceleration is made different between when the substrate is accelerated and when the substrate is decelerated.
本発明は、第１４の観点からすると、基板（Ｗ）上の区画領域毎にマスク（Ｒ）と前記基板とを同期移動して、前記基板上の複数の区画領域（Ｓ１、Ｓ２、Ｓ３、……）に前記マスクのパターンを順次転写するステップ・アンド・スキャン方式の走査露光方法において、前記マスクの往復移動によって前記マスクのパターンが転写される前記基板上の２つの区画領域の走査露光間で前記基板を停止することなく移動することを特徴とする第１３の走査露光方法である。これによれば、基板上の順次マスクのパターンが転写される２つの区画領域（通常は隣接領域）の走査露光間で基板が停止することがないので、その部分に関してはよりスループットが向上する。 From the 14th viewpoint, the present invention synchronously moves the mask (R) and the substrate for each partition region on the substrate (W), and a plurality of compartment regions (S1, S2, S3, S1) on the substrate. In a step-and-scan scanning exposure method in which the mask pattern is sequentially transferred to (...), between the scanning exposures of the two compartment regions on the substrate to which the mask pattern is transferred by the reciprocating movement of the mask. This is a thirteenth scanning exposure method, characterized in that the substrate is moved without stopping. According to this, since the substrate does not stop between the scan exposures of the two partition regions (usually adjacent regions) to which the pattern of the mask is sequentially transferred on the substrate, the throughput is further improved for that portion.
本発明は、第１５の観点からすると、マスクと基板とを同期移動して、前記基板が同期移動される第１方向に直交する第２方向に沿って配列される前記基板上の第１区画領域と第２区画領域とに前記マスクのパターンを順次転写する走査露光方法において、少なくとも前記第１区画領域に対する走査露光に際して、前記マスク及び前記基板の少なくとも一方を、前記マスクと前記基板との同期移動に先立ってその加速度が徐々に零に収束するような加速度変化曲線に基づいて前記第１方向に沿って加速するとともに、前記同期移動の終了後に一定減速度で前記第１方向に沿って減速することを特徴とする第１４の走査露光方法である。 From the fifteenth point of view, the present invention is a first compartment on the substrate in which the mask and the substrate are synchronously moved and arranged along a second direction orthogonal to the first direction in which the substrate is synchronously moved. In a scanning exposure method in which a pattern of the mask is sequentially transferred to a region and a second compartment region, at least one of the mask and the substrate is synchronized with the mask and the substrate during scanning exposure to the first compartment region. Accelerates along the first direction based on an acceleration change curve such that the acceleration gradually converges to zero prior to the movement, and decelerates along the first direction at a constant deceleration after the end of the synchronous movement. It is a fourteenth scanning exposure method characterized by the above.
本発明は、第１６の観点からすると、定盤（２２）と；前記定盤に対して相対移動が可能であるとともに基板（Ｗ１、Ｗ２）をそれぞれ保持する少なくとも２つの第１可動体（ＷＳＴ１、ＷＳＴ２）と；前記各第１可動体がその上部に配置されるとともに、前記定盤上に配置され、かつ前記定盤及び前記各第１可動体のそれぞれに対して相対移動する第２可動体（１３８）と；前記第２可動体に設けられ、前記各第１可動体を２次元平面内で駆動する駆動装置（４２ａ、４２ｂ）とを備え、前記各第１可動体の駆動の際の反力に応じて前記第２可動体が移動するように構成されていることを特徴とする第１のステージ装置である。 From the 16th viewpoint, the present invention has a surface plate (22); at least two first movable bodies (WST1) capable of moving relative to the surface plate and holding substrates (W1, W2), respectively. , WST2); The second movable body is arranged above the first movable body, is placed on the surface plate, and moves relative to each of the surface plate and each of the first movable bodies. A body (138); a drive device (42a, 42b) provided on the second movable body and driving each of the first movable bodies in a two-dimensional plane, and when driving each of the first movable bodies It is a first stage device characterized in that the second movable body is configured to move according to the reaction force of the above.
