JPH10270333A5 - - Google Patents

Info

Publication number
JPH10270333A5
JPH10270333A5 JP1997075355A JP7535597A JPH10270333A5 JP H10270333 A5 JPH10270333 A5 JP H10270333A5 JP 1997075355 A JP1997075355 A JP 1997075355A JP 7535597 A JP7535597 A JP 7535597A JP H10270333 A5 JPH10270333 A5 JP H10270333A5
Authority
JP
Japan
Prior art keywords
gas
airtight chamber
exposure apparatus
optical system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997075355A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10270333A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9075355A priority Critical patent/JPH10270333A/ja
Priority claimed from JP9075355A external-priority patent/JPH10270333A/ja
Priority to US09/047,478 priority patent/US6222610B1/en
Priority to EP98302390A priority patent/EP0867774A3/en
Publication of JPH10270333A publication Critical patent/JPH10270333A/ja
Priority to US09/781,993 priority patent/US20010019400A1/en
Priority to US10/084,352 priority patent/US6686989B2/en
Publication of JPH10270333A5 publication Critical patent/JPH10270333A5/ja
Pending legal-status Critical Current

Links

JP9075355A 1997-03-27 1997-03-27 露光装置 Pending JPH10270333A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9075355A JPH10270333A (ja) 1997-03-27 1997-03-27 露光装置
US09/047,478 US6222610B1 (en) 1997-03-27 1998-03-25 Exposure apparatus
EP98302390A EP0867774A3 (en) 1997-03-27 1998-03-27 Exposure apparatus
US09/781,993 US20010019400A1 (en) 1997-03-27 2001-02-14 Exposure apparatus
US10/084,352 US6686989B2 (en) 1997-03-27 2002-02-28 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9075355A JPH10270333A (ja) 1997-03-27 1997-03-27 露光装置

Publications (2)

Publication Number Publication Date
JPH10270333A JPH10270333A (ja) 1998-10-09
JPH10270333A5 true JPH10270333A5 (enExample) 2005-08-11

Family

ID=13573853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9075355A Pending JPH10270333A (ja) 1997-03-27 1997-03-27 露光装置

Country Status (3)

Country Link
US (3) US6222610B1 (enExample)
EP (1) EP0867774A3 (enExample)
JP (1) JPH10270333A (enExample)

Families Citing this family (37)

