JPH10510881A - アルミニウム加工品の洗浄 - Google Patents
アルミニウム加工品の洗浄Info
- Publication number
- JPH10510881A JPH10510881A JP8519589A JP51958996A JPH10510881A JP H10510881 A JPH10510881 A JP H10510881A JP 8519589 A JP8519589 A JP 8519589A JP 51958996 A JP51958996 A JP 51958996A JP H10510881 A JPH10510881 A JP H10510881A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- aluminum
- voltage
- oxide film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 39
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 35
- 230000002378 acidificating effect Effects 0.000 claims abstract description 13
- 238000007743 anodising Methods 0.000 claims abstract description 11
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims abstract 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 30
- 239000003792 electrolyte Substances 0.000 claims description 29
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 14
- 238000002048 anodisation reaction Methods 0.000 claims description 10
- 238000004090 dissolution Methods 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 239000010408 film Substances 0.000 description 60
- 239000002253 acid Substances 0.000 description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 20
- 229910045601 alloy Inorganic materials 0.000 description 19
- 239000000956 alloy Substances 0.000 description 19
- 230000004888 barrier function Effects 0.000 description 19
- 239000012528 membrane Substances 0.000 description 17
- 235000011007 phosphoric acid Nutrition 0.000 description 15
- 239000011148 porous material Substances 0.000 description 14
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 10
- 229910052749 magnesium Inorganic materials 0.000 description 10
- 239000011777 magnesium Substances 0.000 description 10
- 238000005406 washing Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000011282 treatment Methods 0.000 description 6
- 229910000838 Al alloy Inorganic materials 0.000 description 5
- 239000010407 anodic oxide Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 235000012245 magnesium oxide Nutrition 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 230000009972 noncorrosive effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000002144 chemical decomposition reaction Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- 238000002847 impedance measurement Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003016 phosphoric acids Chemical class 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910018516 Al—O Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 235000004789 Rosa xanthina Nutrition 0.000 description 1
- 241000109329 Rosa xanthina Species 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C25F1/02—Pickling; Descaling
- C25F1/04—Pickling; Descaling in solution
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Photoreceptors In Electrophotography (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.アルミニウム加工品の洗浄方法であって、 アルミニウム酸化物を溶解可能な酸性電解液中で選択された交流電圧を用い、 少なくとも70℃の温度に維持される上記加工品を陽極酸化し、 上記加工品の表面を洗浄し、その上に、非孔質で、上記選択された陽極酸化電 圧(rms Vで表される)の約半分を越えない厚さ(nmで表される)を有す る酸化膜を設ける方法。 2.アルミニウム加工品の洗浄方法であって、 アルミニウム酸化物を溶解可能な酸性電解液中で選択された交流電圧を用い、 少なくとも70℃の温度に維持される上記加工品を陽極酸化し、 上記加工品の表面を洗浄し、その上に、非孔質で、約20nmを越えない厚さ を有する酸化膜を設ける方法。 3.上記酸性電解液が、リン酸を含む請求項1または2の方法。 4.上記陽極酸化が、酸化膜の形成と溶解の間の平衡に達するまで継続する請求 項1から3のいずれか1つの方法。 5.上記加工品が、アルミニウムシートである請求項1から4のいずれか1つの 方法。 6.上記電解液が、80−100℃の温度であり、交流陽極酸化が、0.1−1 0kAm-2の電流密度で0.1−10秒間継続する請求項1から5のいずれか1 つの方法。 7.上記加工品に洗浄された表面上のいずれの酸化膜も、10nm厚を越えない 請求項1から6のいずれか1つの方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP94309501 | 1994-12-19 | ||
GB94309501.8 | 1994-12-19 | ||
PCT/GB1995/002956 WO1996019596A1 (en) | 1994-12-19 | 1995-12-18 | Cleaning aluminium workpieces |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10510881A true JPH10510881A (ja) | 1998-10-20 |
JP3647461B2 JP3647461B2 (ja) | 2005-05-11 |
Family
ID=8217953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51958996A Expired - Fee Related JP3647461B2 (ja) | 1994-12-19 | 1995-12-18 | アルミニウム加工品の洗浄 |
Country Status (9)
Country | Link |
---|---|
US (1) | US5997721A (ja) |
EP (1) | EP0795048B1 (ja) |
JP (1) | JP3647461B2 (ja) |
AT (1) | ATE190678T1 (ja) |
AU (1) | AU4267096A (ja) |
CA (1) | CA2208109C (ja) |
DE (1) | DE69515691T2 (ja) |
ES (1) | ES2143085T3 (ja) |