この場合において、前記各第１可動体（ＷＳＴ１、ＷＳＴ２）の質量は前記第２可動体（１３８）の質量のほぼ１／９以下であり、前記定盤（２２）上で前記第２可動体を低応答周波数で駆動する第２の駆動装置（４４）を更に備えていても良い。かかる場合には、上記の如く、ステージ装置の重心を所定位置に保持することができるのに加え、例えば、いずれかの第１可動体が移動した場合、その反力により逆方向に第２可動体が移動する距離を１／１０以下にすることができる。また、第２可動体は第１可動体の加減速時の反力に対しては応答できない程度の低い応答周波数で第２の駆動装置によって定盤上で駆動されるので、前記各第１可動体の動きに影響を与えることなく、第２可動体を駆動することが可能になる。 In this case, the mass of the pre-Symbol each first movable member (WST1, WST2) is from approximately 1/9 or less of the mass of the second movable member (138), said second movable by said upper polishing plate (22) A second drive device (44) that drives the body at a low response frequency may be further provided. In such a case, in addition to being able to hold the center of gravity of the stage device at a predetermined position as described above, for example, when any of the first movable bodies moves, the reaction force causes the second movable body to move in the opposite direction. The distance the body moves can be reduced to 1/10 or less. Further, since the second movable body is driven on the surface plate by the second driving device at a low response frequency that cannot respond to the reaction force during acceleration / deceleration of the first movable body, each of the first movable bodies is described above. It becomes possible to drive the second movable body without affecting the movement of the body.
本発明は、第１７の観点からすると、マスクのパターンを基板上に転写する露光装置であって、本発明の第１のステージ装置を備え、前記マスクのパターンが転写される基板が前記ステージ装置を構成する前記各第１可動体に保持されることを特徴とする第２の露光装置である。 From the viewpoint of the seventeenth aspect, the present invention is an exposure apparatus for transferring a mask pattern onto a substrate , the first stage apparatus of the present invention is provided, and the substrate on which the mask pattern is transferred is the stage apparatus. It is a second exposure apparatus characterized in that it is held by each of the first movable bodies constituting the above.
この場合において、前記マスクのパターンを前記基板に投影する投影光学系を更に備える場合には、前記ステージ装置を構成する前記駆動装置が、前記各第１可動体にそれぞれ保持された基板に前記マスクのパターンを転写する際に、そのパターン転写の対象の基板を保持する前記第１可動体を前記マスクと同期して前記投影光学系に対して走査方向に駆動しても良い。 In this case, when the pattern before Symbol mask further comprising a projection optical system for projecting the substrate, the driving device constituting the stage apparatus, wherein the substrate having the held to each first movable member When transferring the pattern of the mask, the first movable body holding the substrate to be transferred may be driven in the scanning direction with respect to the projection optical system in synchronization with the mask.
本発明は、第１８の観点からすると、基板（Ｗ又はＷ１）上で隣接して配置される第１及び第２区画領域（Ｓ１及びＳ２）のそれぞれにマスク（Ｒ）のパターンを転写する露光装置であって、前記基板を保持する基板ステージ（ＷＳＴ、ＷＳＴ１又はＷＳＴ３）と；前記第１区画領域に対する第１露光と前記第２区画領域に対する第２露光との間で前記基板ステージを移動するときに、前記基板ステージの加速時と減速時とでその加速度の絶対値を異ならせる第１駆動装置（（４２，７８）又は（４２ａ、１６０））とを備える第３の露光装置である。 From the eighteenth point of view, the present invention transfers the pattern of the mask (R) to each of the first and second compartment regions (S1 and S2) arranged adjacently on the substrate (W or W1). An apparatus that moves the substrate stage between a substrate stage (WST, WST1 or WST3) holding the substrate; a first exposure to the first compartment region and a second exposure to the second compartment region. It is a third exposure apparatus including a first drive device ((42,78) or (42a, 160)) that sometimes makes the absolute value of the acceleration different between acceleration and deceleration of the substrate stage.