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KR100636451B1 (ko) 1997-06-10 2006-10-18 가부시키가이샤 니콘 광학 장치 및 그 세정 방법과 투영 노광 장치 및 그 제조방법
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
JP3832984B2 (ja) 1998-10-27 2006-10-11 キヤノン株式会社 露光装置およびデバイス製造方法
AU2327800A (en) 1999-02-12 2000-08-29 Nikon Corporation Exposure method and apparatus
US6762412B1 (en) 1999-05-10 2004-07-13 Nikon Corporation Optical apparatus, exposure apparatus using the same, and gas introduction method
AU6471900A (en) * 1999-08-05 2001-03-05 Nikon Corporation Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter
US6654095B1 (en) 1999-10-18 2003-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP2001144003A (ja) * 1999-11-16 2001-05-25 Canon Inc 露光装置およびデバイス製造方法
US6907058B2 (en) 2000-01-25 2005-06-14 Lambda Physik Ag Energy monitor for molecular fluorine laser
JP2001274054A (ja) * 2000-03-24 2001-10-05 Canon Inc 露光装置、半導体デバイス製造方法および半導体デバイス製造工場
US6571057B2 (en) * 2000-03-27 2003-05-27 Nikon Corporation Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
WO2001075501A1 (en) * 2000-03-31 2001-10-11 Nikon Corporation Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
JP2001345248A (ja) * 2000-05-31 2001-12-14 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP2002260999A (ja) 2000-12-08 2002-09-13 Carl-Zeiss-Stiftung Trading As Carl Zeiss 対物レンズの少なくとも１つの内部空間を気体洗浄するシステム
KR20030012297A (ko) * 2001-07-31 2003-02-12 주식회사 하이닉스반도체 반도체 스테퍼 설비의 렌즈 온도 조절 장치
US6998620B2 (en) 2001-08-13 2006-02-14 Lambda Physik Ag Stable energy detector for extreme ultraviolet radiation detection
TWI223863B (en) * 2002-04-22 2004-11-11 Nikon Corp Support apparatus, optical apparatus, exposure apparatus and manufacturing method of device
US7050149B2 (en) * 2002-06-11 2006-05-23 Nikon Corporation Exposure apparatus and exposure method
JP4004895B2 (ja) * 2002-08-29 2007-11-07 株式会社フジクラ 光学装置
US6757112B1 (en) * 2002-10-22 2004-06-29 Raytheon Company Lens assembly and method for its preparation
US6847431B2 (en) * 2003-03-10 2005-01-25 Nikon Corporation Method and device for controlling fluid flow in an optical assembly
JP2004281697A (ja) * 2003-03-14 2004-10-07 Canon Inc 露光装置及び収差補正方法
DE602004024302D1 (de) † 2003-06-06 2010-01-07 Nippon Kogaku Kk Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente
JP4835155B2 (ja) * 2003-07-09 2011-12-14 株式会社ニコン 露光装置及びデバイス製造方法
EP1503243A1 (en) * 2003-07-31 2005-02-02 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4245577B2 (ja) * 2005-03-22 2009-03-25 シャープ株式会社 レンズ位置制御装置及び撮像モジュール
US7265815B2 (en) * 2005-05-19 2007-09-04 Asml Holding N.V. System and method utilizing an illumination beam adjusting system
JP5023064B2 (ja) * 2005-09-13 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 露光工程のための光学要素ユニット
JP2009010232A (ja) * 2007-06-28 2009-01-15 Canon Inc 光学装置、露光装置およびデバイス製造方法
TWI534494B (zh) * 2012-07-12 2016-05-21 鴻海精密工業股份有限公司 鏡頭模組組裝平臺、組裝裝置及組裝方法
CN107003499B (zh) * 2014-12-01 2022-04-15 科磊股份有限公司 用于提供在其中执行光学接触的湿度受控环境的设备及方法
DE102015202844A1 (de) 2015-02-17 2015-04-09 Carl Zeiss Smt Gmbh Druckanpassungseinrichtung für eine Projektionsbelichtungsanlage
TWI712865B (zh) * 2017-09-21 2020-12-11 日商斯庫林集團股份有限公司 曝光裝置、基板處理裝置、曝光方法及基板處理方法
JP6924661B2 (ja) * 2017-09-21 2021-08-25 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、露光方法および基板処理方法
JP7058177B2 (ja) * 2018-05-22 2022-04-21 東京エレクトロン株式会社 基板処理装置

Family Cites Families (18)

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US4690528A (en) * 1983-10-05 1987-09-01 Nippon Kogaku K. K. Projection exposure apparatus
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
JPS6179228A (ja) 1984-09-26 1986-04-22 Nippon Kogaku Kk <Nikon> 投影光学装置
JPS6232613A (ja) * 1985-08-05 1987-02-12 Canon Inc 投影露光装置
JPH0712012B2 (ja) * 1985-12-11 1995-02-08 株式会社ニコン 投影露光装置
US5337097A (en) * 1985-12-26 1994-08-09 Nippon Kogaku K.K. Projection optical apparatus
US4825247A (en) 1987-02-16 1989-04-25 Canon Kabushiki Kaisha Projection exposure apparatus
JPH0628227B2 (ja) * 1987-10-06 1994-04-13 株式会社日立製作所 半導体露光装置
JP3084332B2 (ja) 1993-01-19 2000-09-04 キヤノン株式会社 露光装置
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
US5696623A (en) 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
FR2708757B1 (fr) 1993-08-05 1997-05-09 Fujitsu Ltd Procédé et appareil d'exposition par de la lumière ultraviolette.
JP3500619B2 (ja) * 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
JP3365571B2 (ja) * 1993-11-10 2003-01-14 株式会社ニコン 光学式計測装置及び露光装置
EP0676672B1 (en) * 1994-04-08 2003-06-11 Canon Kabushiki Kaisha Processing method and apparatus for a resist-coated substrate
US5986744A (en) * 1995-02-17 1999-11-16 Nikon Corporation Projection optical system, illumination apparatus, and exposure apparatus
JP3402850B2 (ja) 1995-05-09 2003-05-06 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置

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