JPH10335282A - ブラシスクラバ - Google Patents

ブラシスクラバ

Info

Publication number
JPH10335282A
JPH10335282A JP9140443A JP14044397A JPH10335282A JP H10335282 A JPH10335282 A JP H10335282A JP 9140443 A JP9140443 A JP 9140443A JP 14044397 A JP14044397 A JP 14044397A JP H10335282 A JPH10335282 A JP H10335282A
Authority
JP
Japan
Prior art keywords
brush
particles
semiconductor substrate
rinsing liquid
scrubber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9140443A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10335282A5 (enExample
Inventor
Takashi Hasegawa
隆史 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9140443A priority Critical patent/JPH10335282A/ja
Publication of JPH10335282A publication Critical patent/JPH10335282A/ja
Publication of JPH10335282A5 publication Critical patent/JPH10335282A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP9140443A 1997-05-29 1997-05-29 ブラシスクラバ Pending JPH10335282A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9140443A JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9140443A JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Publications (2)

Publication Number Publication Date
JPH10335282A true JPH10335282A (ja) 1998-12-18
JPH10335282A5 JPH10335282A5 (enExample) 2005-03-17

Family

ID=15268762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9140443A Pending JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Country Status (1)

Country Link
JP (1) JPH10335282A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6295683B1 (en) * 1999-12-09 2001-10-02 United Microelectronics Corp. Equipment for brushing the underside of a semiconductor wafer
JP2010016098A (ja) * 2008-07-02 2010-01-21 Tokyo Electron Ltd 基板洗浄装置
WO2010047119A1 (ja) * 2008-10-23 2010-04-29 昭和電工株式会社 磁気記録媒体用基板の洗浄装置及び磁気記録媒体用基板の洗浄方法
KR101020332B1 (ko) * 2009-02-04 2011-03-08 주식회사 엘지실트론 척 세척유니트
JP2017139442A (ja) * 2016-02-01 2017-08-10 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置、基板処理装置、基板洗浄方法および基板処理方法
US10985008B2 (en) 2016-02-01 2021-04-20 SCREEN Holdings Co., Ltd. Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
CN117878026A (zh) * 2024-03-12 2024-04-12 西安奕斯伟材料科技股份有限公司 硅片清洗设备及硅片清洗方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6295683B1 (en) * 1999-12-09 2001-10-02 United Microelectronics Corp. Equipment for brushing the underside of a semiconductor wafer
JP2010016098A (ja) * 2008-07-02 2010-01-21 Tokyo Electron Ltd 基板洗浄装置
WO2010047119A1 (ja) * 2008-10-23 2010-04-29 昭和電工株式会社 磁気記録媒体用基板の洗浄装置及び磁気記録媒体用基板の洗浄方法
JP2010102772A (ja) * 2008-10-23 2010-05-06 Showa Denko Kk 磁気記録媒体用基板の洗浄装置及び磁気記録媒体用基板の洗浄方法
KR101020332B1 (ko) * 2009-02-04 2011-03-08 주식회사 엘지실트론 척 세척유니트
JP2017139442A (ja) * 2016-02-01 2017-08-10 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置、基板処理装置、基板洗浄方法および基板処理方法
US10985008B2 (en) 2016-02-01 2021-04-20 SCREEN Holdings Co., Ltd. Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
US11676811B2 (en) 2016-02-01 2023-06-13 SCREEN Holdings Co., Ltd. Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
US12322586B2 (en) 2016-02-01 2025-06-03 SCREEN Holdings Co., Ltd. Substrate cleaning method and substrate processing method
CN117878026A (zh) * 2024-03-12 2024-04-12 西安奕斯伟材料科技股份有限公司 硅片清洗设备及硅片清洗方法

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