本発明は、第１９の観点からすると、マスク（Ｒ）のパターンを基板（Ｗ１，Ｗ２）上に転写する露光装置であって、第１定盤（１３８）と；前記第１定盤上にそれぞれ配置される前記基板をそれぞれ保持する複数の基板ステージ（ＷＳＴ１、ＷＳＴ２又はＷＳＴ３、ＷＳＴ４）と；前記第１定盤が配置される第２定盤（２２）と；前記複数の基板ステージの少なくとも１つの移動による重心位置変動を抑制するように、前記第２定盤に対して前記第１定盤を相対移動可能に支持する支持装置（４４）とを備える第４の露光装置である。これによれば、いずれかの基板ステージが移動すると、その移動による反力により支持装置により支持された第１定盤が移動して、その基板ステージの重心移動による偏荷重を第１定盤の重心移動によりキャンセルすることができ、結果的に複数の基板ステージ、第１定盤及び第２定盤を含む系全体の重心位置を所定位置に保持できる。同様に、複数の基板ステージが同時に移動する場合には、それぞれの基板ステージの移動によって生じる反力の合力により、複数の基板ステージの重心移動による偏荷重を第１定盤の重心移動によりキャンセルするように支持装置に支持された第１定盤が移動され、結果的に複数の基板ステージ、第１定盤及び第２定盤を含む系全体の重心位置を所定位置に保持できる。従って、一つの基板ステージの動作が他の基板ステージに外乱として作用することがないように基板ステージ同士の動作の調整を行う必要がなくなるので、制御負担が軽減されるとともに、各基板ステージの位置制御性をともに高く維持することができる From the nineteenth point of view, the present invention is an exposure apparatus that transfers the pattern of the mask (R) onto the substrate (W1, W2) with the first surface plate (138); on the first surface plate. A plurality of substrate stages (WST1, WST2 or WST3, WST4) each holding the substrates to be arranged; a second surface plate (22) on which the first surface plate is arranged; at least of the plurality of surface plates. This is a fourth exposure apparatus including a support device (44) that supports the first surface plate relative to the second surface plate so as to suppress a change in the position of the center of gravity due to one movement. According to this, when any of the substrate stages moves, the first surface plate supported by the support device moves due to the reaction force due to the movement, and the eccentric load due to the movement of the center of gravity of the substrate stage is applied to the first surface plate. It can be canceled by moving the center of gravity, and as a result, the position of the center of gravity of the entire system including the plurality of substrate stages, the first surface plate and the second surface plate can be held at a predetermined position. Similarly, when a plurality of board stages move at the same time, the eccentric load due to the movement of the center of gravity of the plurality of board stages is canceled by the movement of the center of gravity of the first surface plate due to the resultant force of the reaction forces generated by the movement of each board stage. As a result, the first surface plate supported by the support device is moved, and as a result, the position of the center of gravity of the entire system including the plurality of substrate stages, the first surface plate and the second surface plate can be held at a predetermined position. Therefore, it is not necessary to adjust the operation of the board stages so that the operation of one board stage does not act as a disturbance on the other board stages, so that the control load is reduced and the position of each board stage is reduced. Both controllability can be maintained high
本発明は、第２０の観点からすると、少なくとも１つが物体を保持するように構成された複数の第１可動体と；前記各第１可動体の移動によって生じる反力に応じて移動する第２可動体とを備え、前記各第１可動体の質量は、前記第２可動体の質量のほぼ１／９以下であることを特徴とする第２のステージ装置である。From a twentieth point of view, the present invention comprises a plurality of first movable bodies in which at least one is configured to hold an object; a second that moves in response to a reaction force generated by the movement of each of the first movable bodies. A second stage device including a movable body, wherein the mass of each of the first movable bodies is approximately 1/9 or less of the mass of the second movable body.
