JPH1027785A5 - - Google Patents

Info

Publication number
JPH1027785A5
JPH1027785A5 JP1997055376A JP5537697A JPH1027785A5 JP H1027785 A5 JPH1027785 A5 JP H1027785A5 JP 1997055376 A JP1997055376 A JP 1997055376A JP 5537697 A JP5537697 A JP 5537697A JP H1027785 A5 JPH1027785 A5 JP H1027785A5
Authority
JP
Japan
Prior art keywords
inches
plasma reactor
base
ceiling
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997055376A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1027785A (ja
Filing date
Publication date
Priority claimed from US08/597,445 external-priority patent/US5777289A/en
Application filed filed Critical
Publication of JPH1027785A publication Critical patent/JPH1027785A/ja
Publication of JPH1027785A5 publication Critical patent/JPH1027785A5/ja
Pending legal-status Critical Current

Links

JP9055376A 1996-02-02 1997-02-03 ハイブリッドインダクタ及びマルチ半径ドーム形シーリングを有するｒｆプラズマリアクタ Pending JPH1027785A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/597,445 US5777289A (en) 1995-02-15 1996-02-02 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
US08/597445 1996-02-02

Publications (2)

Publication Number Publication Date
JPH1027785A JPH1027785A (ja) 1998-01-27
JPH1027785A5 true JPH1027785A5 (enExample) 2004-12-16

Family

ID=24391536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9055376A Pending JPH1027785A (ja) 1996-02-02 1997-02-03 ハイブリッドインダクタ及びマルチ半径ドーム形シーリングを有するｒｆプラズマリアクタ

Country Status (5)

Country Link
US (2) US5777289A (enExample)
EP (1) EP0788138A3 (enExample)
JP (1) JPH1027785A (enExample)
KR (1) KR970063562A (enExample)
TW (1) TW310444B (enExample)

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US20080156264A1 (en) * 2006-12-27 2008-07-03 Novellus Systems, Inc. Plasma Generator Apparatus
TW200830941A (en) * 2007-01-15 2008-07-16 Jehara Corp Plasma generating apparatus
US20080232424A1 (en) * 2007-03-23 2008-09-25 Honeywell International Inc. Hearth plate including side walls defining a processing volume
US8956500B2 (en) * 2007-04-24 2015-02-17 Applied Materials, Inc. Methods to eliminate “M-shape” etch rate profile in inductively coupled plasma reactor
JP5297048B2 (ja) * 2008-01-28 2013-09-25 三菱重工業株式会社 プラズマ処理方法及びプラズマ処理装置
US9591738B2 (en) * 2008-04-03 2017-03-07 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
US20090284421A1 (en) * 2008-05-16 2009-11-19 Yuri Glukhoy RF antenna assembly having an antenna with transversal magnetic field for generation of inductively coupled plasma
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
EP2297377B1 (en) 2008-05-30 2017-12-27 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
US9272359B2 (en) 2008-05-30 2016-03-01 Colorado State University Research Foundation Liquid-gas interface plasma device
US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
US8916022B1 (en) 2008-09-12 2014-12-23 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
JP5572329B2 (ja) * 2009-01-15 2014-08-13 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ生成装置
JP5410950B2 (ja) * 2009-01-15 2014-02-05 株式会社日立ハイテクノロジーズ プラズマ処理装置
US8222822B2 (en) * 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP5451324B2 (ja) * 2009-11-10 2014-03-26 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP5553460B2 (ja) 2010-03-31 2014-07-16 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
US9653264B2 (en) 2010-12-17 2017-05-16 Mattson Technology, Inc. Inductively coupled plasma source for plasma processing
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
WO2014161199A1 (zh) * 2013-04-03 2014-10-09 Wang Dongjun 等离子体增强原子层沉积设备
JP6750534B2 (ja) 2017-02-24 2020-09-02 東京エレクトロン株式会社 成膜装置
US11521828B2 (en) 2017-10-09 2022-12-06 Applied Materials, Inc. Inductively coupled plasma source
US12074390B2 (en) 2022-11-11 2024-08-27 Tokyo Electron Limited Parallel resonance antenna for radial plasma control

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US5777289A (en) * 1995-02-15 1998-07-07 Applied Materials, Inc. RF plasma reactor with hybrid conductor and multi-radius dome ceiling
US5710486A (en) * 1995-05-08 1998-01-20 Applied Materials, Inc. Inductively and multi-capacitively coupled plasma reactor

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