WO (1) | WO1996019596A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007270217A (ja) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | 電解処理方法及び装置、並びに平版印刷版の製造方法及び装置 |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR0209048A (pt) * | 2001-04-20 | 2004-08-10 | Corus Aluminium Walzprod Gmbh | Método de eletrodeposição e pré-tratamento de peças de trabalho de alumìnio |
ATE256770T1 (de) * | 2001-06-20 | 2004-01-15 | Wolf-Dieter Franz | Verfahren zum reinigen und passivieren von leichtmetalllegierungsoberflächen |
ATE277207T1 (de) * | 2001-10-11 | 2004-10-15 | Franz Oberflaechentechnik Gmbh | Beschichtungsverfahren für leichtmetalllegierungsoberflächen |
US6994919B2 (en) * | 2002-01-31 | 2006-02-07 | Corus Aluminium Walzprodukte Gmbh | Brazing product and method of manufacturing a brazing product |
US7294411B2 (en) | 2002-01-31 | 2007-11-13 | Aleris Aluminum Koblenz Gmbh | Brazing product and method of its manufacture |
AU2002338880A1 (en) * | 2002-10-09 | 2004-05-04 | Wolf-Dieter Franz | Method for cleaning and passivating light alloy surfaces |
US7078111B2 (en) | 2002-12-13 | 2006-07-18 | Corus Aluminium Walzprodukte Gmbh | Brazing sheet product and method of its manufacture |
US7056597B2 (en) * | 2002-12-13 | 2006-06-06 | Corus Aluminium Walzprodukte Gmbh | Brazing sheet product and method of its manufacture |
US20060157352A1 (en) * | 2005-01-19 | 2006-07-20 | Corus Aluminium Walzprodukte Gmbh | Method of electroplating and pre-treating aluminium workpieces |
CN101203629B (zh) | 2005-05-19 | 2012-01-18 | 海德鲁铝业德国有限责任公司 | 石印条的处理 |
EP2077949B1 (en) * | 2006-03-31 | 2015-09-30 | Aludium Transformación de Productos, S.L.U. | Manufacturing process to produce litho sheet |
CN103924252B (zh) * | 2006-06-06 | 2017-08-18 | 海德鲁铝业德国有限责任公司 | 清理铝加工件的方法 |
EP1880861B1 (de) | 2006-07-21 | 2015-11-04 | Hydro Aluminium Rolled Products GmbH | Aluminiumband für lithografische Druckplattenträger |
CN101591797B (zh) * | 2008-05-30 | 2012-08-08 | 中芯国际集成电路制造(上海)有限公司 | 铝垫电化学刻蚀方法 |
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US11121002B2 (en) | 2018-10-24 | 2021-09-14 | Applied Materials, Inc. | Systems and methods for etching metals and metal derivatives |
US11437242B2 (en) | 2018-11-27 | 2022-09-06 | Applied Materials, Inc. | Selective removal of silicon-containing materials |
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Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1191437A (fr) * | 1958-02-11 | 1959-10-20 | Procédé de préparation de l'aluminium et de ses alliages pour le chromage | |
US3929591A (en) * | 1974-08-26 | 1975-12-30 | Polychrome Corp | Novel lithographic plate and method |
US4097342A (en) * | 1975-05-16 | 1978-06-27 | Alcan Research And Development Limited | Electroplating aluminum stock |
DE2949807B1 (de) * | 1979-12-11 | 1981-07-16 | Schenk Filterbau Gmbh, 7076 Waldstetten | Elektrolytloesung zum Elektropolieren |
-
1995
- 1995-12-18 AU AU42670/96A patent/AU4267096A/en not_active Abandoned
- 1995-12-18 EP EP95941183A patent/EP0795048B1/en not_active Expired - Lifetime
- 1995-12-18 AT AT95941183T patent/ATE190678T1/de not_active IP Right Cessation
- 1995-12-18 WO PCT/GB1995/002956 patent/WO1996019596A1/en active IP Right Grant
- 1995-12-18 JP JP51958996A patent/JP3647461B2/ja not_active Expired - Fee Related
- 1995-12-18 DE DE69515691T patent/DE69515691T2/de not_active Expired - Lifetime
- 1995-12-18 ES ES95941183T patent/ES2143085T3/es not_active Expired - Lifetime
- 1995-12-18 CA CA002208109A patent/CA2208109C/en not_active Expired - Fee Related
- 1995-12-18 US US08/849,674 patent/US5997721A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007270217A (ja) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | 電解処理方法及び装置、並びに平版印刷版の製造方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
CA2208109A1 (en) | 1996-06-27 |
ATE190678T1 (de) | 2000-04-15 |
EP0795048B1 (en) | 2000-03-15 |
ES2143085T3 (es) | 2000-05-01 |
US5997721A (en) | 1999-12-07 |
WO1996019596A1 (en) | 1996-06-27 |
JP3647461B2 (ja) | 2005-05-11 |
DE69515691T2 (de) | 2000-07-20 |
MX9704286A (es) | 1997-09-30 |
DE69515691D1 (de) | 2000-04-20 |
EP0795048A1 (en) | 1997-09-17 |
AU4267096A (en) | 1996-07-10 |
CA2208109C (en) | 2006-06-20 |
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