本発明は、第２１の観点からすると、２次元平面内を移動する少なくとも２つの可動体と；前記各可動体に設けられ、前記２次元平面内で所定の第１軸及びこれに直交する第２軸の双方と交差する方向に沿って延びる第１反射面と；前記第１反射面に垂直に測長ビームを照射してその反射光を受光することにより前記各可動体の第３軸方向の位置を計測する計測装置と；前記計測装置の計測値に基づいて前記各可動体の前記第１軸及び前記第２軸で規定される直交座標系上の位置座標を求める演算装置と；を備えることを特徴とする第３のステージ装置である。From the 21st point of view, the present invention includes at least two movable bodies that move in a two-dimensional plane; a first axis provided on each movable body and orthogonal to a predetermined first axis in the two-dimensional plane. With a first reflecting surface extending along a direction intersecting both of the two axes; in the third axis direction of each movable body by irradiating the length measuring beam perpendicularly to the first reflecting surface and receiving the reflected light. A measuring device that measures the position of the above; and a computing device that obtains the position coordinates on the Cartesian coordinate system defined by the first axis and the second axis of each movable body based on the measured values of the measuring device. It is a third stage device characterized by being provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10290053A JP2000106340A (en) | 1997-09-26 | 1998-09-28 | Aligner, scanning exposure method, and stage device |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27950097 | 1997-09-26 | ||
| JP9-279500 | 1997-09-26 | ||
| JP10-226500 | 1998-07-27 | ||
| JP22650098 | 1998-07-27 | ||
| JP10290053A JP2000106340A (en) | 1997-09-26 | 1998-09-28 | Aligner, scanning exposure method, and stage device |
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| Publication Number | Publication Date |
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| JP2000106340A JP2000106340A (en) | 2000-04-11 |
| JP2000106340A5 true JP2000106340A5 (en) | 2005-11-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP10290053A Withdrawn JP2000106340A (en) | 1997-09-26 | 1998-09-28 | Aligner, scanning exposure method, and stage device |
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| JP (1) | JP2000106340A (en) |
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| US6927505B2 (en) | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
| JP3679776B2 (en) * | 2002-04-22 | 2005-08-03 | キヤノン株式会社 | Drive apparatus, exposure apparatus, and device manufacturing method |
| EP3226073A3 (en) | 2003-04-09 | 2017-10-11 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device |
| KR101225884B1 (en) | 2003-04-11 | 2013-01-28 | 가부시키가이샤 니콘 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| KR101289979B1 (en) | 2003-06-19 | 2013-07-26 | 가부시키가이샤 니콘 | Exposure device and device producing method |
| TWI609409B (en) | 2003-10-28 | 2017-12-21 | 尼康股份有限公司 | Optical illumination device, exposure device, exposure method and device manufacturing method |
| KR100585108B1 (en) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | Method for exposing wafer using scan type exposure apparatus |
| TWI512335B (en) | 2003-11-20 | 2015-12-11 | 尼康股份有限公司 | Light beam converter, optical illuminating apparatus, exposure device, and exposure method |
| US7016019B2 (en) | 2003-12-16 | 2006-03-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| TWI614795B (en) | 2004-02-06 | 2018-02-11 | Nikon Corporation | Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method |
| EP3232270A3 (en) | 2005-05-12 | 2017-12-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| TW201809913A (en) * | 2006-09-01 | 2018-03-16 | 日商尼康股份有限公司 | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| JP5267029B2 (en) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP6066610B2 (en) * | 2012-07-31 | 2017-01-25 | キヤノン株式会社 | Exposure method, exposure apparatus, and device manufacturing method |
| JP6501530B2 (en) * | 2015-01-21 | 2019-04-17 | 株式会社ディスコ | Laser processing equipment |
| WO2019044489A1 (en) | 2017-08-28 | 2019-03-07 | キヤノン株式会社 | Drive device and imaging device control method |
| WO2023203612A1 (en) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | Laser machining device, laser machining method, laser machining program, recording medium, semiconductor chip manufacturing method, and semiconductor chip |
| WO2023203614A1 (en) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | Laser processing device, laser processing method, laser processing program, recording medium, semiconductor chip manufacturing method, and semiconductor chip |
| WO2023203611A1 (en) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | Laser machining apparatus, laser machining method, laser machining program, recording medium, semiconductor chip production method, and semiconductor chip |
| WO2023203613A1 (en) * | 2022-04-18 | 2023-10-26 | ヤマハ発動機株式会社 | Laser processing device, laser processing method, laser processing program, recording medium, semiconductor chip manufacturing method, and semiconductor chip |
-
1998
- 1998-09-28 JP JP10290053A patent/JP2000106340A/en not_active Withdrawn
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