AU4930099A - Illuminator and projection exposure apparatus - Google Patents

Illuminator and projection exposure apparatus

Info

Publication number
AU4930099A
AU4930099A AU49300/99A AU4930099A AU4930099A AU 4930099 A AU4930099 A AU 4930099A AU 49300/99 A AU49300/99 A AU 49300/99A AU 4930099 A AU4930099 A AU 4930099A AU 4930099 A AU4930099 A AU 4930099A
Authority
AU
Australia
Prior art keywords
illuminator
exposure apparatus
projection exposure
projection
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU49300/99A
Inventor
Taro Ogata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU4930099A publication Critical patent/AU4930099A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU49300/99A 1998-08-18 1999-07-29 Illuminator and projection exposure apparatus Abandoned AU4930099A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23149998 1998-08-18
JP10/231499 1998-08-18
PCT/JP1999/004087 WO2000011706A1 (en) 1998-08-18 1999-07-29 Illuminator and projection exposure apparatus

Publications (1)

Publication Number Publication Date
AU4930099A true AU4930099A (en) 2000-03-14

Family

ID=16924459

Family Applications (1)

Application Number Title Priority Date Filing Date
AU49300/99A Abandoned AU4930099A (en) 1998-08-18 1999-07-29 Illuminator and projection exposure apparatus

Country Status (2)

Country Link
AU (1) AU4930099A (en)
WO (1) WO2000011706A1 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628370B1 (en) * 1996-11-25 2003-09-30 Mccullough Andrew W. Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
JP2002359176A (en) 2001-05-31 2002-12-13 Canon Inc Luminaire, illumination control method, aligner, device and manufacturing method thereof
US7333178B2 (en) 2002-03-18 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7170587B2 (en) 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4735258B2 (en) * 2003-04-09 2011-07-27 株式会社ニコン Exposure method and apparatus, and device manufacturing method
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TW201809801A (en) 2003-11-20 2018-03-16 日商尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
TW201809727A (en) 2004-02-06 2018-03-16 日商尼康股份有限公司 Polarization changing device
JP4936499B2 (en) * 2004-06-21 2012-05-23 株式会社ニコン Exposure apparatus and exposure method
KR101504765B1 (en) 2005-05-12 2015-03-30 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
JP2007188927A (en) * 2006-01-11 2007-07-26 Canon Inc Aligner, exposure method and method of manufacturing device
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5360057B2 (en) 2008-05-28 2013-12-04 株式会社ニコン Spatial light modulator inspection apparatus and inspection method, illumination optical system, illumination optical system adjustment method, exposure apparatus, and device manufacturing method
JP5604813B2 (en) * 2009-06-15 2014-10-15 株式会社ニコン Illumination optical system, exposure apparatus, and device manufacturing method
JP5326928B2 (en) * 2009-08-19 2013-10-30 株式会社ニコン Illumination optical system, exposure apparatus, and device manufacturing method
WO2013018799A1 (en) * 2011-08-04 2013-02-07 株式会社ニコン Illumination device
NL2017493B1 (en) * 2016-09-19 2018-03-27 Kulicke & Soffa Liteq B V Optical beam homogenizer based on a lens array

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61150330A (en) * 1984-12-25 1986-07-09 Hoya Corp Illuminance correcting plate for exposure device
JP2852169B2 (en) * 1993-02-25 1999-01-27 日本電気株式会社 Projection exposure method and apparatus

Also Published As

Publication number Publication date
WO2000011706A1 (en) 2000-03-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase