AU6471900A - Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter - Google Patents

Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter

Info

Publication number
AU6471900A
AU6471900A AU64719/00A AU6471900A AU6471900A AU 6471900 A AU6471900 A AU 6471900A AU 64719/00 A AU64719/00 A AU 64719/00A AU 6471900 A AU6471900 A AU 6471900A AU 6471900 A AU6471900 A AU 6471900A
Authority
AU
Australia
Prior art keywords
exposure device
evaluating
optical
illumination
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU64719/00A
Inventor
Satoru Oshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU6471900A publication Critical patent/AU6471900A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU64719/00A 1999-08-05 2000-08-04 Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter Abandoned AU6471900A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/223142 1999-08-05
JP22314299 1999-08-05
PCT/JP2000/005245 WO2001011665A1 (en) 1999-08-05 2000-08-04 Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method and device for evaluating filter

Publications (1)

Publication Number Publication Date
AU6471900A true AU6471900A (en) 2001-03-05

Family

ID=16793457

Family Applications (1)

Application Number Title Priority Date Filing Date
AU64719/00A Abandoned AU6471900A (en) 1999-08-05 2000-08-04 Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter

Country Status (2)

Country Link
AU (1) AU6471900A (en)
WO (1) WO2001011665A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002071457A1 (en) * 2001-03-07 2002-09-12 Nikon Corporation Lens-barrel, exposure device, and method of manufacturing device
DE10164529C1 (en) * 2001-12-18 2003-10-09 Jenoptik Laser Optik Sys Gmbh Device for storing and transporting at least one optical component

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04198740A (en) * 1990-11-28 1992-07-20 Seiko Epson Corp Permeability measuring method for pellicle
JPH05304068A (en) * 1992-04-27 1993-11-16 Shin Etsu Chem Co Ltd Dust-proof housing case
JPH0737783A (en) * 1993-07-20 1995-02-07 Fujitsu Ltd Aligner
JP3658852B2 (en) * 1996-04-03 2005-06-08 株式会社ニコン Exposure equipment
JPH10270333A (en) * 1997-03-27 1998-10-09 Nikon Corp Aligner
JPH11202498A (en) * 1998-01-20 1999-07-30 Canon Inc Exposure device

Also Published As

Publication number Publication date
WO2001011665A1 (en) 2001-02-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase